Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.

Embodiments herein are directed to a linear accelerator assembly for an ion implanter. In some embodiments, the linear accelerator assembly may include a central support within a chamber, and a plurality of modules coupled to the central support, at least one module of the plurality of modules including an electrode having an aperture for receiving and delivering an ion beam along a beamline axis.

A hot HF component equipped with an HF cavity which is delimited by a jacket includes at least one internal protrusion, the jacket comprising at least one internal canal following the contour of its internal surface to allow the flow of a heat transport fluid intended to remove heat energy originating from the cavity.

A hot HF component equipped with an HF cavity which is delimited by a jacket includes at least one internal protrusion, the jacket comprising at least one internal canal following the contour of its internal surface to allow the flow of a heat transport fluid intended to remove heat energy originating from the cavity.

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

An assembly component for a vacuum chamber, comprising a body and a flange, has a surface configured to press a seal against another mechanical part. The flange is made of an aluminum alloy and the surface is covered with a metal deposit mostly comprising nickel.

A compact radio-frequency quadrupole ‘RFQ’ accelerator for accelerating charged particles, the RFQ accelerator comprising: a bunching section configured to have a narrow radio-frequency ‘rf’ acceptance such that only a portion of a particle beam incident on the bunching section is captured, and wherein the bunching section bunches the portion of the particle beam; an accelerating section for accelerating the bunched portion of the particle beam to an output energy; and, a means for supplying radio-frequency power.

A compact radio-frequency quadrupole ‘RFQ’ accelerator for accelerating charged particles, the RFQ accelerator comprising: a bunching section configured to have a narrow radio-frequency ‘rf’ acceptance such that only a portion of a particle beam incident on the bunching section is captured, and wherein the bunching section bunches the portion of the particle beam; an accelerating section for accelerating the bunched portion of the particle beam to an output energy; and, a means for supplying radio-frequency power.

A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.

A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.