H03H3/08

ACOUSTIC WAVE DEVICE AND METHOD OF MANUFACTURING THE SAME
20220407494 · 2022-12-22 · ·

An acoustic wave device including: a POI structure including: a material layer where a high acoustic velocity layer and a low acoustic velocity layer are alternate, a substrate is a lowermost high acoustic velocity layer; a first piezoelectric layer located above the material layer, wherein a layer adjacent to the first piezoelectric layer is referred to as a surface low acoustic velocity layer; wherein an acoustic velocity of a bulk wave propagated in the high acoustic velocity layer and the low high acoustic velocity layer is higher than and lower than an acoustic velocity of a bulk wave of the first piezoelectric layer, respectively. The POI structure includes at least two regions, a first device having a resonance of a first vibration mode is manufactured in the first region, and a second device having a resonance of a second vibration mode is manufactured in a second region.

Elastic wave device
11533038 · 2022-12-20 · ·

An elastic wave device includes a substrate, an IDT electrode, a spacer layer, a cover, and a protective layer. The spacer layer is provided on the substrate and surrounds the IDT electrode. The cover is provided on the spacer layer, is spaced apart from the IDT electrode, and includes a first main surface adjacent to the spacer layer and a second main surface facing the first main surface. The protective layer includes a third main surface contacting the second main surface, a fourth main surface facing the third main surface, and a side surface connected to the fourth main surface. In at least portion of the side surface of the protective layer, a portion including an intersection line between the side surface and the fourth main surface is located farther inward than an outer edge of the substrate in plan view in the thickness direction of the substrate.

Elastic wave device
11533038 · 2022-12-20 · ·

An elastic wave device includes a substrate, an IDT electrode, a spacer layer, a cover, and a protective layer. The spacer layer is provided on the substrate and surrounds the IDT electrode. The cover is provided on the spacer layer, is spaced apart from the IDT electrode, and includes a first main surface adjacent to the spacer layer and a second main surface facing the first main surface. The protective layer includes a third main surface contacting the second main surface, a fourth main surface facing the third main surface, and a side surface connected to the fourth main surface. In at least portion of the side surface of the protective layer, a portion including an intersection line between the side surface and the fourth main surface is located farther inward than an outer edge of the substrate in plan view in the thickness direction of the substrate.

Elastic wave device

An elastic wave device includes a piezoelectric film, a high acoustic velocity member, a low acoustic velocity film located between the piezoelectric film and the high acoustic velocity member and through which an elastic wave propagates at a lower acoustic velocity than an elastic wave that propagates through the piezoelectric film, and an interdigital transducer electrode including electrode fingers separated from each other and disposed side by side in a first direction. At least one of the electrode fingers includes a first metal layer including first and second main body portions. A recessed portion is located in a central region in the first direction of the electrode finger and is recessed in the thickness direction of the piezoelectric film. A protrusion portion protrudes from at least a portion of the first main body portion in the first direction.

Elastic wave device

An elastic wave device includes a piezoelectric film, a high acoustic velocity member, a low acoustic velocity film located between the piezoelectric film and the high acoustic velocity member and through which an elastic wave propagates at a lower acoustic velocity than an elastic wave that propagates through the piezoelectric film, and an interdigital transducer electrode including electrode fingers separated from each other and disposed side by side in a first direction. At least one of the electrode fingers includes a first metal layer including first and second main body portions. A recessed portion is located in a central region in the first direction of the electrode finger and is recessed in the thickness direction of the piezoelectric film. A protrusion portion protrudes from at least a portion of the first main body portion in the first direction.

MULTILAYER PIEZOELECTRIC SUBSTRATE FOR ACOUSTIC WAVE DEVICE
20220399871 · 2022-12-15 ·

A surface acoustic wave device has a piezoelectric substrate having a cut angle (e.g., the piezoelectric angle is cut so as to have a crystal orientation) that allows the surface acoustic wave device to operate as a longitudinally leaky surface acoustic wave device that confines the acoustic wave energy within the piezoelectric substrate and that has less propagation attenuation and a higher electromechanical coupling coefficient k.sup.2.

COMPOSITE SUBSTRATE AND METHOD OF PRODUCING COMPOSITE SUBSTRATE
20220399872 · 2022-12-15 · ·

A composite substrate according to includes: a support substrate; and a piezoelectric layer arranged on one side of the support substrate, wherein an amplitude of a waviness having a spatial frequency of more than 0.045 cyc/mm according to a shape of the support substrate is 10 nm or less.

COMPOSITE SUBSTRATE AND METHOD OF PRODUCING COMPOSITE SUBSTRATE
20220399872 · 2022-12-15 · ·

A composite substrate according to includes: a support substrate; and a piezoelectric layer arranged on one side of the support substrate, wherein an amplitude of a waviness having a spatial frequency of more than 0.045 cyc/mm according to a shape of the support substrate is 10 nm or less.

COMPOSITE SUBSTRATE AND METHOD OF PRODUCING COMPOSITE SUBSTRATE
20220399873 · 2022-12-15 · ·

A composite substrate includes in this order: a support substrate; an intermediate layer; and a piezoelectric layer, wherein the intermediate layer contains bubbles.

Printing components to substrate posts

A method of printing comprises providing a component source wafer comprising components, a transfer device, and a patterned substrate. The patterned substrate comprises substrate posts that extend from a surface of the patterned substrate. Components are picked up from the component source wafer by adhering the components to the transfer device. One or more of the picked-up components are printed to the patterned substrate by disposing each of the one or more picked-up components onto one of the substrate posts, thereby providing one or more printed components in a printed structure.