An RF integrated circuit device can includes a substrate and a High Electron Mobility Transistor (HEMT) device on the substrate including a ScAlN layer configured to provide a buffer layer of the HEMT device to confine formation of a 2DEG channel region of the HEMT device. An RF piezoelectric resonator device can be on the substrate including the ScAlN layer sandwiched between a top electrode and a bottom electrode of the RF piezoelectric resonator device to provide a piezoelectric resonator for the RF piezoelectric resonator device.

Provided is a piezoelectric material filler including alkali niobate compound particles having a ratio (K/(Na+K)) of the number of moles of potassium to the total number of moles of sodium and potassium of 0.460 to 0.495 in terms of atoms and a ratio ((Li+Na+K)/Nb) of the total number of moles of alkali metal elements to the number of moles of niobium of 0.995 to 1.005 in terms of atoms. The present invention can provide a piezoelectric material filler having excellent piezoelectric properties, and a composite piezoelectric material including the piezoelectric material filler and a polymer matrix.

A piezoelectric element includes a support member, a vibrator, a through electrode and a seed layer. The vibrator is disposed on an insulation film of the support member, and includes a piezoelectric film and an electrode coating film electrically connected to the piezoelectric film. The vibrator has a support region and a vibration region. The through electrode is electrically connected to the electrode coating film at the support region, and is disposed in a stacking direction of the support member and the vibrator. Between the piezoelectric film and the insulation film, the seed layer is disposed at a portion of the electrode coating film facing another portion of the electrode coating film connected to the through electrode in the stacking direction. The seed layer is made of material having a lattice constant closer to the piezoelectric film or material easier to cause the piezoelectric film to be self-aligned.

A system for a wireless communication infrastructure using single crystal devices. The wireless system can include a controller coupled to a power source, a signal processing module, and a plurality of transceiver modules. Each of the transceiver modules includes a transmit module configured on a transmit path and a receive module configured on a receive path. The transmit modules each include at least a transmit filter having one or more filter devices, while the receive modules each include at least a receive filter. Each of these filter devices includes a single crystal acoustic resonator device formed with a thin film transfer process with at least a first electrode material, a single crystal material, and a second electrode material. Wireless infrastructures using the present single crystal technology perform better in high power density applications, enable higher out of band rejection (OOBR), and achieve higher linearity as well.

A system for a wireless communication infrastructure using single crystal devices. The wireless system can include a controller coupled to a power source, a signal processing module, and a plurality of transceiver modules. Each of the transceiver modules includes a transmit module configured on a transmit path and a receive module configured on a receive path. The transmit modules each include at least a transmit filter having one or more filter devices, while the receive modules each include at least a receive filter. Each of these filter devices includes a single crystal acoustic resonator device formed with a thin film transfer process with at least a first electrode material, a single crystal material, and a second electrode material. Wireless infrastructures using the present single crystal technology perform better in high power density applications, enable higher out of band rejection (OOBR), and achieve higher linearity as well.

An electrical field detector includes an electromechanical oscillator, part of which is included of a piezoelectric element, a frequency measuring device which is coupled to the oscillator so as to measure the oscillation frequency, and an electrical masking assembly. The electrical masking assembly is arranged close to the piezoelectric element so that, during an use of the detector, the piezoelectric element moves by vibrating relative to the electrical masking assembly. A variable part of the piezoelectric element is thus exposed to the electrical field to be measured. A change in the oscillating frequency then forms an electrical field measurement result.

An electrical field detector includes an electromechanical oscillator, part of which is included of a piezoelectric element, a frequency measuring device which is coupled to the oscillator so as to measure the oscillation frequency, and an electrical masking assembly. The electrical masking assembly is arranged close to the piezoelectric element so that, during an use of the detector, the piezoelectric element moves by vibrating relative to the electrical masking assembly. A variable part of the piezoelectric element is thus exposed to the electrical field to be measured. A change in the oscillating frequency then forms an electrical field measurement result.

An acoustic wave device includes a silicon substrate, a first high-acoustic-velocity film on the silicon substrate, a first low-acoustic-velocity film on the first high-acoustic-velocity film, a second low-acoustic-velocity film on the first low-acoustic-velocity film, a second high-acoustic-velocity film on the second low-acoustic-velocity film, a piezoelectric film on the second high-acoustic-velocity film, and an IDT electrode on the piezoelectric film. Acoustic velocities of bulk waves propagating through the first and second high-acoustic-velocity films are higher than an acoustic velocity of an acoustic wave propagating through the piezoelectric film. Acoustic velocities of bulk waves propagating through the first and second low-acoustic-velocity films are lower than an acoustic velocity of a bulk wave propagating through the piezoelectric film. Materials of the first and second low-acoustic-velocity films are different from each other.

An acoustic wave device includes a silicon substrate, a first high-acoustic-velocity film on the silicon substrate, a first low-acoustic-velocity film on the first high-acoustic-velocity film, a second low-acoustic-velocity film on the first low-acoustic-velocity film, a second high-acoustic-velocity film on the second low-acoustic-velocity film, a piezoelectric film on the second high-acoustic-velocity film, and an IDT electrode on the piezoelectric film. Acoustic velocities of bulk waves propagating through the first and second high-acoustic-velocity films are higher than an acoustic velocity of an acoustic wave propagating through the piezoelectric film. Acoustic velocities of bulk waves propagating through the first and second low-acoustic-velocity films are lower than an acoustic velocity of a bulk wave propagating through the piezoelectric film. Materials of the first and second low-acoustic-velocity films are different from each other.

A piezoelectric device includes a base and a laminated portion. The laminated portion includes, at least above a recess, a piezoelectric layer, a pair of electrode layers to apply a voltage to the piezoelectric layer, and a membrane covering the recess. The membrane includes a piezoelectric membrane, in the piezoelectric layer, that swells on at least one of a side of the recess and a side opposite to the side of the recess.