Patent classifications
H05H1/26
MAGNETIZED PLASMOID INJECTION DEVICE
A magnetized plasmoid injection device including a cylindrical external electrode, a cylindrical internal electrode coaxially disposed inside the external electrode, a plasma generating gas supply unit that supplies plasma generating gas in a pulse shape between the external electrode and the internal electrode, a magnetic field generation unit that applies a magnetic field that generates magnetized plasmoid between the external electrode and the internal electrode, a power supply control unit that applies a discharge voltage between the external electrode and the internal electrode, and an impurity generation unit that contains an impurity in the magnetized plasmoid, the impurity generation unit having a cover electrode that opens to the external electrode, a thin-rod electrode that is located inside the cover electrode and is formed of an impurity, and an impurity generation power supply that applies a voltage to the cover electrode and the thin-rod electrode.
COVETIC MATERIALS
This disclosure provides a graded composition including at least a first, second, and third material property zone each having a crystallographic configuration distinct from other zones. In some implementations, the graded composition has a first material in the first material property zone including a metal, the first material composed of metallic bonds between metal atoms present in the first material property zone; a second material that at least partially overlaps the first material in the first material property zone including carbon, the second material composed of covalent bonds between the carbon in the second material and the metal in the first material; and, a third material that at least partially overlaps the second material property zone including carbon, the third material composed of covalent bonds between the carbon of the third material. Each crystallographic configuration may include a cubic crystallographic lattice, a hexagonal lattice, a face or body-centered cubic lattice.
Plasma torch system
Provided is a fluid-cooled melting tool that can be used in methods and systems for manufacturing objects by additive manufacturing techniques, especially titanium and titanium alloy objects. In some configurations, the melting tool is configured to be a plasma transferred arc (PTA) torch and the deposition rate can be increased by increasing the flow rate of electric charge through the electrode made possible by the dual circuit cooling design of the torch. The fluid-cooled melting tools provided herein exhibit stable and repeatable PTA characteristics over wide range of current including current of 400 amps or more, whether pulsed or non-pulsed, and plasma gas flow inputs.
Plasma torch system
Provided is a fluid-cooled melting tool that can be used in methods and systems for manufacturing objects by additive manufacturing techniques, especially titanium and titanium alloy objects. In some configurations, the melting tool is configured to be a plasma transferred arc (PTA) torch and the deposition rate can be increased by increasing the flow rate of electric charge through the electrode made possible by the dual circuit cooling design of the torch. The fluid-cooled melting tools provided herein exhibit stable and repeatable PTA characteristics over wide range of current including current of 400 amps or more, whether pulsed or non-pulsed, and plasma gas flow inputs.
Consumable assembly with internal heat removal elements
A consumable assembly for a plasma arc torch is provided, the consumable assembly including an electrode provided within an interior of a nozzle. The electrode may include a sidewall having one or more fluid passageways formed therethrough, an end wall extending from a distal end of the sidewall, and a central cavity defined by an inner surface of the sidewall and the end wall, the central cavity extending between distal and proximal ends of the electrode. The electrode may further include a heat removal element extending into the central cavity from the inner surface of the sidewall. In one embodiment, the consumable assembly includes a current and gas conduit at the proximal end of the electrode, the current and gas conduit including an interior bore radially aligned with the electrode for collectively delivering a plasma gas, a shield gas, and a vent gas into the central cavity of the electrode.
Consumable assembly with internal heat removal elements
A consumable assembly for a plasma arc torch is provided, the consumable assembly including an electrode provided within an interior of a nozzle. The electrode may include a sidewall having one or more fluid passageways formed therethrough, an end wall extending from a distal end of the sidewall, and a central cavity defined by an inner surface of the sidewall and the end wall, the central cavity extending between distal and proximal ends of the electrode. The electrode may further include a heat removal element extending into the central cavity from the inner surface of the sidewall. In one embodiment, the consumable assembly includes a current and gas conduit at the proximal end of the electrode, the current and gas conduit including an interior bore radially aligned with the electrode for collectively delivering a plasma gas, a shield gas, and a vent gas into the central cavity of the electrode.
Adjustable sample floor for ultrafast signal washout
Systems and methods for an adjustable sample floor for ultrafast signal washout are disclosed. In an embodiment. A target support configured to adjustably support a target within a sample chamber may include: a support frame that may configured to be inserted into the sample chamber, a support platform that may be disposed within the support frame, and a platform adjustment system that may be coupled to the support frame and the support platform. The platform adjustment system may be configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber.
Adjustable sample floor for ultrafast signal washout
Systems and methods for an adjustable sample floor for ultrafast signal washout are disclosed. In an embodiment. A target support configured to adjustably support a target within a sample chamber may include: a support frame that may configured to be inserted into the sample chamber, a support platform that may be disposed within the support frame, and a platform adjustment system that may be coupled to the support frame and the support platform. The platform adjustment system may be configured to adjust at least one of: a position and an orientation of the support platform relative to the support frame when the support frame is inserted into the sample chamber.
SPHEROIDAL TITANIUM METALLIC POWDERS WITH CUSTOM MICROSTRUCTURES
Methodologies, systems, and devices are provided for producing metal spheroidal powder products. By utilizing a microwave plasma, control over spheriodization and resulting microstructure can be tailored to meet desired demands.
SPHEROIDAL TITANIUM METALLIC POWDERS WITH CUSTOM MICROSTRUCTURES
Methodologies, systems, and devices are provided for producing metal spheroidal powder products. By utilizing a microwave plasma, control over spheriodization and resulting microstructure can be tailored to meet desired demands.