A primary ion source subassembly for use with a secondary ion mass spectrometer may include a unitary graphite ionizer tube and reservoir base. A primary ion source may include a capillary insert defining an ionizer aperture. An ionizer aperture may be centrally arranged in an outwardly protruding conical or frustoconical surface, and may be overlaid with a refractory metal coating or sheath. Parameters including ionizer surface shape, ionizer materials, ionizer temperature, and beam stop plate orifice geometry may be manipulated to eliminate ghost images. A graphite tube gasket with a dual tapered surface may promote sealing of a source material cavity.

The present invention has an object to reduce a risk of performance degradation caused to an ion generating device that is being manufactured. An ion generating device (1) includes: a discharge electrode (21) for generating ions by electric discharge, the discharge electrode having (i) a mounting part (33a) for mounting the discharge electrode on the ion generating device and (ii) a brush part including a plurality of linear electrically conductive members, and the mounting part (33a) binding a base end part of the brush part so as to hold the base end part, the ion generating device further including: an insulating sealing member (41) with which to seal the base end part of the mounting part (33a); and a protective resin (29) with which to cover at least a brush base end surface (25t).

The present invention has an object to reduce a risk of performance degradation caused to an ion generating device that is being manufactured. An ion generating device (1) includes: a discharge electrode (21) for generating ions by electric discharge, the discharge electrode having (i) a mounting part (33a) for mounting the discharge electrode on the ion generating device and (ii) a brush part including a plurality of linear electrically conductive members, and the mounting part (33a) binding a base end part of the brush part so as to hold the base end part, the ion generating device further including: an insulating sealing member (41) with which to seal the base end part of the mounting part (33a); and a protective resin (29) with which to cover at least a brush base end surface (25t).

An ion generating device (1) includes: a discharge electrode (21,22), protruding from a surface of the ion generating device, for generating ions by electric discharge, the discharge electrode having (i) a tip part (31) including a brush-like electrically conductive member and (ii) a base end part (33) to which the brush-like electrically conductive member is attached, and the base end part protruding from the surface of the ion generating device for a length (L2) that is longer than a length (L1) of the tip part.

An ion generating device (1) includes: a discharge electrode (21,22), protruding from a surface of the ion generating device, for generating ions by electric discharge, the discharge electrode having (i) a tip part (31) including a brush-like electrically conductive member and (ii) a base end part (33) to which the brush-like electrically conductive member is attached, and the base end part protruding from the surface of the ion generating device for a length (L2) that is longer than a length (L1) of the tip part.

An ion implantation system and process, in which the performance and lifetime of the ion source of the ion implantation system are enhanced, by utilizing isotopically enriched dopant materials, or by utilizing dopant materials with supplemental gas(es) effective to provide such enhancement.

A method and device for destroying and inhibiting exposure to microbes and infection includes a first element and a second element, and a power source. At least one of the elements includes antimicrobial metal, which, when energized by the power source, produces ions that are lethal to microbes. The device can be incorporated into virtually any useful object. During normal use of the object, electrical communication is established between the two elements, causing current supplied from the power source to flow through the antimicrobial metal. The two elements are configured and arranged to ensure that ions flowing from the antimicrobial metal flow through the region in which it is desired to kill microbes. The antimicrobial metal can be on the surface of the element, incorporated into the material making up the element, or provided in any other way that allows the antimicrobial effect to be achieved.

A method and device for destroying and inhibiting exposure to microbes and infection includes a first element and a second element, and a power source. At least one of the elements includes antimicrobial metal, which, when energized by the power source, produces ions that are lethal to microbes. The device can be incorporated into virtually any useful object. During normal use of the object, electrical communication is established between the two elements, causing current supplied from the power source to flow through the antimicrobial metal. The two elements are configured and arranged to ensure that ions flowing from the antimicrobial metal flow through the region in which it is desired to kill microbes. The antimicrobial metal can be on the surface of the element, incorporated into the material making up the element, or provided in any other way that allows the antimicrobial effect to be achieved.

A method and device for destroying and inhibiting exposure to microbes and infection includes a first element and a second element, and a power source. At least one of the elements includes antimicrobial metal, which, when energized by the power source, produces ions that are lethal to microbes. The device can be incorporated into virtually any useful object. During normal use of the object, electrical communication is established between the two elements, causing current supplied from the power source to flow through the antimicrobial metal. The two elements are configured and arranged to ensure that ions flowing from the antimicrobial metal flow through the region in which it is desired to kill microbes. The antimicrobial metal can be on the surface of the element, incorporated into the material making up the element, or provided in any other way that allows the antimicrobial effect to be achieved.

A novel composition, system and method thereof for improving beam current during boron ion implantation are provided. The boron ion implant process involves utilizing B2H6, BF3 and H2 at specific ranges of concentrations. The B2H6 is selected to have an ionization cross-section higher than that of the BF3 at an operating arc voltage of an ion source utilized during generation and implantation of active hydrogen ions species. The hydrogen allows higher levels of B2H6 to be introduced into the BF3 without reduction in F ion scavenging. The active boron ions produce an improved beam current characterized by maintaining or increasing the beam current level without incurring degradation of the ion source when compared to a beam current generated from conventional boron precursor materials.