A processing target reforming apparatus includes: a conveying unit that conveys a processing target along a conveyance path; a discharge unit including a plurality of discharge electrodes aligned along the conveyance path, a counter electrode with the conveyance path interposed therebetween, and a power source that applies a voltage waveform to the discharge electrodes; and a control unit that controls the discharge unit such that a phase of the voltage waveform applied to a first discharge electrode of the discharge electrodes at a timing when a certain point of the processing target passes between the first discharge electrode and the counter electrode is shifted with respect to a phase of the voltage waveform applied by the power source to a second discharge electrode of the discharge electrodes at a timing when the certain point of the processing target passes between the second discharge electrode and the counter electrode.

A RF amplifier is provided that includes a plurality of switch modules connected in a cascade configuration and divided into disjoint sets in accordance with their corresponding distinct peak DC voltages or currents, each switch module including a plurality of switch devices connected in a half-bridge or full-bridge circuit and a DC voltage or current source electrically connected with the half-bridge or full-bridge circuit, and a control circuit configured to determine an output voltage or current of the RF amplifier at the next switching interval, examine the states of the switching devices in the respective switch modules to identify a combination of least-recently-switched switching devices within each set of switch modules that, when switched to an opposite state, will produce the determined output voltage or current, and switch to an opposite state, at the next switching interval, the switching devices in the identified combination.

A transformer includes: a first winding; a second winding provided to maintain a first distance to the first winding; and a shell that seals the first winding and the second winding.

A plasma cutting system includes a plasma torch having a head, and a housing. A power supply is disposed within the housing and is in communication with the plasma torch. The power supply is configured to provide an output current for generating and maintaining a plasma cutting arc by the plasma torch, and includes a control processor in communication with a plurality of autonomous switching circuits via a multi-node communications bus. Each of the autonomous switching circuits includes a microcontroller configured to control the generation of a portion of the output current based on messages received from the control processor, monitor operating parameters of the autonomous switching circuit, and modify a control parameter of the autonomous switching circuit independent of and asynchronous to the other autonomous switching circuits of the plurality of autonomous switching circuits when one or more of the operating parameters exceeds a predetermined threshold.

The current disclosure relates to a suppressor circuit configuration for extending the stable region of operation of a DC driven micro plasma discharge at atmospheric and higher pressures.

A high-frequency discharge ignition device includes a current supply device which supplies an AC current to a spark discharge path formed in a gap of an ignition plug, a control device which controls the operation of the current supply device, and a voltage detection device which outputs a signal of a section where a magnetic induction voltage of a primary coil generated after a switch element of an ignition coil device is placed in a shutoff state exceeds a predetermined voltage, and the control device determines the timing when the spark discharge path has been formed in the gap of the ignition plug according to an output signal of the voltage detection device and operates the current supply device based on the timing when the spark discharge path has been formed in the gap of the ignition plug to supply the AC current to the spark discharge path.

A power supply apparatus outputs an alternating-current voltage to a plasma generator being a capacitive load and the power supply apparatus has a configuration that a transformer included in the power supply apparatus has a secondary-side magnetizing inductance more than five times as great as a leakage inductance.

Embodiments of the subject invention are drawn to power supply units and systems for supplying power to loads. Specific embodiments relate to systems incorporating the loads. The power supply units and systems can include a feedback mechanism for monitoring the system and maintaining a parameter of interest at or near a desired value (e.g., for maintaining the frequency of operation at or near resonance). The feedback mechanism is configured such that, if the at least one parameter indicates that the frequency of operation is away from a resonant frequency of the power amplifier, the feedback mechanism adjusts the frequency of operation closer to the resonant frequency of the power amplifier. The at least one load can have a variable impedance, though embodiments are not limited thereto.

The present invention discloses a plasma-containing modular arc generator, comprising: a shell; an energy storage device; a charging circuit module and a boosting circuit module arranged on both sides of the energy storage device; a charging input end, a switch button and an output end arranged on the shell; a high-voltage converting module connected to one side of the boosting circuit module; a USB output port arranged on the output end; and a high-voltage ionizing ignition module connected to one end of the high-voltage converting module, wherein the energy storage device comprises an energy storage module of a polymer battery, an input end and an input converting circuit of a solar panel; and the boosting circuit lnodule mainly comprises a control chip, an MOS transistor and a flying back transformer. The arc generator designed in the present invention not only has low cost and energy-conservation and environment-protection, but also is suitable for scale production.

An array of non-thermal plasma emitters is controlled to emit plasma based on application of an electric current at desired frequencies and a controlled power level. A power supply for an array controller includes a transformer that operates at the resonant frequency of the combined capacitance of the array and the cable connecting the array to the power supply. The power into the array is monitored by the controller and can be adjusted by the user. The controller monitors reflected power characteristics, such as harmonics of the alternating current, to determine initiation voltage of the plasma and/or resonant frequency plasma emitters. The array of non-thermal plasma emitters may be used in therapeutic, diagnostic, and/or medical sanitization applications, including for treatment of infectious diseases using the disclosed protocols.