An anti-ferromagnetic (AFM) voltage-controlled field effect logic device structure can include an AFM material that extends in a first direction and an input voltage terminal that extends opposite the AFM material. An oxide material can be located between the AFM material and the input voltage terminal. A first spin orbital coupling (SOC) material can extend in a second direction across the AFM material to provide a first SOC channel with a drain voltage terminal at a first end of the first SOC channel and an output voltage terminal at a second end of the first SOC channel that is opposite the first end. A contact can be electrically coupled to the output voltage terminal and configured to electrically couple to a second SOC material extending in the second direction spaced apart from the first SOC material to provide a second SOC channel.

A perpendicular magnetoresistive element includes a novel buffer layer having rocksalt crystal structure interfacing to a CoFeB-based recording tri-layer has (100) plane parallel to the substrate plane and with {110} lattice parameter being slightly larger than the bcc CoFe lattice parameter along {100} direction, and crystallization process of amorphous CoFeB material in the recording layer during thermal annealing leads to form bcc CoFe grains having epitaxial growth with in-plane expansion and out-of-plane contraction. Accordingly, a perpendicular anisotropy, as well as a perpendicular magnetization, is induced in the recording layer. The invention preferably includes materials, configurations and processes of perpendicular magnetoresistive elements suitable for perpendicular spin-transfer torque MRAM applications.

A magnetic sensing device includes a non-magnetic layer serving as a spacer and two magnetic layers that sandwich the spacer, and two oxide layers that sandwich the trilayer structure including the two magnetic layers and the spacer.

A stacked structure is positioned on a nonmagnetic metal layer. The stacked structure includes a ferromagnetic layer and an intermediate layer interposed between the nonmagnetic metal layer and the ferromagnetic layer. The intermediate layer includes a NiAlX alloy layer represented by Formula (1): Ni.sub.γ1Al.sub.γ2X.sub.γ3 . . . (1), [X indicates one or more elements selected from the group consisting of Si, Sc, Ti, Cr, Mn, Fe, Co, Cu, Zr, Nb, and Ta, and satisfies an expression of 0<γ<0.5 in a case of γ=γ3/(γ1+γ2+γ3)].

A magnetoresistance (MR) element includes a first stack portion comprising a first plurality of layers including a first spacer layer having a first thickness and a first material selected to result in the first stack portion having a first sensitivity to the applied magnetic field. The MR element also has a second stack portion comprising a second plurality of layers, including a second spacer layer having a second thickness to result in the second stack portion having a second sensitivity to the applied magnetic field. The first thickness may be different than the second thickness resulting in the first sensitivity being different than the second sensitivity.

A magnetic structure is provided. The magnetic structure may have a first magnetic layer with a first magnetization direction, a second magnetic layer with a second magnetization direction and a coupling layer interposed between the first and second magnetic layers. The coupling layer may include at least one non-magnetic element and at least one magnetic element. The atomic ratio of the at least one non-magnetic element to the at least one magnetic element is (100−x):x, where x is an atomic concentration parameter. Atomic concentration parameter, x, may cause the first magnetic layer to be non-collinearly coupled to the second magnetic layer such that, in the absence of external magnetic field, the first magnetization direction is oriented at a non-collinear angle relative to the second magnetization direction.

A method for forming a magnetic memory device is disclosed. At least one magnetic tunneling junction (MTJ) stack is formed on the substrate. The MTJ stack comprises a reference layer, a tunnel barrier layer and a free layer. A top electrode layer is formed on the MTJ stack. A patterned sacrificial layer is formed on the top electrode layer. The MTJ stack is then subjected to a MTJ patterning process in a high-density plasma chemical vapor deposition (HDPCVD) chamber, thereby sputtering off the MTJ stack not covered by the patterned sacrificial layer. During the MTJ patterning process, sidewalls of layers or sub-layers of the MTJ stack are simultaneously passivated in the HDPCVD chamber by depositing a sidewall protection layer.

A method of producing a multilayer device, such as a multilayer magnetoelectronic device, and a device with an improved magnetic pinning. The device includes a multilayer structure including an antiferromagnetic pinning layer and one or more ferromagnetic layers. Each of the ferromagnetic layers has a boundary surface with the antiferromagnetic layer. The antiferromagnetic layer is deposited at a nonzero angle of incidence with respect to a direction perpendicular to the plane of extension of the antiferromagnetic pinning layer. This oblique incidence deposition gives rise to a surface roughness of the antiferromagnetic pinning layer which is described by a plane wave function.

The magnetoresistance effect device includes: a magnetoresistance effect element that includes a first magnetization free layer, a magnetization fixed layer or a second magnetization free layer, and a spacer layer interposed between the first magnetization free layer and the magnetization fixed layer or the second magnetization free layer; and a magnetic material part that applies a magnetic field to the magnetoresistance effect element, wherein the magnetic material part is arranged to surround an outer circumference of the magnetoresistance effect element in a plan view in a stacking direction L of the magnetoresistance effect element.

An electronic device may include a semiconductor memory, and the semiconductor memory may include a substrate; a magnetic tunnel junction (MTJ) structure including a free layer, a pinned layer, and a tunnel barrier layer, the free layer having a variable magnetization direction, the pinned layer having a fixed magnetization direction, the tunnel barrier layer being interposed between the free layer and the pinned layer; and an interface layer and a damping constant enhancing layer interposed between the tunnel barrier layer and the pinned layer, wherein the interface layer may be structured to reduce metal diffusion and the damping constant enhancing layer includes a material having a relatively high damping constant to suppress switching of the magnetization direction of the pinned layer.