The invention includes a gas processing system for transforming a hydrocarbon-containing inflow gas into outflow gas products, where the system includes a gas delivery subsystem, a plasma reaction chamber, and a microwave subsystem, with the gas delivery subsystem in fluid communication with the plasma reaction chamber, so that the gas delivery subsystem directs the hydrocarbon-containing inflow gas into the plasma reaction chamber, and the microwave subsystem directs microwave energy into the plasma reaction chamber to energize the hydrocarbon-containing inflow gas, thereby forming a plasma in the plasma reaction chamber, which plasma effects the transformation of a hydrocarbon in the hydrocarbon-containing inflow gas into the outflow gas products, which comprise acetylene and hydrogen. The invention also includes methods for the use of this gas processing system.

Described is an apparatus for guiding an electromagnetic microwave, having: antenna surrounding walls, which define an interior space so as to surround therein at least an end region of an antenna of a microwave source, in particular laterally annularly as well as frontally; waveguide boundary walls, at least two of which are arranged in parallel to each other, wherein the waveguide boundary walls form a, in particular cuboid-shaped, waveguide having a substantially rectangular cross-section, wherein a cross-sectional plane is defined by a first direction that extends along a longitudinal direction of the antenna and a second direction that extends perpendicularly to the first direction, wherein it holds: 25>a/b>3, wherein a: is a width of the waveguide along the second direction, b: is a height of the waveguide along the first direction, wherein the apparatus is designed to let proceed a microwave from the interior space of the antenna surrounding walls into the waveguide.

An array antenna radiates an electromagnetic wave into a chamber of a plasma processing apparatus. The array antenna includes antennas and coupling prevention elements arranged at intervals between the antennas. Each of the coupling prevention elements includes a first member connected to a ceiling wall which is a ground surface in the chamber and a second member connected to a tip end of the first member or a vicinity of the tip end of the first member.

An array antenna radiates an electromagnetic wave into a chamber of a plasma processing apparatus. The array antenna includes antennas and coupling prevention elements arranged at intervals between the antennas. Each of the coupling prevention elements includes a first member connected to a ceiling wall which is a ground surface in the chamber and a second member connected to a tip end of the first member or a vicinity of the tip end of the first member.

The device for treatment of liquids by the help of generation of an electrically powered discharge of low-temperature plasma in liquid environment where is, when the liquid flows, possible to achieve generation of cavitation or super-cavitation which consists of mutually in series connected a pressure regulator and a cavitation tube which is formed by two mutually connected inlet chamber, confusor, working chamber, diffusor and a discharge chamber, where the essence of the invention is that there is in the inlet chamber in its lengthwise axis in direction of liquid flow placed a powered electrode which by its free end reaches into the working chamber and to it is electrically conductive connected a high voltage source whereas the powered electrode is electrically insulated from the body of the cavitation tube and also is in the discharge chamber placed a grounding electrode which is in electric contact with the liquid. Further is the essence of the invention the method of treatment of liquids by the help of this device.

The device for treatment of liquids by the help of generation of an electrically powered discharge of low-temperature plasma in liquid environment where is, when the liquid flows, possible to achieve generation of cavitation or super-cavitation which consists of mutually in series connected a pressure regulator and a cavitation tube which is formed by two mutually connected inlet chamber, confusor, working chamber, diffusor and a discharge chamber, where the essence of the invention is that there is in the inlet chamber in its lengthwise axis in direction of liquid flow placed a powered electrode which by its free end reaches into the working chamber and to it is electrically conductive connected a high voltage source whereas the powered electrode is electrically insulated from the body of the cavitation tube and also is in the discharge chamber placed a grounding electrode which is in electric contact with the liquid. Further is the essence of the invention the method of treatment of liquids by the help of this device.

A measurement system including an imaging device and a plasma processing device having a plasma generator configured to generate plasma from a gas supplied into a processing chamber and a controller. The imaging device is configured to generate optical information of the plasma from image data of imaged plasma in the processing chamber, and the controller is configured to convert the generated optical information of the plasma into a plasma parameter that determines physical characteristics of the plasma with reference to a storage that stores correlation information between the optical information of the plasma and measurement results of the plasma parameter.

A plasma processing apparatus, which introduces electromagnetic waves having a frequency of the VHF band or higher into a processing container and processes a substrate by using plasma generated from a gas, includes: a stage which is provided inside the processing container and on which the substrate is placed; an electromagnetic wave introducer formed to face an inner wall of the processing container and configured to introduce the electromagnetic waves into the processing container; and a dielectric member provided on the inner wall through which the electromagnetic waves propagate, wherein a first portion of the dielectric member protrudes from the inner wall toward the stage, and wherein a second portion of the dielectric member is inserted into a recess or step portion of the inner wall.

According to the present invention, provided is an antenna mechanism 3 that adjusts the impedance of an antenna body through which a high-frequency current flows to generate plasma by means of a simple configuration, and generates plasma P, and comprises: the antenna body 31 through which high-frequency current flows; and one or a plurality of adjustment circuits 32 provided adjacent to the antenna body 31. The adjustment circuit 32 has a metal conductor 321 forming a closed circuit and a capacitor 322 forming the closed circuit.

A technique protects a mask in plasma etching of a silicon-containing film. An etching method includes providing a substrate in a chamber included in a plasma processing apparatus. The substrate includes a silicon-containing film and a mask. The mask contains carbon. The etching method further includes etching the silicon-containing film with a chemical species in plasma generated from a process gas in the chamber. The process gas contains a halogen and phosphorus. The etching includes forming a carbon-phosphorus bond on a surface of the mask.