Patent classifications
H05H1/48
LOW PRESSURE PLASMA SPRAYING
A low pressure plasma spraying method includes turning working gas into plasma by direct-current arc to generate a plasma jet while setting a plasma power source output to 2 to 10 kW in a pressure reducing vessel and feeding raw material powder having an average particle size of 1 to 10 μm into the plasma jet from feeding ports of a thermal spraying gun to form a thermal sprayed coating, which can suppress transformation of the raw material powder and form a dense coating.
COMPOSITE OPTICAL FIBRE BASED PLASMA GENERATION DEVICE
A device for generating a plasma and detecting a light signal. The plasma being intended to be generated in the vicinity of a study area of a sample and the light signal originating in the study area. The device including a current generator, an analysis unit, and an electrical and optical waveguide including means for transmitting an electric current configured to generate a plasma at one end of the means for transmitting the electric current in the vicinity of the study zone, means for detecting and transmitting configured to detect and transmit the light signal from the study area to the analysis unit, and an optical cladding portion, the means for transmitting the electric current and the means for detecting and transmitting the light signal being accommodated in the optical cladding portion.
MIST GENERATOR, THIN FILM MANUFACTURING DEVICE, AND THIN FILM MANUFACTURING METHOD
Provided is a mist generator including: a container that stores a liquid; a gas supply unit that supplies a gas into the container; and an electrode that generates plasma of the gas between the electrode and the liquid, where the supply direction of the gas fed from the gas supply opening of the gas supply unit is different from a direction in which gravity acts.
MIST GENERATOR, THIN FILM MANUFACTURING DEVICE, AND THIN FILM MANUFACTURING METHOD
Provided is a mist generator including: a container that stores a liquid; a gas supply unit that supplies a gas into the container; and an electrode that generates plasma of the gas between the electrode and the liquid, where the supply direction of the gas fed from the gas supply opening of the gas supply unit is different from a direction in which gravity acts.
MODULE FOR FUELING HYDROGEN CELL BY USING HYDROGEN PRODUCTION AND PURIFICATION DEVICE
A module for fueling a hydrogen cell is provided including a hydrogen production device, a hydrogen purification device and a hydrogen cell power generation system. The hydrogen production device comprises: a housing, a cavity being formed in the housing, and a first opening, a second opening and a third opening which all communicate with the cavity being formed in the housing; a plasma generating unit contained in the cavity and comprising a first electrode and a second electrode, the first electrode being close to the first opening, and the second electrode being close to the second opening; a voltage supply unit, a power supply end of the voltage supply unit being electrically connected to the first electrode and the second electrode, and a potential difference exists between the first electrode and the second electrode to generate plasma; a feeding unit communicating with the first opening; and an exhaust unit.
MODULE FOR FUELING HYDROGEN CELL BY USING HYDROGEN PRODUCTION AND PURIFICATION DEVICE
A module for fueling a hydrogen cell is provided including a hydrogen production device, a hydrogen purification device and a hydrogen cell power generation system. The hydrogen production device comprises: a housing, a cavity being formed in the housing, and a first opening, a second opening and a third opening which all communicate with the cavity being formed in the housing; a plasma generating unit contained in the cavity and comprising a first electrode and a second electrode, the first electrode being close to the first opening, and the second electrode being close to the second opening; a voltage supply unit, a power supply end of the voltage supply unit being electrically connected to the first electrode and the second electrode, and a potential difference exists between the first electrode and the second electrode to generate plasma; a feeding unit communicating with the first opening; and an exhaust unit.
ARC ION COATING DEVICE AND COATING METHOD
The present disclosure relates to an arc ion coating device and a coating method. The arc ion coating device includes: a vacuum chamber with a vacuum environment inside; an arc generation component disposed in the vacuum chamber and comprising a cathode target, an anode and an arc starter, the cathode target being columnar and configured to release plasmas, and the arc starter being disposed between the cathode target and the anode and configured to generate charged particles to guide a generation of an arc between a side of the cathode target and the anode to coat a workpiece; a support frame disposed in the vacuum chamber, the support frame being disposed at a side of the anode away from the cathode target and configured for a placement of the workpiece; and a power supply component comprising an arc power supply and a first accumulator, the arc power supply having a first output end and a second output end, the first output end being configured to output a pulsed voltage and connected to the arc starter, the second output end being configured to output an adjustable DC voltage and charge the first accumulator, and a negative pole and a positive pole of the first accumulator being connected to the cathode target and the anode, respectively.
ARC ION COATING DEVICE AND COATING METHOD
The present disclosure relates to an arc ion coating device and a coating method. The arc ion coating device includes: a vacuum chamber with a vacuum environment inside; an arc generation component disposed in the vacuum chamber and comprising a cathode target, an anode and an arc starter, the cathode target being columnar and configured to release plasmas, and the arc starter being disposed between the cathode target and the anode and configured to generate charged particles to guide a generation of an arc between a side of the cathode target and the anode to coat a workpiece; a support frame disposed in the vacuum chamber, the support frame being disposed at a side of the anode away from the cathode target and configured for a placement of the workpiece; and a power supply component comprising an arc power supply and a first accumulator, the arc power supply having a first output end and a second output end, the first output end being configured to output a pulsed voltage and connected to the arc starter, the second output end being configured to output an adjustable DC voltage and charge the first accumulator, and a negative pole and a positive pole of the first accumulator being connected to the cathode target and the anode, respectively.
Dense plasma focus apparatus
In an aspect, a plasma focus apparatus produces pulsed high temperature plasma that emits multi-radiation including ion beams, electron beams, fast plasma streams, x-rays and nuclear fusion neutrons. This plasma focus apparatus includes an electrode assembly including an inner and at least one outer electrode, as well as a plurality of capacitors connected to the electrode assembly in parallel to form the high energy density, high current density plasma, where the arrangement and shape of the capacitors and other elements of the circuitry and electrode assembly provide a system with low stray inductance.
Dense plasma focus apparatus
In an aspect, a plasma focus apparatus produces pulsed high temperature plasma that emits multi-radiation including ion beams, electron beams, fast plasma streams, x-rays and nuclear fusion neutrons. This plasma focus apparatus includes an electrode assembly including an inner and at least one outer electrode, as well as a plurality of capacitors connected to the electrode assembly in parallel to form the high energy density, high current density plasma, where the arrangement and shape of the capacitors and other elements of the circuitry and electrode assembly provide a system with low stray inductance.