An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.

An XRF analyzer can include an x-ray source and an x-ray detector; an x-ray source heat-sink adjacent a side of the x-ray source; and an x-ray detector heat-sink adjacent a side of the x-ray detector. In one embodiment, the x-ray source heat-sink can be separated from the x-ray detector heat sink by a material having a thermal conductivity of less than 20 W/(m*K). In another embodiment, the x-ray source heat-sink can be separated from the x-ray detector heat sink by at least 3 millimeters of a thermally insulating material. In one embodiment, the x-ray source heat-sink can be separated from the x-ray detector heat sink by a segment of the engine component casing. Separation of the heat sinks can help avoid heat from the x-ray source adversely affecting resolution of the x-ray detector.

In one embodiment, a multi charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a shaping aperture array member having a plurality of first apertures, and allowing the charged particle beam to pass through the first apertures to form multiple beams, an X-ray shielding plate having a plurality of second apertures through each of which a corresponding one of the multiple beams that have passed through the first apertures passes, and a blanking aperture array member having a plurality of third apertures through each of which a corresponding one of the multiple beams that have passed through the first apertures and the second apertures passes, the blanking aperture array member including a blanker performing blanking deflection on the corresponding beam. The X-ray shielding plate blocks X-rays produced by irradiation of the shaping aperture array member with the charged particle beam.

A sample holder capable of limiting X-rays accepted into an X-ray detector is provided. The sample holder is for use in an electron microscope equipped with a polepiece assembly and a semiconductor detector. The sample holder includes: a sample stage on which a sample is held; and a shield plate. When the sample stage has been introduced in the sample chamber of the electron microscope, the shield plate is located between the polepiece assembly and the semiconductor detector.

There is provided a technique that includes: a process chamber in which a substrate is processed; a gas supply system configured to supply a processing gas into the process chamber; a first plasma generator installed to be wound around an outer periphery of the process chamber and configured to generate plasma from the processing gas in the process chamber; and a second plasma generator installed at an upper portion of the process chamber to protrude toward an inside of the process chamber and configured to generate plasma from the processing gas in the process chamber.

A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.

The present disclosure relates to an elementary device for producing a plasma. The elementary device includes a coaxial applicator of microwave power that includes a conductive central core, a conductive external shield surrounding the central core, a medium located between the central core and the shield to propagate microwave energy, and an insulating body. The elementary device further includes a system to couple to a microwave generator and is disposed at the shield. The shield has a proximal end plugged with the insulating body made of dielectric material that is transparent to the microwave energy. The insulating body has an external surface configured to contact and excite a gas located in the interior of a chamber. The insulating body extends exterior wise from the shield and its external surface is nonplanar and protrudes from the shield. The outside diameter of the body decreases from the shield to its tip.

An XRF analyzer can include an x-ray source and an x-ray detector; an x-ray source heat-sink adjacent a side of the x-ray source; and an x-ray detector heat-sink adjacent a side of the x-ray detector. In one embodiment, the x-ray source heat-sink can be separated from the x-ray detector heat sink by a material having a thermal conductivity of less than 20 W/(m*K). In another embodiment, the x-ray source heat-sink can be separated from the x-ray detector heat sink by at least 3 millimeters of a thermally insulating material. In one embodiment, the x-ray source heat-sink can be separated from the x-ray detector heat sink by a segment of the engine component casing. Separation of the heat sinks can help avoid heat from the x-ray source adversely affecting resolution of the x-ray detector.

A wafer support of the present invention includes shield sheet embedded in the ceramic base between the plasma generation electrode and the heater electrode in a state not contacting both the electrodes; and a shield pipe electrically connected to the shield sheet and laid to extend to outside of the ceramic base from the surface of the ceramic base on the side opposite to the wafer placement surface, wherein the wiring member for the plasma generation electrode is inserted through inside of the shield pipe in a state not contacting the shield pipe, and the wiring member for the heater electrode is disposed outside the shield pipe in a state not contacting the shield pipe.

A portable XRF analyzer includes a hand shield and a handle. In one embodiment, the XRF analyzer further comprises a power component spaced-apart from an engine component. The handle and the hand shield extend in parallel between the engine component and the power component, attaching the engine component to the power component. In another embodiment, the XRF analyzer further comprises two housing portions, each integrally formed in a single, monolithic body formed together at the same time. The two housing portions are joined together to form an XRF analyzer housing. In another embodiment, the hand shield is shorter than the handle.