Materials with etch selectivity with respect to one another and one or more additional etch-stop layers are used in a Josephson junction structure to allow for integration with a Josephson junction with supporting structures such as resistors. Selective etch processes compatible with high volume manufacturing are used to pattern various layers of the Josephson junction structure to provide a Josephson junction, which is electrically coupled to a support structure.

Compositions comprising a) one or more amorphous superconductor layers bound to one or more flexible substrate layers, or b) one or more superconductor layers bound to one or more layers of a high dielectric material are disclosed. Furthermore, provided herein are articles comprising one or more compositions of the invention and method of manufacturing thereof.

High temperature superconductor (HTS)-based interconnect systems comprising a cable including HTS-based interconnects are described. Each of the HTS-based interconnects includes a first portion extending from a first end towards an intermediate portion and a second portion extending from the intermediate portion to a second end. Each of the HTS-based interconnects includes a substrate layer formed in the first portion, in the intermediate portion, and in the second portion, a high temperature superconductor layer formed in at least a sub-portion of the first portion, in the intermediate portion, and in the second portion, and a metallic layer formed in the first portion and in at least a sub-portion of the intermediate portion. The HTS-based interconnect system includes a thermal load management system configured to maintain the intermediate portion of each of the HTS-based interconnects at a predetermined temperature in a range between a temperature of 60 kelvin and 92 kelvin.

According to one embodiment, an electronic circuit includes a first nonlinear element, a second nonlinear element, and a third nonlinear element. The first nonlinear element includes a first element Josephson junction provided in a first region of a first surface including the first region and a second region. The second nonlinear element includes a second element Josephson junction provided in the second region. The third nonlinear element includes a Josephson junction circuit. At least a part of the Josephson junction circuit is provided on a second surface. The second surface is separated from the first surface in a first direction crossing the first surface. The second surface is along the first surface. The third nonlinear element is configured to be coupled with the first nonlinear element. The third nonlinear element is configured to be coupled with the second nonlinear element.

A device includes a first substrate having a principal surface; a second substrate having a principal surface, in which the first substrate is bump-bonded to the second substrate such that the principal surface of the first substrate faces the principal surface of the second substrate; a circuit element having a microwave frequency resonance mode, in which a first portion of the circuit element is arranged on the principal surface of the first substrate and a second portion of the circuit element is arranged on the principal surface of the second substrate; and a first bump bond connected to the first portion of the circuit element and to the second portion of the circuit element, in which the first superconductor bump bond provides an electrical connection between the first portion and the second portion.

Materials and methods are disclosed for fabricating superconducting integrated circuits for quantum computing at millikelvin temperatures, comprising both quantum circuits and classical control circuits, which may be located on the same integrated circuit or on different chips of a multi-chip module. The materials may include components that reduce defect densities and increase quantum coherence times. Multilayer fabrication techniques provide low-power and a path to large scale computing systems. An integrated circuit system for quantum computing is provided, comprising: a substrate; a kinetic inductance layer having a kinetic inductance of at least 5 pH/square; a plurality of stacked planarized superconducting layers and intervening insulating layers, formed into a plurality of Josephson junctions having a critical current of less than 100 μA/μm.sup.2; and a resistive layer that remains non-superconducting at a temperature below 1 K, configured to damp the plurality of Josephson junctions.

The invention relates to a device including a set of superconducting conductors, of junctions and of control elements, each conductor comprising a first portion extending according to a first direction and a set of second portions, the first portions being offset relative to each other according to a second direction, at least three junctions being interposed according to the second direction between each pair of successive first portions, each junction being connected to the first portion of each of the conductors between which the junction is interposed by a second portion of said conductor, each control element being configured to switch the associated junction between a configuration in which the junction forms a Josephson junction and a configuration in which the junction blocks the Cooper pairs.

The method that includes the step of a cleaning a surface of a silicon wafer and forming a sacrificial layer on top of the silicon wafer. The wafer undergoes further processing, wherein the processing includes forming at least one layer directly on top of the sacrificial layer. Immediately prior to the insertion into a dilute refrigeration unit removing a portion of the sacrificial layer by exposing the portion of the sacrificial layer to a solvent.

A method comprising cleaning the top surface of a silicon substrate and forming a diffusion barrier by depositing a metal on top the top surface of the silicon substrate. The diffusion barrier is formed one monolayer at a time and wherein the diffusion barrier will have a height of about 1 to 3 nm. Forming a layer of crystalline Niobium on top of the diffusion barrier.

A method of reducing junction resistance variation for junctions in quantum information processing devices fabricated using two-step deposition processes. In one aspect, a method includes providing a dielectric substrate (208), forming a first resist layer (210) on the dielectric substrate, forming a second resist layer (212) on the first resist layer, and forming a third resist layer (214) on the second resist layer. The first resist layer includes a first opening (216) extending through a thickness of the first resist layer, the second resist layer includes a second opening (218) aligned over the first opening and extending through a thickness of the second resist layer, and the third resist layer includes a third opening (220) aligned over the second opening and extending through a thickness of the third resist layer.