A film formation apparatus includes a chamber which has an interior capable of being vacuumed, and which includes a lid that is openable and closable on the upper part of the chamber, a rotation table which is provided in the chamber and which and carries a workpiece in the circular trajectory, a film formation unit that deposits film formation materials by sputtering on the workpiece carried by the rotation table to form films, a shielding member which is provided with an opening at the side which the workpiece passes through, and which forms a film formation room where the film formations by the film formation units are performed, and a support which supports the shielding member, and which is independent relative to the chamber and is independent from the lid.

A cleanliness monitor for monitoring a cleanliness of a vacuum chamber. The cleanliness monitor may include a mass spectrometer, a molecule aggregation and release unit and an analyzer. The molecule aggregation and release unit is configured to (a) aggregate, during an aggregation period, organic molecules that are present in the vacuum chamber and (b) induce, during a release period, a release of a subset of the organic molecules towards the mass spectrometer. The mass spectrometer is configured to monitor an environment within the vacuum chamber and to generate detection signals indicative of a content of the environment; wherein a first subset of the detection signals is indicative of a presence of the subset of the organic molecules. The analyzer is configured to determine the cleanliness of the vacuum chamber based on the detection signals.

A magnetron sputtering device in one embodiment of the present disclosure includes a support table supporting thereon a base substrate, and a floating mask arranged at a first side of the support table and substantially parallel to the support table. The sputtering gap measurement apparatus includes: a horizontal testing platform arranged on the support table during the measurement, a first edge of the horizontal testing platform being flush with an edge of the first side of the support table in the case that the horizontal testing platform is located at a first position; a first movement mechanism configured to control the horizontal testing platform to move in a direction close to the floating mask, the horizontal testing platform being in contact with the floating mask in the case that the horizontal testing platform has moved to a second position; and a distance measurement mechanism configured to measure a movement distance of the horizontal testing platform from the first position to the second position.

A cleanliness monitor for monitoring a cleanliness of a vacuum chamber. The cleanliness monitor may include a mass spectrometer, a molecule aggregation and release unit and an analyzer. The molecule aggregation and release unit is configured to (a) aggregate, during an aggregation period, organic molecules that are present in the vacuum chamber and (b) induce, during a release period, a release of a subset of the organic molecules towards the mass spectrometer. The mass spectrometer is configured to monitor an environment within the vacuum chamber and to generate detection signals indicative of a content of the environment; wherein a first subset of the detection signals is indicative of a presence of the subset of the organic molecules. The analyzer is configured to determine the cleanliness of the vacuum chamber based on the detection signals.

A electrostatic chucking apparatus and method for coating mobile device 2D or 3D cover glass in a vacuum coating chamber having a rotating drum and which is driven in rotation. The apparatus includes a carrier including a liquid-cooled cold plate which is removably mountable to the rotating drum. In the case of 3D cover glass, the carrier includes a portion with a 3D profile to match a 3D profile of the 3D cover glass. The carrier further includes an electrostatic chuck (ESC) adapted to secure the cover glass in place against the carrier in the face of centrifugal forces caused by rotation of the rotating drum, with the ESC developing a sufficient clamping force for reliably securing the cover glass in place.

There is provided a sputtering apparatus in which a holding body holding a substrate by facing a target in a processing chamber is covered by a deposition preventive plate including a substrate retainer for covering a peripheral edge part of the substrate, and a thin film made of metal is deposited on a surface of the substrate exposed to an inside of the deposition preventive plate. A stopper protrusion protrudes at a portion in which the holding body and the deposition preventive plate face each other from one part to the other part, and face the holding body or the deposition preventive plate at a smaller interval than the interval between the deposition preventive plate and the substrate retainer. When the deposition preventive plate and the holding body are thermally deformed to approach each other during film deposition processing, the stopper protrusion contacts with the deposition preventive plate or the holding body, and the deposition preventive plate and the holding body contact with each other, such that, peeling-off a metal film at a contact portion and mixing in a film deposition region of the substrate are prevented.

An apparatus includes a gas input and a cooling plate. A groove surrounds the gas input and less than one hundred percent of the cooling plate. An inflatable seal is in the groove.

Embodiments of a process kit for use in a multi-cathode process chamber are disclosed herein. In some embodiments, a process kit includes a rotatable shield having a base, a conical portion extend downward and radially outward from the base, and a collar portion extending radially outward from a bottom of the conical portion; an inner deposition ring having a leg portion, a flat portion extending radially inward from the leg portion, a first recessed portion extending radially inward from the flat portion, and a first lip extending upward from an innermost section of the first recessed portion; and an outer deposition ring having a collar portion, an upper flat portion disposed above and extending radially inward from the collar portion, a second recessed portion extending inward from the upper flat portion, and a second lip extending upward from an innermost section of the second recessed portion.

An apparatus includes a cooling plate with a central opening. The central opening within the cooling plate is positioned to be opposite an opening in a workpiece when the cooling plate is positioned at a target location opposite the workpiece. The cooling plate is configured to absorb heat from a gas heated by the workpiece. A diffuser is in the central opening of the cooling plate. The diffuser is configured to receive a gas from a gas input. The diffuser is further configured to slow a flow of the gas and output the gas into the workpiece opening.

A shield mask mounting fitting includes a shied mask to be mounted on a chamber wall of a sputtering apparatus, the shield mask including a fixing hole, a fixing bolt connecting the shield mask to the chamber wall through the fixing hole, a cap hook surrounding a top of the fixing bolt, a bushing extending between a surface of the shield mask and the cap hook, and a shield cap engaged with the cap hook and covering the top of the fixing bolt, the shield cap extending beyond the cap hook to omnidirectionally cover a periphery of the fixing hole, wherein one of the cap hook and the shield cap has an asymmetric structure with respect to an axis extending through a center of the fixing bolt.