Highly reliable interconnections for microelectronic packaging. In one embodiment, dielectric layers in a build-up interconnect have a gradation in glass transition temperature; and the later applied dielectric layers are laminated at temperatures lower than the glass transition temperatures of the earlier applied dielectric layers. In one embodiment, the glass transition temperatures of earlier applied dielectric films in a build-up interconnect are increased through a thermosetting process to exceed the temperature for laminating the later applied dielectric films. In one embodiment, a polyimide material is formed with embedded catalysts to promote cross-linking after a film of the polyimide material is laminated (e.g., through photo-chemical or thermal degradation of the encapsulant of the catalysts). In one embodiment, the solder resist opening walls have a wettable layer generated through laser assisted seeding so that there is no gap between the solder resist opening walls and no underfill in the solder resist opening.

A structure of conductive lines and method of manufacturing the same are disclosed by forming a patterned catalyst material layer on a substrate; activating the patterned catalyst material layer to form an activated patterned catalyst material layer comprising activated catalysts; and growing a conductive layer on the activated catalysts of the activated patterned catalyst material layer. The patterned catalyst material layer is formed from a catalyst material comprising 40 wt % to 90 wt % of polymer and 10 wt % to 60 wt % of catalyzer. An uppermost portion of the activated patterned catalyst material layer comprises the activated catalysts, and the activated catalysts comprises metal reduced from the catalyzer. The pattern of the conductive layer corresponds to that of the patterned catalyst material layer. The structure of the conductive line of the disclosure has the characteristics of high conductivity.

A coating for mitigating metal whiskers on a metal surface includes a polymeric coating material; and a metal ion complexing agent impregnated within the polymeric coating material, the metal ion complexing agent having a standard reduction potential (E) that is greater than a metal in the metal surface.

A robust formulation of silver-organo-complex (SOC) ink and method of making same are provided. In an aspect, the complexing molecules act as reducing agents. The silver loaded ink can be printed and sintered on a wide range of substrates with uniform surface morphology and excellent adhesion.

A transparent electrode includes: a substrate; and a conductive metal layer on the substrate. The conductive metal layer has a thin metal wire and a plating layer. The plating layer covers the thin metal wire. The transparent electrode further includes a transparent conductive layer on a surface of the substrate on a side on which the thin metal wire is formed. The transparent conductive layer covers the substrate and the conductive metal layer. The thin metal wire is formed using a metal nanoparticle ink or a metal complex ink.

A printed product, which comprises: a. a substrate; b. a primer layer located on the substrate, wherein the primer layer comprises an organic dielectric material; c. a metal conductive layer located on the primer layer; wherein the printed product further comprises a hybrid layer between the primer layer and the metal conductive layer, wherein the hybrid layer comprises materials from the primer layer and the metal conductive layer. In addition, the present invention further relates to a method for preparing the printed product and an electronic device comprising the printed product. The metal conductive layer in the printed product of the present invention has excellent uniformity in thickness; good adhesion between the primer layer and the conductive layer; and the printed product of the present invention has excellent EMI shielding effects, such that the printed product can be used in high frequency applications such as 5G applications.

A precursor article has a substrate and a photosensitive thin film or a photosensitive thin film pattern on a supporting side. The photosensitive thin film and each photosensitive thin film patterns comprises a non-hydroxylic-solvent soluble silver complex that is represented by the following formula (I):

(Ag.sup.+).sub.a(L).sub.b(P).sub.c (I) wherein L represents an -oxy carboxylate; P represents an oxime compound; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. A photosensitizer that can either reduce the reducible silver ion or oxidize the -oxy carboxylate having a reduction potential can also be present. Such precursor articles can be irradiated with UV-visible radiation to reduce the silver ions to provide electrically-conductive metallic silver in thin films or thin film patterns in product articles or devices.

An electrical component provides a ceramic element located on or in a dielectric substrate between and in contact with a pair of electrical conductors, wherein the ceramic element includes one or more metal oxides having fluctuations in metal-oxide compositional uniformity less than or equal to 1.5 mol % throughout the ceramic element. A method of fabricating an electrical component, provides or forming a ceramic element between and in contact with a pair of electrical conductors on a substrate including depositing a mixture of metalorganic precursors and causing simultaneous decomposition of the metal oxide precursors to form the ceramic element including one or more metal oxides.

A precursor article has a substrate and a photosensitive thin film or photosensitive thin film pattern on one or both supporting sides. A non-hydroxylic-solvent soluble silver complex is present that is represented by the following formula (1):

(Ag.sup.+).sub.a(L).sub.b(P).sub.c (I)

wherein L represents an -oxy carboxylate; P represents a primary alkylamine; a is 1 or 2; b is 1 or 2; and c is 1, 2, 3, or 4, provided that when a is 1, b is 1, and when a is 2, b is 2. A photosensitizer can also be present to enhance photosensitivity for conversion of reducible silver ions to electrically-conductive silver metal in a resulting product article or device. The electrically-conductive silver metal can be provided as a uniform electrically-conductive silver metal-containing thin film or layer, or as one or more electrically-conductive silver metal-containing thin film patterns.

The present invention addresses the problem of providing a transparent electrode having a low resistance and high storage stability, a method for manufacturing the transparent electrode, and an organic electroluminescent element. This transparent electrode wherein a metal conductive layer is provided on a substrate is characterized in that: the metal conductive layer has a metal fine line, and a plating layer covering the metal fine line; the transparent electrode has a transparent conductive layer on a substrate surface on the side on which the metal fine line is formed, said transparent conductive layer covering the substrate and the metal conductive layer; and the metal fine line is formed using a metal nano-particle ink or a metal complex ink.