The present disclosure discloses a pixel defining layer and a manufacturing method thereof, an array substrate and a display device, and belongs to the field of display technology. The pixel defining layer includes a plurality of pixel defining structures arranged in an array, wherein the pixel defining structure includes a first bottom surface and a second bottom surface opposite each other, and a side surface located between the first bottom surface and the second bottom surface. Since the side surface is non-planar, the structure between the side surface and the bottom surface close to the base substrate constitutes a capillary structure. During the inkjet printing process, the solution in which the organic light emitting material is dissolved can spread more evenly under the attraction of the capillary structure.

Increasing transparency of one or more micro-displays. A method includes attaching a transparent cover to at least a portion of a semiconductor wafer. The at least a portion of the semiconductor wafer includes the one or more micro-displays. The one or more micro-displays include one or more active silicon areas. The method further includes, after the transparent cover has been attached to the at least a portion of the semiconductor wafer, removing silicon between one or more of the active silicon areas, causing the one or more micro-displays to have a transparency of at least 50%.

The present disclosure provides an organic light-emitting display panel, a method for preparing the same and a display device. The method includes: providing a substrate, where the substrate includes a non-display area and a display area surrounding the non-display area; forming a barrier layer and a pixel circuit on the substrate, where an orthographic projection of the pixel circuit on the substrate and an orthographic projection of the non-display area on the substrate do not overlap; patterning the barrier layer in the non-display area to form at least one via hole penetrating the barrier layer; patterning the substrate by using the barrier layer as a mask in the non-display area to form a groove; forming a light emitting layer on the pixel circuit; and forming a thin film encapsulation layer covering the light emitting layer and the side wall of the draw-in structure on the light emitting layer.

The disclosure relates to a display panel, a method for fabricating the same, and a display device. The display panel includes: a base substrate including a first base substrate in a blind hole area and a second base substrate, the thickness of the first base substrate is smaller than the thickness of the second base substrate; an anode layer, a light-emitting layer, a cathode layer and an encapsulation layer arranged successively on the second base substrate, and the cathode layer and the encapsulation layer arranged successively on the first base substrate; wherein at least one installation hole is arranged in a display area of the display panel, the at least one installation hole is within the blind hole area and runs through the first base substrate and the respective layers on the first base substrate.

A display device according to some embodiments includes: a substrate; a plurality of common voltage lines positioned on the substrate; a plurality of connection electrodes positioned on a plurality of common voltage lines; an emission layer positioned on the connection electrode; and a common electrode positioned on the emission layer, wherein the emission layer has a plurality of first openings positioned on at least a portion of a plurality of connection electrodes, the common electrode is electrically connected to the connection electrode through a plurality of first openings, and a pitch of a first direction of a plurality of first openings has a range of about 0.1 mm to about 2.5 mm.

A display apparatus includes a substrate including at least one hole disposed in a hole area of the substrate, a thin film transistor disposed on the substrate, a light-emitting component disposed on the substrate and electrically connected to the thin film transistor, an insulating layer disposed on the substrate, a thin film encapsulation layer disposed on the substrate, and a laser blocking layer. The substrate includes a display area and a non-display area that is disposed between the display area and the hole area. The laser blocking layer is disposed on the insulating layer in the non-display area.

The present invention provides a silicon-based micro display screen and method for manufacturing the same. The method includes following steps: providing a silicon substrate, defining a number of sub-pixel regions on the silicon substrate, and sequentially and respectively preparing an anode layer, an OLED layer, a cathode layer and a first protective layer in each sub-pixel region on the silicon substrate; plasma bombarding and removing the exposed OLED layer; forming a second protective layer on sides of the etched cathode layer, the protective layer and the OLED layer; sequentially performing other sub-pixels; and processing and forming a silicon-based micro-display screen based on the results of the above steps. In present invention, the etching and coating processes are carried out in a vacuum environment to prevent the OLED layer from being invaded by water vapor and oxygen, and prolong the service life of the silicon-based micro display screen.

A memory cell includes a first conductive line, a lower electrode, a carbon nano-tube (CNT) layer, a middle electrode, a resistive layer, a top electrode and a second conductive line. The first conductive line is disposed over a substrate. The lower electrode is disposed over the first conductive line. The carbon nano-tube (CNT) layer is disposed over the lower electrode. The middle electrode is disposed over the carbon nano-tube layer, thereby the lower electrode, the carbon nano-tube (CNT) layer and the middle electrode constituting a nanotube memory part. The resistive layer is disposed over the middle electrode. The top electrode is disposed over the resistive layer, thereby the middle electrode, the resistive layer and the top electrode constituting a resistive memory part. The second conductive line is disposed over the top electrode.

A display device includes a substrate including a first surface from which a pattern including an end portion is defined and a second surface which is parallel to the first surface. When an inner radius from a reference line positioned above the end portion and parallel with the first surface of the substrate to a surface of the pattern defining about 90 degrees is referred to as a first inner radius and an inner radius from the reference line to the surface of the pattern defining about 45 degrees is a second inner radius, a ratio of the second inner radius to the first inner radius is about 0.7 or more.

The present invention provides a display panel and manufacturing method thereof, the method including following steps: providing a driving backplane and a light-emitting substrate, and bonding the driving backplane and the light-emitting substrate; patterning the light-emitting substrate to form a pixel array; forming a thin film packaging layer on an outside of the pixel array, the thin film packaging layer completely covering the pixel array; forming quantum dots on top of the thin film packaging layer to form a multi-color display; forming a reflective array between two adjacent quantum dots to avoid optical crosstalk between the pixel arrays. The display panel and the method of the present invention break through the physical limit of the high PPI, high-precision metal mask, which can realize the display of 2000 and higher PPI, and can prevent the optical crosstalk between the pixel arrays.