Patent classifications
H05K3/06
Method for photolithography to manufacture a two-sided touch sensor
A touch sensor having conductive circuits on both surfaces of a substrate is fabricated by including UV-blocking material into the substrate or depositing UV-blocking layer on the substrate. This can be used for fabricating sensors having transparent conductor circuits, or having metallic circuits, which are opaque to visible light. Photoresist is applied to both surfaces of the substrate and patterns are transferred to the photoresist by exposure to UV radiation. The UV-blocking layer prevents UV-radiation applied to one side from exposing the opposite side. If desired, both photoresist layers may be exposed simultaneously by splitting one UV beam.
Core layer with fully encapsulated co-axial magnetic material around PTH in IC package substrate
Embodiments may include inductors with embedded magnetic cores and methods of making such inductors. In an embodiment, an integrated circuit package may include an integrated circuit die with a multi-phase voltage regulator electrically coupled to the integrated circuit die. In such embodiments, the multi-phase voltage regulator may include a substrate core and a plurality of inductors. The inductors may include a conductive through-hole disposed through the substrate core and a plugging layer comprising a dielectric material surrounding the conductive through-hole. In an embodiment, a magnetic sheath is formed around the plugging layer. In an embodiment, the magnetic sheath is separated from the plated through hole by the plugging layer. Additionally, a first layer comprising a dielectric material may be disposed over a first surface of the magnetic sheath, and a second layer comprising a dielectric material may be disposed over a second surface of the magnetic sheath.
PROCESS FOR LAMINATING CONDUCTIVE-LUBRICANT COATED METALS FOR PRINTED CIRCUIT BOARDS
Processes for laminating a conductive-lubricant coated Printed Circuit Board (PCB) are disclosed. An example laminated PCB may include a lamination stack that may further include a core, an adhesive layer, and at least one graphene-metal structure or at least one hexagonal Boron Nitride metal (h-BN-metal) structure. The materials of the PCB may change in accordance with the invention described herein, including the materials of the core, the materials of the conductive-lubricant coatings, or the metal layers of the conductive-lubricant-metal structures. Doping processes for each change in materials used are also described herein. The conductive-lubricant of the conductive-lubricant-metal structure will promote high frequency performance and heat management within the PCB. Furthermore, a removal process of those materials post-lamination is described herein to promote protection of materials and subsequent removal of protective layers without breakage or tearing.
PROCESS FOR LAMINATING CONDUCTIVE-LUBRICANT COATED METALS FOR PRINTED CIRCUIT BOARDS
Processes for laminating a conductive-lubricant coated Printed Circuit Board (PCB) are disclosed. An example laminated PCB may include a lamination stack that may further include a core, an adhesive layer, and at least one graphene-metal structure or at least one hexagonal Boron Nitride metal (h-BN-metal) structure. The materials of the PCB may change in accordance with the invention described herein, including the materials of the core, the materials of the conductive-lubricant coatings, or the metal layers of the conductive-lubricant-metal structures. Doping processes for each change in materials used are also described herein. The conductive-lubricant of the conductive-lubricant-metal structure will promote high frequency performance and heat management within the PCB. Furthermore, a removal process of those materials post-lamination is described herein to promote protection of materials and subsequent removal of protective layers without breakage or tearing.
CAMERA DEVICE AND OPTICAL DEVICE
An embodiment comprises: a cover member; a moving unit which is arranged on the inside of the cover member, and which includes a first substrate and an image sensor arranged in the first substrate; a fixing unit including a second substrate spaced from the first substrate; a support substrate for supporting the moving unit so that the moving unit moves in the direction vertical to an optical axis direction with respect to the fixing unit, and electrically connecting the first substrate and the second substrate; and a control unit arranged in the second substrate and on the outside of the cover member.
Thin film circuit substrate and manufacturing method thereof
Disclosed is a thin film circuit substrate and a manufacturing method thereof, which are capable of forming a pattern having a feature size of less than 10 μm by forming a seed layer and a plating layer on a base substrate and then forming, through electrospinning, a photoresist layer having a thickness in a set range. The disclosed thin film circuit substrate comprises: a base substrate; a thin film seed layer formed on the top surface of the base substrate; a metal layer formed on the top surface of the thin film seed layer; and a photoresist layer formed on the top surface of the metal layer, wherein the thickness of the photoresist layer is in a range of 1 μm to 5 μm.
Display device
A display device includes: a substrate having a display area and non-display area; a first conductive layer disposed corresponding to the display area and comprising a first line segment, a second line segment and a third line segment parallel to the first line segment, wherein the first and second line segments are disposed at two sides of the non-display area; a third conductive layer disposed on the substrate and including a first connection line electrically connected to the first and second line segments, and a projection of the first connection line is overlapped with at least a portion of the third line segment; and a first insulating layer disposed between the first and third conductive layers and including a first through-hole and a second through-hole, and the third conductive layer is electrically connected to the first and second line segments via the first and the second through-holes, respectively.
Display device
A display device includes: a substrate having a display area and non-display area; a first conductive layer disposed corresponding to the display area and comprising a first line segment, a second line segment and a third line segment parallel to the first line segment, wherein the first and second line segments are disposed at two sides of the non-display area; a third conductive layer disposed on the substrate and including a first connection line electrically connected to the first and second line segments, and a projection of the first connection line is overlapped with at least a portion of the third line segment; and a first insulating layer disposed between the first and third conductive layers and including a first through-hole and a second through-hole, and the third conductive layer is electrically connected to the first and second line segments via the first and the second through-holes, respectively.
ELECTRICAL CONNECTORS
Examples of electrical connectors are provided herein. In some examples, an electrical connector includes a contact pad at a first end of a route. In some examples, the electrical connector includes a bond at a second end of the route. In some examples, the contact pad and the bond include a copper layer on a substrate, a nickel layer on the copper layer, and a gold layer on the nickel layer. In some examples, the gold layer has a first thickness on the contact pad and has a second thickness on the bond. In some examples, the second thickness is greater than the first thickness.
SHORT OR NEAR SHORT ETCH REWORK
Embodiments are directed to short and/or near short etch rework. A microfluidic device is positioned on a portion of a circuit having a defect. The microfluidic device is caused to dispense etchant that removes the defect of the circuit, where a flow of the etchant is controlled to access the portion of the circuit having the defect to thereby etch away the defect, the flow of the etchant being obstructed from accessing other portions of the circuit. The microfluidic device is used to extract the etchant from the portion of the circuit such that the etchant avoids contact with the other portions of the circuit. The microfluidic device is removed from the circuit.