A medical laser system for outputting laser pulses includes at least one laser cavity configured to generate at least one laser pulse, a rotating mirror configured to receive and reflect the at least one laser pulse, a beam splitter configured to receive and reflect a portion of the at least one laser pulse received from the rotating mirror, an energy-sensing device configured to detect the portion of the at least one laser pulse, an energy measurement assembly configured to generate a measurement signal based on the portion of the at least one laser pulse detected by the energy-sensing device, and a controller. The controller may include a calibration module. The calibration module may be configured to generate at least one categorized calibration table, determine calibration parameters, interpolate the calibration parameters, and cause the at least one laser cavity to generate at least one calibrated laser pulse.

An electrodeless laser-driven light source includes a laser that generates a CW sustaining light. A pump laser generates pump light. A Q-switched laser crystal receives the pump light generated by the pump laser and generates pulsed laser light at an output in response to the generated pump light. A first optical element projects the pulsed laser light along a first axis to a breakdown region in a gas-filled bulb comprising an ionizing gas. A second optical element projects the CW sustaining light along a second axis to a CW plasma region in the gas-filled bulb comprising the ionizing gas. A detector detects plasma light generated by a CW plasma and generates a detection signal at an output. A controller generates control signals that control the pump light to the Q-switched laser crystal so as to extinguish the pulsed laser light within a time delay after the detection signal exceeds a threshold level.

A passively, Q-switched laser operating at an eye safe wavelength of between 1.2 and 1.4 microns is described. The laser may operate at a lasing wavelength of 1.34 microns and use a gain element of Nd:YVO.sub.4 and a saturable absorber element of V:YAG. The systems and methods to produce short pulses having a pulse duration less than 1 ns and high energy pulses having pulse energies greater than 2 μJ are described.

Technologies pertaining to accounting for pulse history effects are described herein. In connection with accounting for pulse history effects, an amount of time between a first current pulse and a second current pulse that are to be transmitted to a pulsed laser is determined. Based upon such an amount of time, a determination is made as to whether a porch pulse is to be prepended to the second current pulse. When the porch pulse is to be prepended to the second current pulse, an amplitude and duration of the porch pulse are computed based upon the amount of time. The porch pulse is transmitted to the pulsed laser immediately followed by the second current pulse, wherein the porch pulse pre-charges the pulsed laser for emitting a pulse of light based upon the second current pulse.

Disclosed is a system for arbitrary control of amplitude, phase and polarization characteristics of light in pulsed laser systems, allowing fast pulse-to-pulse modification of the above-mentioned parameters for single pulses or arbitrarily long and closely-spaced bursts of pulses. The control uses an electro-optic device, driving it by a specially designed high voltage driver. The operation of the driving electronics is based on the precise control of charging and discharging a Pockels cell inherent capacitance. This inherent capacitance is typically considered as parasitic. Therefore, prior voltage drivers operate in spite of the capacitance instead of using it. The present high voltage driver consists of a multitude of current-controlled stages capable of sinking and sourcing specific and adjustable currents into the capacitive load of the Pockels cell. The disclosed device and the corresponding control method allow for precise and energy-efficient shaping of Pockels cell control voltage.

The present disclosure provides a method for aligning a master oscillator power amplifier (MOPA) system. The method includes ramping up a pumping power input into a laser amplifier chain of the MOPA system until the pumping power input reaches an operational pumping power input level; adjusting a seed laser power output of a seed laser of the MOPA system until the seed laser power output is at a first level below an operational seed laser power output level; and performing a first optical alignment process to the MOPA system while the pumping power input is at the operational pumping power input level, the seed laser power output is at the first level, and the MOPA system reaches a steady operational thermal state.

Method and system for a laser welding process employing the use of a single pulsed fiber laser source configured to generate a radiative output with a wavelength spectrum extending from about 1.8 microns to about 2.6 microns. In a specific case, the laser output from the single pulsed fiber laser source is focused onto the interface of the two pieces of materials at least one of which includes any of glasses, inorganic crystals, and semiconductors.

A method includes driving, while producing a burst of pulses at a pulse repetition rate, a spectral feature adjuster among a set of discrete states at a frequency correlated with the pulse repetition rate; and in between the production of the bursts of pulses (while no pulses are being produced), driving the spectral feature adjuster according to a driving signal defined by a set of parameters. Each discrete state corresponds to a discrete value of a spectral feature. The method includes ensuring that the spectral feature adjuster is in one of the discrete states that corresponds to a discrete value of the spectral feature of the amplified light beam when a pulse in the next burst is produced by adjusting one or more of: an instruction to the lithography exposure apparatus, the driving signal to the spectral feature adjuster, and/or the instruction to the optical source.

An apparatus is provided, the apparatus comprising: (i) a diode-pumped solid-state laser oscillator configured to generate a pulsed laser beam having predefined beam characteristics corresponding to a current setting selection of a controller; and (ii) an amplifier configured to amplify an energy and modify a beam profile of the pulse laser beam. A beam detector is coupled to the generated beam to monitor a combination of: (i) a beam pulse width; (ii) a beam diameter; and (iii) an energy level, and generates an error signal to be sent back as a feedback signal to the controller. The controller configures the current source to output a correction current to tune the DPSSL oscillator, the wave plate, and the first polarizer to rotate a correction polarization angle and adjust the energy amplification or temporal profile to within a defined performance tolerance.

An apparatus is provided, the apparatus comprising: (i) a diode-pumped solid-state laser oscillator configured to generate a pulsed laser beam having predefined beam characteristics corresponding to a current setting selection of a controller; and (ii) an amplifier configured to amplify an energy and modify a beam profile of the pulse laser beam. A beam detector is coupled to the generated beam to monitor a combination of: (i) a beam pulse width; (ii) a beam diameter; and (iii) an energy level, and generates an error signal to be sent back as a feedback signal to the controller. The controller configures the current source to output a correction current to tune the DPSSL oscillator, the wave plate, and the first polarizer to rotate a correction polarization angle and adjust the energy amplification or temporal profile to within a defined performance tolerance.