An electronic oven with a set of variable reflectance elements for controlling a distribution of heat in the electronic oven and associated methods are disclosed herein. The electronic oven includes a chamber, an energy source coupled to an injection port in the chamber, and a set of variable reflectance elements located in the chamber. In some of the disclosed approaches the variable reflectance elements are nonradiative. A control system of the electronic oven can be configured to alter the states of the variable reflectance elements to thereby alter and control the distribution of energy within the chamber.

A method of mounting electronic devices, including the steps of: irradiating with microwaves a board for mounting electronic devices including a base, a plurality of solder parts on the base, and a plurality of electronic devices corresponding to the plurality of solder parts placed in contact with the plurality of solder parts, the microwave irradiation is performed in a state in which electromagnetic shielding is performed for some of the plurality of solder parts; and heating and melting at least the solder parts for which the electromagnetic shielding is not performed by an action of a magnetic field of a standing wave formed by the microwave irradiation.

A method of mounting electronic devices, including the steps of: irradiating with microwaves a board for mounting electronic devices including a base, a plurality of solder parts on the base, and a plurality of electronic devices corresponding to the plurality of solder parts placed in contact with the plurality of solder parts, the microwave irradiation is performed in a state in which electromagnetic shielding is performed for some of the plurality of solder parts; and heating and melting at least the solder parts for which the electromagnetic shielding is not performed by an action of a magnetic field of a standing wave formed by the microwave irradiation.

The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected P.sub.R(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f.sub.(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power P.sub.R(i) and/or to adjust the transmitted power P.sub.T(i).

The invention relates to a facility (1) for microwave treatment of a load, including: at least one application device (30); at least one solid-state generator (4) in the field of microwaves, connected to at least one application device by a means for guiding (5) the electromagnetic wave; at least one frequency adjustment system (40) designed for adjusting the frequency of the wave produced by the corresponding generator (4); a measurement system (31) for the or each application device (30), designed for measuring the power reflected P.sub.R(i) by the application device (30); an automated control means (6) connected to each frequency adjustment system (40) and to each measurement system (31) in order to control the adjustment of the frequency f.sub.(i) of the electromagnetic wave according to the reflected power, in order to adjust the reflected power P.sub.R(i) and/or to adjust the transmitted power P.sub.T(i).

The present application in particular is directed to a microwave oven cavity (1). In order to obtain uniform heating and excellent heating efficiency, at least one inner wall (4) comprises at least one Fresnel reflective element (7) adapted to reflect microwaves coupled into the cavity (1) from a microwave source (5).

The present application in particular is directed to a microwave oven cavity (1). In order to obtain uniform heating and excellent heating efficiency, at least one inner wall (4) comprises at least one Fresnel reflective element (7) adapted to reflect microwaves coupled into the cavity (1) from a microwave source (5).

A microwave oven comprising a cavity in which a material can be placed for heating and a magnetron for generating a microwave. The microwave oven further comprises an electromagnetic element adapted to interact with microwaves into the cavity and a control unit that provides a control signal to the electromagnetic element for modifying an impedance of the electromagnetic element during time of heating.

A microwave oven comprising a cavity in which a material can be placed for heating and a magnetron for generating a microwave. The microwave oven further comprises an electromagnetic element adapted to interact with microwaves into the cavity and a control unit that provides a control signal to the electromagnetic element for modifying an impedance of the electromagnetic element during time of heating.

A microwave irradiation device includes: a retainer configured to retain an irradiated object at a retaining position; a power feed tool configured to electrically be conductive with an oscillator; a power feed antenna configured to emit a microwave by power feed through conduction via the power feed tool, the power feed antenna having directivity and being arranged with an irradiation axis facing the retaining position; and a parasitic antenna that has directivity but is not fed with power, the parasitic antenna being arranged to face the power feed antenna across the retaining position and having an irradiation axis facing the retaining position.