A dry-state non-contact method for patterning of nanostructured conducting materials is disclosed. Short self-generated electron-emission pulses in air at atmospheric pressure can enable an electron-emission-based (field enhancement) interaction between a sharp tungsten tip and elements of the nanostructured materials to cause largely non-oxidative sequential decomposition of the nanostructured elements. Embodiments can employ a substrate/tip gap of 10 to 20 nm, discharge voltages of 25-30 V, and patterning speeds as fast as 10 cm/s to provide precisely patterned nanostructures (<200 nm) that are largely free of foreign contaminants, thermal impact and sub-surface structural changes.

A method for manufacturing a display device includes forming a first layer including first quantum dots in each of a first region and a second region, the first region and the second region each being a region in which a light-emitting device is formed, making the first layer in the second region non-light-emitting, forming a second layer including second quantum dots in each of the first region and the second region, and making the second layer in the first region non-light-emitting.

A display panel includes a display area, and the display area includes a first display area and a second display area; the first display area and the second display area each include light-emitting areas, and the second display area further includes light transmissive areas. The manufacturing method includes forming, on a side of a substrate, a light-to-heat conversion layer covering at least a second display area; forming, on a side of the light-to-heat conversion layer facing away from the substrate, a light-emitting functional layer and a second electrode layer each covering the display area, where portions of the second electrode layer which are located in at least adjacent two light-emitting areas are connected; and removing, in at least part of the plurality of light transmissive areas, the light-to-heat conversion layer and all film layers located on a side of the light-to-heat conversion layer facing away from the substrate.

A rolled metal sheet includes an obverse surface and a reverse surface that is a surface located opposite to the obverse surface. At least either one of the obverse surface and the reverse surface is a processing object. A method for manufacturing a metal mask substrate includes reducing a thickness of the rolled metal sheet to 10 μm or less by etching the processing object by 3 μm or more by use of an acidic etching liquid, and roughening the processing object so that the processing object becomes a resist formation surface that has a surface roughness Rz of 0.2 μm or more, thereby obtaining a metal mask sheet.

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.

A method of fabricating a display device may include forming a preliminary first pixel definition layer by coating a first material on a base substrate including a first electrode, forming a first pixel definition layer by forming a first opening in the preliminary first pixel definition layer, the first opening exposing the first electrode, performing a plasma treatment on the first pixel definition layer, forming a preliminary organic layer by providing a first organic material, forming a preliminary second pixel definition layer by coating a second material on the first pixel definition layer, forming a second pixel definition layer by forming a second opening in the preliminary second pixel definition layer, the second opening overlapping with the first opening, and forming an organic layer by providing a second organic material. A thickness of the organic layer may be greater than a thickness of the preliminary organic layer.

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.

A method of fabricating a display device may include forming a preliminary first pixel definition layer by coating a first material on a base substrate including a first electrode, forming a first pixel definition layer by forming a first opening in the preliminary first pixel definition layer, the first opening exposing the first electrode, performing a plasma treatment on the first pixel definition layer, forming a preliminary organic layer by providing a first organic material, forming a preliminary second pixel definition layer by coating a second material on the first pixel definition layer, forming a second pixel definition layer by forming a second opening in the preliminary second pixel definition layer, the second opening overlapping with the first opening, and forming an organic layer by providing a second organic material. A thickness of the organic layer may be greater than a thickness of the preliminary organic layer.

A 1, 4 bidentate ligand comprising first and second ligand centres, wherein the first ligand centre is an sp.sup.2-hybridised carbon or a nitrogen atom; wherein the second ligand centre is a nitrogen atom in a five- or six-membered aromatic or hetero-aromatic ring, said ring having a substantially linear substituent T.sup.1 meta or para to the nitrogen atom; wherein T.sup.1 has the formula 1:
—Ar.sup.1.sub.a—Y.sup.1.sub.b—Ar.sup.2—[Y.sup.2.sub.c—Ar.sup.2].sub.d—S—B  (1) and wherein T.sup.1 is attached to the ring by X.sup.1, wherein X.sup.1 is a bond, a methylene group, a substituted methylene group, an oxygen atom or a sulphur atom, wherein each Ar.sup.1 and Ar.sup.2 are independently selected from the group of C.sub.6 to C.sub.20 aromatic and C.sub.4 to C.sub.20 heteroaromatic groups, wherein Y.sup.1 and each Y.sup.2 is independently an optionally substituted C.sub.2 or acetonitrile trans double-bond linking moiety, wherein a is 0, 1, 2 or 3, wherein b is 0, 1 or 2, wherein each c is independently 0, 1 or 2, wherein d is 0, 1, 2, 3 or 4, S is a flexible spacer, and B represents a moiety having one or more cross-linkable functionalities. Network polymers, complexes, compositions, and devices based on this ligand. Method for forming devices based on this ligand.

Aspects relate to patterned nanostructures having a feature size not including film thickness of below 5 microns. The patterned nanostructures are made up of nanoparticles having an average particle size of less than 100 nm. A nanoparticle composition, which, in some cases, includes a binder, is applied to a substrate. A patterned mold used in concert with electromagnetic radiation function to manipulate the nanoparticle composition in forming the patterned nanostructure. In some embodiments, the patterned mold nanoimprints a pattern onto the nanoparticle composition and the composition is cured through UV or thermal energy. Three-dimensional patterned nanostructures may be formed. A number of patterned nanostructure layers may be prepared and joined together. In some cases, a patterned nanostructure may be formed as a layer that is releasable from the substrate upon which it is initially formed. Such releasable layers may be arranged to form a three-dimensional patterned nanostructure for suitable applications.