An X-ray generation system is configured to generate an X-ray beam configured to be delivered to a patient undergoing radiation therapy. The X-ray generation system includes a linear accelerator system configured to generate an electron beam configured to impinge a target configured to respond to the incident electron beam by emitting an X-ray beam configured to deliver an X-ray dose rate to the patient in a range of 40 Gy/s to 1000 Gy/s within a treatment delivery window.

Some embodiments include a system comprising: an RF source configured to generate an RF signal; an RF frequency control circuit coupled to the RF source and configured to adjust a frequency of the RF signal; an accelerator structure configured to accelerate a particle beam in response to the RF signal; and control logic configured to: receive a plurality of settings over time for the RF source; adjust the RF signal in response to the settings; and adjust a setpoint of the RF frequency control circuit in response to the settings.

Some embodiments include a system comprising: a particle power source configured to generate a particle power signal; a radio frequency (RF) power source configured to generate an RF power signal; a particle source configured to generate a particle beam in response to the particle power signal; a RF source configured to generate an RF signal in response to the RF power signal; and an accelerator structure configured to accelerate the particle beam in response to the RF signal; wherein a timing of the RF power signal is different from a timing of the particle power signal.

A linear accelerator head for use in a medical radiation therapy system can include a housing, an electron generator configured to emit electrons along a beam path, and a microwave generation assembly. The linear accelerator head may include a waveguide that is configured to contain a standing or travelling microwave. The waveguide can include a plurality of cells that are disposed adjacent one another, wherein each of the plurality of cells may define an aperture configured to receive electrons therethrough. The linear accelerator head can further include a converter and a primary collimator.

A method of patterning lithographic substrates, the method comprising using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further comprises reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

A linac-based X-ray system for cargo scanning and imaging applications uses linac design, RF power control, beam current control, and beam current pulse duration control to provide stable sequences of pulses having different energy levels or different dose.

Electron beam collimators and linear accelerators include a target and a collimator body. The collimator body has a central aperture that opens at an exit to the target and has a final internal diameter at the exit that defines an electron beam spot size on the target.

Vacuum electron devices and linear accelerators include a hollow cathode configured to emit a beam of electrons. An anode is configured to attach and focus the beam of electrons. A control grid is configured to control the beam of electrons emitted from the hollow cathode. A cylinder is positioned substantially coaxial with the hollow cathode and is configured to maintain a shape and trajectory of the emitted beam of electrons.

The present disclosure is related to a microwave source. The microwave source may include a cathode heater and a thermionic emitter. The cathode heater may include a first component, and a second component enclosing at least a portion of the first component. The thermionic emitter may be configured to release electrons when the thermionic emitter is heated by the cathode heater. At least a portion of the second component of the cathode heater may be in contact with the thermionic emitter.