A laser system may include one or more seed lasers to generate a pulsed seed beam including one or more laser pulses, a pulse pattern generator to generate an intermediate patterned burst-mode beam from at least one laser pulse from the pulsed seed beam, where the pulse pattern generator includes splits the at least one laser pulse from the pulsed seed beam along two or more delay paths and combines light along the two or more delay paths to a common optical path, and where the intermediate patterned burst-mode beam includes laser pulses with a selected pattern of inter-pulse spacings associated with the two or more delay paths. The laser system may further include power amplifiers to amplify the intermediate patterned burst-mode beam to form an amplified patterned burst-mode beam, where the amplified patterned burst-mode beam includes amplified laser pulses with the selected pattern of inter-pulse spacings.

A laser system produces pulses having wavelengths between 2000 nm and 2100 nm, peak output powers greater than 1 kW, average powers greater than 10 W, pulse widths variable from 0.5 to 10 nsec, pulse repetition frequencies variable from 0.1 to over 2 MHz, and a pulse extinction of at least 60 dB. Pulses from a diode laser having a wavelength between 1000 nm and 1100 nm are amplified by at least one fiberoptic amplifier and applied as the pump input to an Optical Parametric Amplifier (OPA). A cw laser provides an OPA seed input at a wavelength between 2000 nm and 2200 nm. The idler output of the OPA having difference frequency wavelength between 2000 nm and 2100 nm is further amplified by a crystal amplifier. The fiberoptic amplifier can include Ytterbium-doped fiberoptic. The crystal amplifier can include a Ho:YAG, Ho:YLF, Ho:LuAG, and/or a Ho:Lu2O3 crystal.

A method for generating gigahertz bursts of laser pulses is provided, where: 1) time delay T2 of the delayed part with respect to the undelayed part of the input pulse is longer than a time period T1 between said input pulse and the next input pulse; 2) the bursts of output pulses have an incrementally increasing number of pulses; 3) intra-burst pulse separation inside the formed bursts is equal to T3=T2−T1 and corresponds to an ultra-high pulse repetition rate higher than 100 MHz. In another embodiment: 1) T2 is longer than M*T1, where M=2, 3, etc.; 2) output train of bursts is composed of bursts of pulses wherein M adjacent bursts have identical number of pulses; 3) T3 is equal to T3=T2−M*T1. The laser apparatus for implementing the method is provided.

A laser processing method of performing laser processing on a transparent material that is transparent to ultraviolet light by using a laser processing system includes: performing relative positioning of a transfer position of a transfer image and the transparent material in an optical axis direction of a pulse laser beam so that the transfer position is set at a position inside the transparent material at a predetermined depth ΔZsf from a surface of the transparent material in the optical axis direction; and irradiating the transparent material with the pulse laser beam having a pulse width of 1 ns to 100 ns inclusive and a beam diameter of 10 μm to 150 μm inclusive at the transfer position.

An optically amplified repeater system includes optical transmission paths, a multi-channel optical amplifier, one or more Raman amplification pumping light sources, and a wavelength multiplexer. The multi-channel optical amplifier includes K simultaneous pumping light sources, N optical amplification media, and one or more optical couplers, and simultaneously amplifies, with the K simultaneous pumping light sources, light intensities of optical signals that pass through the N optical amplification media and propagate through the optical transmission paths. Light intensities of the wavelength band of the optical signals is Raman amplified by the Raman amplification pumping light. A light intensity of the Raman amplification pumping light output from the one or more Raman amplification pumping light sources is determined in accordance with characteristic differences between the optical signals passing through the optical transmission paths.

A spectral feature selection apparatus includes a dispersive optical element arranged to interact with a pulsed light beam; three or more refractive optical elements arranged in a path of the pulsed light beam between the dispersive optical element and a pulsed optical source; and one or more actuation systems, each actuation system associated with a refractive optical element and configured to rotate the associated refractive optical element to thereby adjust a spectral feature of the pulsed light beam. At least one of the actuation systems is a rapid actuation system that includes a rapid actuator configured to rotate its associated refractive optical element about a rotation axis. The rapid actuator includes a rotary stepper motor having a rotation shaft that rotates about a shaft axis that is parallel with the rotation axis of the associated refractive optical element.

A pulse width extension device includes a first delay optical system having a first loop optical path formed on a first plane and configured by a first beam splitter and a plurality of first concave mirrors, a second delay optical system having a second loop optical path formed on a second plane parallel to and different from the first plane and configured by a second beam splitter and a plurality of second concave mirrors, and a first beam rotation mechanism arranged on an optical path between the first delay optical system and the second delay optical system and configured to rotate a beam of pulse laser light having passed through the first delay optical system so that a longitudinal direction of a beam cross-sectional shape of the pulse laser light traveling on the second loop optical path is perpendicular to the second plane.

A frequency conversion laser system is configured with a single mode (SM) laser source outputting a pulsed pump beam at a fundamental frequency and a nonlinear optical system operating to convert the fundamental frequency sequentially to a second harmonic (SH) and then third harmonic (TH). The nonlinear optical system includes an elongated SHG crystal traversed by the SM pulsed pump beam which generates the SH beam. The SHG crystal has an output surface inclined relative to a longitudinal axis of the SHG crystal at a first wedge angle different from a right angle. The nonlinear optical system further has an elongated THG crystal with an input surface which is impinged upon by a remainder of the pump and SHG beams which propagate through the THG crystal at a walk-off angle therebetween to generate a third harmonic (TH) beam, the input surface of the THG crystal being inclined to a longitudinal axis of the THG crystal at a second wedge angle. The output and input surfaces of respective SHG and THG crystals are inclined so as to minimize the walk-off angle between SH and IR pointing vectors in the THG crystal thereby improving the conversion efficiency and TH output beam's ellipticity.

A method and system for amplifying seed laser radiation which is irradiated along an irradiation direction into a lasing amplification medium has a transverse seed laser intensity profile that is transformed into a plateaued input intensity profile by a transformer element on the irradiation side.

A laser processing system includes: a wavelength-variable laser device configured to output each of a laser beam at an absorption line as a wavelength at which light is absorbed by oxygen and a laser beam at a non-absorption line as a wavelength at which the amount of light absorption by oxygen is smaller than at the absorption line; an optical system configured to irradiate a workpiece with the laser beam; and a laser control unit configured to control the wavelength-variable laser device, set the wavelength of the laser beam output from the wavelength-variable laser device to be the non-absorption line when laser processing is performed on the surface of the workpiece in gas containing oxygen, and set the wavelength of the laser beam output from the wavelength-variable laser device to be the absorption line when ozone cleaning is performed on the surface of the workpiece in gas containing oxygen.