An apparatus for guiding, in particular directing or accelerating, charged particles (50), comprising: a substrate (110) having a surface (115); an optically thinner layer (120) formed on the surface (115); an inhomogeneous channel (130) which is formed by two mutually opposite delimiting structures on a side of the layer (120) that is opposite the substrate (110); and a radiation device which is designed to generate at least one pulsed laser beam (140) and inject the at least one pulsed laser beam (140) into the channel (130) from a side that is opposite the optically thinner layer (120). The layer (120) for the laser beam (140) is optically thin, and the delimiting structures have a high optical density in comparison with the layer (120). The delimiting structures are designed to guide the particles (50) by means of the laser beam (140) in the channel (130) and alternatingly focus them along the channel (130) and in at least one direction perpendicular to the channel (130).

An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.

An apparatus and method are disclosed for actinic inspection of semiconductor masks intended for extended ultraviolet (EUV) lithography, or similar objects, with feature sizes less than 100 nm. The approach uses a coherent light source with wavelength less than 120 nm. Inside a vacuum system, an optical system directs the light to an object, i.e., the mask or mask blank, and directs the resulting reflected or transmitted light to an imaging sensor. A computational system processes the imaging sensor data to generate phase and amplitude images of the object. The preferred imaging modality, a form of digital holography, produces images of buried structures and phase objects, as well as amplitude or reflectance images, with nanometer resolution less than or equal to the feature size of the mask.

A Free Electron Laser source includes: a fiber-based laser having a plurality of amplifying fibers wherein an initial laser pulse is distributed and amplified, and element for grouping together the elementary pulses amplified in the fiber in order to form an a single amplified global laser pulse; a laser plasma accelerator wherein the global laser pulse generates relativistic electron beams, a beam focusing system transporting electron beams from the laser plasma accelerator, an undulator wherein relativistic electron beams generate an electromagnetic beam, and a beam separator system, wherein the electron beam and the electromagnetic beam are separated.

Some embodiments of the present disclosure provide a method that includes colliding a laser with an electron beam to produce backscattered x-rays while the electron beam is traversing a circular arc. This backscattering process is inverse Compton scattering (ICS). ICS x-rays are emitted in the same direction as the electrons. Because this ICS direction is changing as a function of time, the position of the x-ray beam on a detector will change depending on the timing of electron/laser collision. This position change is easily detected and converted to a timing measurement sensitive at the femtosecond scale, converting a very difficult timing measurement of laser pulse, electron pulse, and x-ray pulse synchronization into a simple and robust position measurement.

A radioisotope production apparatus comprising an electron source arranged to provide an electron beam. The electron source comprises an electron injector and an electron accelerator. The radioisotope production apparatus further comprises a target support structure configured to hold a target and a beam splitter arranged to direct the a first portion of the electron beam along a first path towards a first side of the target and to direct a second portion of the electron beam along a second path towards a second side of the target.

The present disclosure provides a method for imaging a compound contained by a lipid vesicle in water. The method comprises the following steps of: (a) providing an aqueous sample comprising the lipid vesicle which contains the compound, wherein the aqueous sample further comprises ammonium sulphate ((NH.sub.4).sub.2SO.sub.4); (b) illuminating the aqueous sample with an X-ray free-electron laser (X-FEL); (c) with an image sensor, collecting a plurality of coherent diffraction image patterns of the aqueous sample being illuminated; and (d) reconstructing the coherent diffraction image patterns with a computer such that an image of the lipid vesicle containing the compound is acquired. A method for examining a quality of a chemical drug contained by a liposome in water is also provided.

An undulator is adapted to a synchrotron storage ring or free electron lasers (FEL), especially to an undulator capable of switching polarization mode rapidly. In comparison with the EPU (elliptically polarized undulator) of APPLE II (Advanced Planar Polarized Light Emitter II) which conceived by Dr. S. Sasaki, the provided undulator does not use mechanical transmission mechanisms to drive the four magnetic pole arrays composed of permanent magnets. Hence, the polarization mode can be switched rapidly. Moreover, a polarization method of electron beam is also provided.

A system including an electron beam source for providing an electron beam and at least one undulator system configured to produce free-electron laser (FEL) radiation is described. The undulator system includes undulators and at least one optical section between the undulators. The undulators are configured to induce the electron beam to microbunch and radiate coherently. The optical section(s) are configured to operate on the electron beam and the FEL radiation generated by the electron beam.

A light source for high power coherent light can include multiparticle relativistic bunches of electrons generating high intensity propagating fields. Coherent emission between electrons may also be utilized. The source may be independent of any medium or media to remove all constraints on the wavelength of the light emitted. And at least a portion of a single alternating magnetic field for accelerating the electron bunches can be included. The color or wavelength of the produced light can be determined solely by the parameters of the electron bunches and the alternating field. The source can be used for imaging, such as medical imaging or for security, including concealed weapons, and for quality control.