Patent classifications
H
H01
H01L
2224/00
H01L2224/01
H01L2224/34
H01L2224/34
DIFFUSION BARRIER FOR INTERCONNECTS
Representative implementations of techniques and devices are used to reduce or prevent conductive material diffusion into insulating or dielectric material of bonded substrates. Misaligned conductive structures can come into direct contact with a dielectric portion of the substrates due to overlap, especially while employing direct bonding techniques. A barrier interface that can inhibit the diffusion is disposed generally between the conductive material and the dielectric at the overlap.