Patent classifications
H01S3/10069
EUV LPP source with dose control and laser stabilization using variable width laser pulses
A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source. Each laser pulse is modulated to be of a width that is determined to be sufficient to allow for extraction of a suitable uniform amount of energy in the laser source gain medium; in some embodiments the suitable uniform amount of energy to be extracted may be selected to avoid self-lasing. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, and a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. The energy of the next pulse is modulated, either by modulating its magnitude or by modulating the amplification of the pulse by one or more amplifiers, but without decreasing the determined width of the laser pulse.
SOLID-STATE LASER SYSTEM AND LASER APPARATUS USED FOR EXPOSURE APPARATUS
A solid-state laser system may include a first solid-state laser unit, a second solid-state laser unit, a wavelength conversion system, a wavelength detector, and a wavelength controller. The wavelength conversion system may receive a first pulsed laser light beam with a first wavelength and a second pulsed laser light beam with a second wavelength, and output a third pulsed laser light beam with a third wavelength converted from the first and second wavelengths. The wavelength controller may control the first solid-state laser unit to vary the first wavelength on a condition that an absolute value of a difference between a value of a target wavelength and a value of the third wavelength detected by the wavelength detector is equal to or less than a predetermined value, and control the second solid-state laser unit to vary the second wavelength on a condition that the absolute value exceeds the predetermined value.
HIGH-VOLTAGE PULSE GENERATOR AND GAS LASER APPARATUS
A high-voltage pulse generator may include a number “n” (n is a natural number of not less than 2) of primary electric circuits connected in parallel to one another on the primary side of a pulse transformer, and a secondary electric circuit of the pulse transformer, which is connected to a pair of discharge electrodes disposed in a laser chamber of a gas laser apparatus. The “n” primary electric circuits may include a number “n” of primary coils connected in parallel to one another, a number “n” of capacitors respectively connected in parallel to the “n” primary coils, and a number “n” of switches respectively connected in series to the “n” capacitors. The “n” primary electric circuits may be connected to a number “n” of chargers for charging the “n” capacitors, respectively. The secondary electric circuit may include a number “n” of secondary coils connected in series to one another, and a number “n” of diodes each connected to opposite ends of each of the “n” secondary coils, to prevent a reverse current flowing from the pair of discharge electrodes toward the secondary coils.
Fiber amplifier and gain adjustment method for fiber amplifier
Example fiber amplifiers and gain adjustment methods for the fiber amplifiers are described. One example fiber amplifier includes a first power amplifier, a wavelength level adjuster, and a controller, where the first power amplifier is connected to the wavelength level adjuster. The controller includes a first input end and a control output end. The first input end is configured to receive an input optical signal, and the control output end is configured to output a first amplification control signal to the first power amplifier, and output an adjustment control signal to the wavelength level adjuster. The wavelength level adjuster is configured to perform power adjustment on each wavelength in a separate manner based on the adjustment control signal.
Optical transmission device and optical transmission system
An optical transmission device includes a reception unit that receives a first signal light and a second signal light, the first and second lights having power levels that respectively correspond to transmission distances and being transmitted; an amplification unit that amplifies the first signal light and the second signal light in accordance with a signal light having a high power level from among the received first signal light and second signal light; and a transmission unit that performs transmission of the amplified first signal light and second signal light.
LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.
FIBER LASER OSCILLATOR AND CLEAN BENCH MOUNTABLE TO THE SAME
To provide a clean bench that can prevent failure of optical components due to intrusion of dust and moisture, and enables to perform maintenance replacement of the optical unit, verification processes after replacement, etc. favorably, and a laser fiber oscillator mounting the same. A laser fiber oscillator includes a housing that accommodates an optical unit to be able to be drawn out; and a clean bench that is detachable to a side of the optical unit, and forms a closed space which is isolated from outside, above the optical unit that has been drawn out from the housing, in which a communication opening that is in communication with an internal space of the housing is formed in the clean bench.
TITANIUM-SAPPHIRE LASER APPARATUS, LASER APPARATUS USED FOR EXPOSURE APPARATUS, AND TITANIUM-SAPPHIRE AMPLIFIER
A titanium-sapphire laser apparatus may include a continuous wave oscillation laser unit, an amplification oscillator, a pulsed laser unit, an error detector, an error controller, and an optical path length corrector. The amplification oscillator may include an optical resonator and a titanium-sapphire crystal that is provided in an optical path in the optical resonator. The error detector may be provided in an optical path of leak light of seed light from the optical resonator, and may detect an optical path length error between an optical path length in the optical resonator and a positive integer multiple of a wavelength of the seed light and output an optical path length error signal. The optical path length corrector may vary the optical path length in the optical resonator on a basis of a signal resulting from adding a correction value to the optical path error signal.
Systems and Methods for Performing an Intraocular Procedure for Treating an Eye Condition
The invention provides an excimer laser system including a means for calibrating laser output to compensate for increased variation in laser optical fibers.
METHOD OF COMPENSATING WAVELENGTH ERROR INDUCED BY REPETITION RATE DEVIATION
A radiation system for controlling pulses of radiation comprising an optical element configured to interact with the pulses of radiation to control a characteristic of the pulses of radiation, an actuator configured to actuate the optical element according to a control signal received from a controller, the control signal at least partially depending on a reference pulse repetition rate of the radiation system and, a processor configured to receive pulse information from the controller and use the pulse information to determine an adjustment to the control signal. The radiation system may be used to improve an accuracy of a lithographic apparatus operating in a multi-focal imaging mode.