Patent classifications
H05K3/389
Substrate for printed circuit board, printed circuit board, and method for producing substrate for printed circuit board
A substrate for a printed circuit board according to an embodiment of the present invention includes a base film and a metal layer disposed on at least one of surfaces of the base film. In the substrate for a printed circuit board, an amount of nitrogen present per unit area, the amount being determined on the basis of a peak area of a N1s spectrum in XPS analysis of a surface of the base film exposed after removal of the metal layer by etching with an acidic solution, is 1 atomic % or more and 10 atomic % or less.
Fluororesin base material, printed wiring board, and circuit module
A fluororesin base material containing a fluororesin as a main component includes a modified layer on at least a partial region of a surface thereof, the modified layer containing a siloxane bond and a hydrophilic organofunctional group, and a surface of the modified layer having a contact angle of 90° or less with pure water.
WIRING BOARD, ELECTRONIC DEVICE PACKAGE, AND ELECTRONIC DEVICE
Disclosed is a wiring board, including: an insulating substrate containing aluminum oxide; and a metallized layer that includes a metal phase containing a metal material and a first glass phase containing a glass component and that is disposed on the insulating substrate. At least one of the insulating substrate and the metallized layer further contains mullite. In the metallized layer, the metal phase continues in a three-dimensional network shape, and the first glass phase is embedded between the metal phase.
Electrodeposited copper foil and electrode, and lithium-ion secondary battery comprising the same
Provided are an electrodeposited copper foil, an electrode comprising the same, and a lithium-ion secondary battery comprising the same. The electrodeposited copper foil has a drum side and a deposited side opposing the drum side, wherein at least one of the drum side and the deposited side exhibits a void volume value (Vv) in the range of 0.17 μm.sup.3/μm.sup.2 to 1.17 μm.sup.3/μm.sup.2; and an absolute value of a difference between a maximum height (Sz) of the drum side and a Sz of the deposited side is in the range of less than 0.60 μm.
Metal-clad laminate, printed wiring board and metal foil with resin
A metal-clad laminate includes an insulating layer including a cured product of a resin composition, and a metal foil disposed on at least one principal surface of the insulating layer. The resin composition includes a thermosetting curing agent and a polyphenylene ether copolymer. The polyphenylene ether copolymer has an intrinsic viscosity ranging from 0.03 dl/g to 0.14 dl/g, inclusive. The intrinsic viscosity is measured in methylene chloride at 25° C. And the polyphenylene ether copolymer has, at a molecular terminal, a group represented by one of formula (1) and formula (2) at an average number of more than or equal to 0.8 and less than 1.5 per one molecule. Further, the metal foil includes a barrier layer containing cobalt on a first surface of the metal foil. The first surface is in contact with the insulating layer, and has a ten-point average roughness (Rz) of less than or equal to 2.0 μm. In formula (1), R.sup.1 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and R.sup.2 represents an alkylene group having 1 to 10 carbon atoms. In formula (2), R.sup.3 represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. ##STR00001##
MANUFACTURING METHODS FOR COPPER-CLAD LAMINATE AND PRINTED WIRING BOARD
Provided is a method for manufacturing a copper-clad laminate in which a copper foil and a resin are joined together with high heat-resistant adhesion force though a fluororesin, which is a low dielectric constant thermoplastic resin, is used. This method includes providing a surface-treated copper foil including a copper foil and a zinc-containing layer on at least one surface of the copper foil, and affixing a sheet-shaped fluororesin to the zinc-containing layer side of the surface-treated copper foil. The zinc-containing layer is composed of Zn and a transition element M having a melting point of 1200° C. or more. When the interface between the copper foil and the zinc-containing layer is subjected to elemental analysis by XPS, the content of Zn is 10 wt % or less, and the Zn/M weight ratio, the ratio of the content of Zn to the content of the transition element M, is 0.2 to 0.6.
METHOD FOR INCREASING ADHESION STRENGTH BETWEEN A METAL AND AN ORGANIC MATERIAL
The present invention relates to a method for increasing adhesion strength between a surface of a metal, a metal alloy or a metal oxide and a surface of an organic material comprising as a main step contacting of at least one section of said metal, metal alloy or metal oxide with a specific azole silane compound, a specific azole silane oligomer, or a mixture comprising said compound and/or said oligomer. Furthermore, the present invention relates to a use of said specific azole silane compound, said specific azole silane oligomer, or said mixture in a method for increasing adhesion strength between a surface of a metal, a metal alloy or a metal oxide and a surface of an organic material.
Metal-clad laminated board, metal member provided with resin, and wiring board
A metal-clad laminated board includes an insulating layer and a metal layer, in which the insulating layer includes a cured product of a resin composition containing a modified polyphenylene ether compound terminally modified with a substituent having an unsaturated double bond; and a crosslinkable curing agent having an unsaturated double bond in the molecule, and containing 40 to 250 parts by mass of silica particles with respect to 100 parts by mass in total of the modified polyphenylene ether compound and the crosslinkable curing agent, the resin composition contains 0.2 to 5 parts by mass of a first silane coupling agent having an unsaturated double bond in the molecule with respect to 100 parts by mass of the silica particles, and a contact surface of the metal layer in contact with the insulating layer is surface-treated with a second silane coupling agent having an amino group in the molecule.
EMBEDDED-TYPE TRANSPARENT ELECTRODE SUBSTRATE AND METHOD FOR MANUFACTURING SAME
A method of manufacturing a transparent electrode substrate according to an exemplary embodiment of the present application comprises: forming a structure comprising a transparent base, a bonding layer provided on the transparent base, and a metal foil provided on the bonding layer; forming a metal foil pattern by patterning the metal foil; heat-treating the structure comprising the metal foil pattern at a temperature of 70° C. to 100° C.; and completely curing the bonding layer.
Laminate and method for manufacturing the same
A laminate comprising a substrate; an adhesive layer formed on at least one surface of both surfaces of the substrate so as to be in direct contact with the substrate; and a plating layer formed on a surface of the adhesive layer opposite to the substrate, wherein the adhesive layer comprises a plating catalyst containing a precious metal, and a silane coupling agent.