Patent classifications
H01S3/105
Widely tunable infrared source system and method
A system and method for tuning and infrared source laser in the Mid-IR wavelength range. The system and method comprising, at least, a plurality of individually tunable emitters, each emitter emitting a beam having a unique wavelength, a grating, a mirror positioned after the grating to receive at least one refracted order of light of at least one beam and to redirect the beam back towards the grating, and a micro-electro-mechanical systems device containing a plurality of adjustable micro-mirrors.
Widely tunable infrared source system and method
A system and method for tuning and infrared source laser in the Mid-IR wavelength range. The system and method comprising, at least, a plurality of individually tunable emitters, each emitter emitting a beam having a unique wavelength, a grating, a mirror positioned after the grating to receive at least one refracted order of light of at least one beam and to redirect the beam back towards the grating, and a micro-electro-mechanical systems device containing a plurality of adjustable micro-mirrors.
WAVELENGTH BANDWIDTH EXPANSION FOR TUNING OR CHIRPING WITH A SILICON PHOTONIC EXTERNAL CAVITY TUNABLE LASER
An external cavity diode laser has been developed to achieve a linear frequency chirp over a broad bandwidth using a silicon photonic filter chip as the external cavity. By appropriately chirping the cavity phase using the gain chip and/or a cavity phase modulator on the silicon photonic chip along with simultaneously varying the filter resonance, approximately linear frequency chirping can be accomplished for at least 50 GHz, although desirable structures with useful lesser chirp bandwidths are also described. With careful control of the chip design, it is possible to achieve predictable behavior of mode jumps along with large scannable ranges within a mode, which allows for stitching together segments of linear chirp through a mode jump to provide for very large chirp bandwidths greater than 1 THz.
Fabry-pérot element in lidar device
A measurement arrangement for measuring the travel time of a laser beam, comprising a laser device configured to emit laser light with a laser wavelength toward the surrounding environment and one or more light detectors configured to absorb inbound laser light after it has been reflected back towards the measurement arrangement. The measurement arrangement also comprises an order-sorting filter configured to transmit laser light only in a first wavelength range, and a scanning Fabry-Pérot interferometer configured to transmit laser light only in a cavity resonance wavelength range. The first wavelength range is broader than the cavity resonance wavelength range, and a control unit is configured to shift the center of the cavity resonance wavelength range when the temperature of the laser device changes.
Fabry-pérot element in lidar device
A measurement arrangement for measuring the travel time of a laser beam, comprising a laser device configured to emit laser light with a laser wavelength toward the surrounding environment and one or more light detectors configured to absorb inbound laser light after it has been reflected back towards the measurement arrangement. The measurement arrangement also comprises an order-sorting filter configured to transmit laser light only in a first wavelength range, and a scanning Fabry-Pérot interferometer configured to transmit laser light only in a cavity resonance wavelength range. The first wavelength range is broader than the cavity resonance wavelength range, and a control unit is configured to shift the center of the cavity resonance wavelength range when the temperature of the laser device changes.
OPTOMECHANIAL LASER FOR DYNAMIC MEASUREMENT
An optomechanical laser includes: a basal member; a mechanical transducer; a laser disposed on the mechanical transducer, the laser being displaced along the displacement axis in response to a displacement of the mechanical transducer relative to the basal member; a mirror disposed on the armature in optical communication with the laser and opposing the laser; the armature disposed on the basal member and rigidly connecting the mirror to the basal member such that the mirror and the armature move in synchrony with the basal member, and the armature provides a substantially constant distance between the basal member and the mirror; and a cavity comprising: the laser; the mirror; and a cavity length between the laser and the mirror that changes in response to displacement of the laser according to the displacement of the mechanical transducer relative to the basal member, the optomechanical laser providing laser light.
OPTOMECHANIAL LASER FOR DYNAMIC MEASUREMENT
An optomechanical laser includes: a basal member; a mechanical transducer; a laser disposed on the mechanical transducer, the laser being displaced along the displacement axis in response to a displacement of the mechanical transducer relative to the basal member; a mirror disposed on the armature in optical communication with the laser and opposing the laser; the armature disposed on the basal member and rigidly connecting the mirror to the basal member such that the mirror and the armature move in synchrony with the basal member, and the armature provides a substantially constant distance between the basal member and the mirror; and a cavity comprising: the laser; the mirror; and a cavity length between the laser and the mirror that changes in response to displacement of the laser according to the displacement of the mechanical transducer relative to the basal member, the optomechanical laser providing laser light.
LINE NARROWING GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
A line narrowing gas laser device includes a line narrowing device, an output coupling mirror, a laser chamber arranged on an optical path of an optical resonator, a first holder which supports the output coupling mirror, a second holder which supports the first holder to be rotatable about a rotation axis of the first holder, and an adjustment device supported by the second holder and being in contact with the first holder to rotate the first holder about the rotation axis. The line narrowing device has a characteristic of changing, into a first direction, beam pointing of laser light output toward the output coupling mirror when temperature inside the line narrowing device rises. The second holder and the adjustment device rotate the first holder in a direction in which a change in the first direction in the beam pointing of the laser light is suppressed by thermal expansion.
LINE NARROWING GAS LASER DEVICE AND ELECTRONIC DEVICE MANUFACTURING METHOD
A line narrowing gas laser device includes a line narrowing device, an output coupling mirror, a laser chamber arranged on an optical path of an optical resonator, a first holder which supports the output coupling mirror, a second holder which supports the first holder to be rotatable about a rotation axis of the first holder, and an adjustment device supported by the second holder and being in contact with the first holder to rotate the first holder about the rotation axis. The line narrowing device has a characteristic of changing, into a first direction, beam pointing of laser light output toward the output coupling mirror when temperature inside the line narrowing device rises. The second holder and the adjustment device rotate the first holder in a direction in which a change in the first direction in the beam pointing of the laser light is suppressed by thermal expansion.
ENERGETIC LASER DESIGN
An optical resonator may be provided. The optical resonator may comprise a laser system with an adjustable optical path length. The optical resonator may include a back mirror. The back mirror may include a first back mirror surface and a second back mirror surface. The first back mirror surface and may provide a first optical path length for the optical resonator if the first back mirror surface may be included in the optical path. The second back mirror may provide a second optical path length for the optical resonator if the second back mirror surface is included in the optical path.