H10B63/32

Circuit and method to enhance efficiency of memory

A method includes: providing a modulation circuit including a first resistive element, a second resistive element and a third resistive element; providing a memory array and a regulator connecting the modulation circuit to the memory array, wherein the regulator includes a transistor; determining an operation mode of the memory array; generating a first voltage at a drain terminal of the transistor, wherein the first voltage corresponds to a positive, negative zero temperature coefficient according to a first resistance ratio and a second resistance ratio; during a read operation, providing a first driving current to the memory array in response to the first voltage corresponding to the positive temperature coefficient; and during a write operation, providing a second driving current to the memory array in response to the first voltage corresponding to the negative temperature coefficient.

Semiconductor Memory Having Both Volatile and Non-Volatile Functionality Including Resistance Change Material and Method of Operating
20250037766 · 2025-01-30 ·

Semiconductor memory is provided wherein a memory cell includes a capacitorless transistor having a floating body configured to store data as charge therein when power is applied to the cell. The cell further includes a nonvolatile memory comprising a resistance change element configured to store data stored in the floating body under any one of a plurality of predetermined conditions. A method of operating semiconductor memory to function as volatile memory, while having the ability to retain stored data when power is discontinued to the semiconductor memory is described.

THERMALLY OPTIMIZED PHASE CHANGE MEMORY CELLS AND METHODS OF FABRICATING THE SAME
20170331035 · 2017-11-16 ·

A thermally optimized phase change memory cell includes a phase change material element disposed between first and second electrodes. The second electrode includes a thermally insulating region having a first thermal resistivity over the first electrode and a metallic contact region interposed between the phase change material element and the thermally insulating region, where the metallic contact layer has a second thermal resistivity lower than the first thermal resistivity.

Semiconductor memory having both volatile and non-volatile functionality including resistance change material and method of operating
09812203 · 2017-11-07 · ·

Semiconductor memory is provided wherein a memory cell includes a capacitorless transistor having a floating body configured to store data as charge therein when power is applied to the cell. The cell further includes a nonvolatile memory comprising a resistance change element configured to store data stored in the floating body under any one of a plurality of predetermined conditions. A method of operating semiconductor memory to function as volatile memory, while having the ability to retain stored data when power is discontinued to the semiconductor memory is described.

MEMORIES HAVING A SHARED RESISTANCE VARIABLE MATERIAL
20170221561 · 2017-08-03 · ·

Memories having a plurality of resistive storage elements in a shared resistance variable material, a plurality of select devices coupled to the plurality of resistive storage elements in a one-to-one relationship and sense circuitry coupled to the plurality of select devices.

METHODS OF FORMING PHASE CHANGE MEMORY APPARATUSES
20170221965 · 2017-08-03 ·

Phase change memory apparatuses include memory cells including phase change material, bit lines electrically coupled to aligned groups of at least some of the memory cells, and heating elements electrically coupled to the phase change material of the memory cells. The heating elements include vertical portions extending in a bit line direction. Additional phase change memory apparatuses include dummy columns positioned between memory columns and base contact columns. The dummy columns include phase change memory cells and lack heating elements coupled to the phase change memory cells thereof. Additional phase change memory apparatuses include heating elements operably coupled to phase change memory cells. An interfacial area between the heating elements and the phase change memory cells has a length that is independent of a bit line width. Methods relate to forming such phase change memory apparatuses.

MEMORY CELL WITH INDEPENDENTLY-SIZED ELEMENTS
20170207273 · 2017-07-20 ·

Memory cell architectures and methods of forming the same are provided. An example memory cell can include a switch element and a memory element formed in series with the switch element. A smallest lateral dimension of the switch element is different than a smallest lateral dimension of the memory element.

Content addressable memory cells and memory arrays
09711222 · 2017-07-18 · ·

A content addressable memory cell is provided that includes plurality of transistors having a minimum feature size F, and a plurality of memory elements coupled to the plurality of transistors. The content addressable memory cell occupies an area of between 18F.sup.2 and 36F.sup.2.

Thermally optimized phase change memory cells and methods of fabricating the same

A thermally optimized phase change memory cell includes a phase change material element disposed between first and second electrodes. The second electrode includes a thermally insulating region having a first thermal resistivity over the first electrode and a metallic contact region interposed between the phase change material element and the thermally insulating region, where the metallic contact layer has a second thermal resistivity lower than the first thermal resistivity.

CROSS-POINT MEMORY AND METHODS FOR FABRICATION OF SAME
20170186816 · 2017-06-29 ·

The disclosed technology relates generally to integrated circuit devices, and in particular to cross-point memory arrays and methods for fabricating the same. In one aspect, a memory device of the memory array comprises a substrate and a memory cell stack formed between and electrically connected to first and second conductive lines. The memory cell stack comprises a first memory element over the substrate and a second memory element formed over the first element, wherein one of the first and second memory elements comprises a storage element and the other of the first and second memory elements comprises a selector element. The memory cell stack additionally comprises a first pair of sidewalls opposing each other and a second pair of sidewalls opposing each other and intersecting the first pair of sidewalls. The memory device additionally comprises first protective dielectric insulating materials formed on a lower portion of the first pair of sidewalls and an isolation dielectric formed on the first protective dielectric insulating material and further formed on an upper portion of the first pair of sidewalls.