Patent classifications
H05H1/2406
Plasma photonic crystals with integrated plasmonic arrays in a microtubular frame
The invention provides a microplasma photonic crystal for reflecting, transmitting and/or storing incident electromagnetic energy includes a periodic array of elongate microtubes confining microplasma therein and having a column-to-column spacing, average electron density and plasma column diameter selected to produce a photonic response to the incident electromagnetic energy entailing the increase or suppression of crystal resonances and/or shifting the frequency of the resonances. The crystal also includes electrodes for stimulating microplasma the elongated microtubes Electromagnetic energy can be interacted with the periodic array of microplasma to reflect, transmit and/or trap the incident electromagnetic energy.
COLD PLASMA GENERATING SYSTEM
A system for generating cold plasma is presented, suitable for use in in-vivo treatment of biological tissue. The system comprising: a control unit connectable to an elongated member at a first proximal end of the elongated member. The elongated member comprises a plasma generating unit at a second distal end thereof and gas and electricity transmission channels extending from said first proximal end towards said plasma generating unit. The control unit comprises a gas supply unit configured to provide predetermined flow rate of selected gas composition through said gas transmission channel and a power supply unit configured to generate selected sequence of high-frequency electrical pulses, typically in mega Hertz range, directed through said electricity transmission channel, thereby providing power and gas of said selected composition to the plasma generating unit for generating cold plasma.
DEVICES, SYSTEMS, AND METHODS FOR STERILIZATION, DISINFECTION, SANITIZATION AND DECONTAMINATION
A sterilization, disinfection, sanitization, or decontamination system having a chamber defining a region, and a generator for creating a free radical effluent with reactive oxygen, nitrogen, and other species and/or a vaporizer. A closed loop circulating system without a free-radical destroyer is provided for supplying the mixture of free radicals from the generator mixed with the hydrogen peroxide solution in the form of the effluent to the chamber. The system is used in sterilizing, disinfecting, sanitizing, or decontaminating items in the chamber or room and, with a wound chamber, in treating wounds on a body. The wound chamber may be designed to maintain separation from wounds being treated. Various embodiments can control moisture to reduce or avoid unwanted condensation. Some embodiments can be incorporated into an appliance having a closed space, such as a washing machine. Some embodiments may include a residual coating device that deposits a bactericidal coating on sterilized items.
Dielectric Barrier Discharge Device
A dielectric barrier discharge actuator comprising a first electrode disposed adjacent on a surface of a dielectric; a second electrode disposed under the surface and downstream of the first electrode, relative to a flow direction of an ionized layer; an electrical ballast, a third electrode disposed on the surface of the dielectric downstream from the second electrode, connected to the second electrode through the ballast; a series of equal potential strips disposed across the surface of the dielectric and aligned perpendicular to the flow direction of the ionized layer; and a voltage source for applying a voltage across the first and second electrodes, to cause ionization of air between the first electrode and the surface of the dielectric, and to accelerate the ions across the surface of the dielectric; whereby an ionized layer is created when the first electrode is energized by the voltage source.
Liquid plasma discharge device and method for biodiesel synthesis using same
A process comprises feeding a stream of reactant compounds to a reactor and discharging a liquid plasma into the reactant stream in the reactor, wherein the plasma initiates or accelerates a reaction of the reactant compounds to form a product composition. The reactor can comprise one or more chambers, a high-voltage electrode positioned at a first portion of the one or more chambers, a ground electrode positioned at a second portion of the one or more chambers, and a dielectric plate between the ground electrode and the high-voltage electrode that comprises openings through which the reactant stream can pass from the first portion to the second portion or from the second portion to the first portion. Discharging the plasma can include supplying electrical power to the high-voltage electrode such that plasma is discharged where the reactant stream flows through the openings.
PLASMA LIQUID GENERATING DEVICE
A plasma liquid generating device includes a plasma generating module, a driving circuit, an adjust-controlling module and a mixing structure. The driving circuit is coupled with the plasma generating module and configured to drive the plasma generating module to generate first type plasma particles and second type plasma particles. The adjust-controlling module is coupled with the driving circuit and configured to control the driving circuit to adjust a proportion of the first type plasma particles and the second type plasma particles generated by the plasma generating module. The mixing structure connects with the plasma generating module and configured to mix the first type plasma particles, the second type plasma particles and a liquid so as to produce a plasma liquid.
LOW PRESSURE DIELECTRIC BARRIER DISCHARGE PLASMA THRUSTER
Some embodiments of the invention include a thruster system comprising a thruster and a pulsing power supply. The thruster may include a gas inlet port; a plasma jet outlet; and a first electrode. In some embodiments, the pulsing power supply may provide an electrical potential to the first electrode with a pulse repetition frequency greater than 10 kHz, a voltage greater than 5 kilovolts. In some embodiments, the pressure downstream from the thruster can be less than 10 Torr. In some embodiments, when a plasma is produced within the thruster by energizing a gas flowing into the thruster through the gas inlet port, the plasma is expelled from the thruster through the plasma jet outlet.
PLASMA LIQUID GENERATING DEVICE
A plasma liquid generating device includes a tube, a plasma generating module, a flow limiting unit, and a position limiting member. The tube has at least an air inlet and a flow channel outlet. The plasma generating module is disposed adjacent to the air inlet and configured to generate plasma. The flow limiting unit is detachably disposed in the tube, and a distance between the flow limiting unit and the flow channel outlet is greater than a distance between the air inlet and the flow channel outlet. The position limiting member is detachably disposed at the flow channel outlet to limit the position of the flow limiting unit.
Systems and methods for treating harmful biological contaminants in HVAC systems
Harmful biological contaminants are treated using plasma fields. The inventive techniques offer improved results over existing devices and methods.
Processing target reforming apparatus, printing apparatus, printing system, and method
A processing target reforming apparatus includes: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode.