We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.

We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.

We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.

In one embodiment, the invention includes an x-ray source having a cathode with (1) a pointed end or (2) an elongated blade oriented substantially transverse with respect to a longitudinal axis of the cathode. The pointed end or blade can be pointed towards an anode.

In another embodiment, the invention includes an x-ray source having a window with an annular-shape, forming a hollow-ring. A convex portion of a half-ball-shape of an anode can extend into a hollow of the annular-shape of the window.

In one embodiment, the invention includes an x-ray source having a cathode with (1) a pointed end or (2) an elongated blade oriented substantially transverse with respect to a longitudinal axis of the cathode. The pointed end or blade can be pointed towards an anode.

In another embodiment, the invention includes an x-ray source having a window with an annular-shape, forming a hollow-ring. A convex portion of a half-ball-shape of an anode can extend into a hollow of the annular-shape of the window.

Provided is an X-ray generating apparatus, which includes: an X-ray generating tube configured to emit X-rays through a first window; an outer case configured to contain the X-ray generating tube and provided with a second window transmitting the X-rays at a position facing the first window; an insulating fluid with which an unoccupied space of the outer case is filled; an insulating member located between the first window and the second window and provided with an opening in an irradiation area of the X-ray through the first window; and an insulating third window removably fit into the opening of the insulating member, wherein a linear expansion coefficient of the third window is greater than a linear expansion coefficient of the insulating member, and the third window and the first window face each other via a gap through which the insulating fluid is flowable.

Provided is an X-ray generating apparatus, which includes: an X-ray generating tube configured to emit X-rays through a first window; an outer case configured to contain the X-ray generating tube and provided with a second window transmitting the X-rays at a position facing the first window; an insulating fluid with which an unoccupied space of the outer case is filled; an insulating member located between the first window and the second window and provided with an opening in an irradiation area of the X-ray through the first window; and an insulating third window removably fit into the opening of the insulating member, wherein a linear expansion coefficient of the third window is greater than a linear expansion coefficient of the insulating member, and the third window and the first window face each other via a gap through which the insulating fluid is flowable.

An x-ray source includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source configured to generate at least one electron beam and an anode assembly configured to generate x-rays in response to electron bombardment by at least some of the electrons of the at least one electron beam from the electron source. The x-ray source further includes at least one x-ray optic is configured to receive at least some of the x-rays from the anode assembly and to direct at least some of the received x-rays to the window to form an x-ray beam.

An x-ray source includes an x-ray transmissive window having an x-ray transmittance greater than or equal to 20% for at least some x-rays having an x-ray energy less than 1 keV. The x-ray source further includes an electron source configured to generate at least one electron beam and an anode assembly configured to generate x-rays in response to electron bombardment by at least some of the electrons of the at least one electron beam from the electron source. The x-ray source further includes at least one x-ray optic is configured to receive at least some of the x-rays from the anode assembly and to direct at least some of the received x-rays to the window to form an x-ray beam.

In an embodiment an X-ray apparatus includes at least one of an X-ray source configured for generating X-rays or an X-ray detector configured for detecting X-rays, a housing in which the at least one of the X-ray source or the X-ray detector is located, the housing having an opening and a window covering the opening, wherein the window is configured to be passed by the X-rays, wherein the window comprises a transmission layer, and wherein the transmission layer is a carbon layer of glassy carbon.