The problem addressed by the present disclosure is to provide a stage device, a charged particle beam device, and a vacuum device, with which it is possible to increase the speed and the acceleration of positioning and to suppress the leakage of a magnetic field. As a means to resolve this problem, a stage device 100 comprises a support stage 10, a floating mechanism 20, and a movement stage 30. The movement stage 30 has a propulsion-applying unit 36, and the support stage 10 has a propulsion-receiving unit 11. The stage device 100 is configured so that when the movement stage 30 moves and the propulsion-applying unit 36 contacts or approaches the propulsion-receiving unit 11, the propulsion-applying unit 36 applies propulsion in the movement direction to the propulsion-receiving unit 11.

A positioning system can include a guide, a carrier element configured to engage and convey a workpiece, a motor having a mover element, a restraint coupled to the carrier element, and an actuator disposed between the restraint and the carrier element. The guide can be movable relative to a horizontal reference plane such that the carrier element coupled to the guide is inclined with respect to the horizontal reference plane. At least the mover element of the motor can be coupled to the carrier element and can be configured to move the carrier element along the guide. The restraint can be configured to selectively engage the guide to restrain movement of the carrier element in at least one direction along the guide when the guide is inclined out of the horizontal reference plane. The actuator can be configured to displace the carrier element relative to the restraint along the guide when the restraint is engaged with the guide.

An ion source for an ion implantation system has a plurality of arc chambers. The ion source forms an ion beam from a respective one of the plurality of arc chambers based on a position of the respective one of the plurality of arc chambers with respect to a beamline. The arc chambers are coupled to a carrousel that translates or rotates the respective one of the plurality of arc chambers to a beamline position associated with the beamline. One or more of the plurality of arc chambers can have at least one unique feature, or two or more of the plurality of arc chambers can be generally identical to one another.

A positioning system can include a guide, a carrier element configured to engage and convey a workpiece, a motor having a mover element, a restraint coupled to the carrier element, and an actuator disposed between the restraint and the carrier element. The guide can be movable relative to a horizontal reference plane such that the carrier element coupled to the guide is inclined with respect to the horizontal reference plane. At least the mover element of the motor can be coupled to the carrier element and can be configured to move the carrier element along the guide. The restraint can be configured to selectively engage the guide to restrain movement of the carrier element in at least one direction along the guide when the guide is inclined out of the horizontal reference plane. The actuator can be configured to displace the carrier element relative to the restraint along the guide when the restraint is engaged with the guide.

A paint hardening device is a device for hardening paint applied to a workpiece and includes an electron beam emission portion configured to emit an electron beam to harden the paint, and a storage chamber in which the electron beam emission portion is accommodated. The paint hardening device is configured to move the workpiece and the electron beam emission portion relative to each other while the electron beam is being applied to the paint from the electron beam emission portion in a state where an inert gas atmosphere is formed at least in an electron-beam passing region where the electron beam passes in the storage chamber, the electron beam being applied to the paint from the electron beam emission portion.

A plasma processing apparatus includes a processing chamber, a mounting table, a supporting shaft unit, a high frequency power supply and a high frequency shield. The mounting table mounts thereon a processing target in the processing chamber. The supporting shaft unit supports the mounting table from an opposite surface of a substrate mounting surface, has a protruding part that protrudes to the outside while penetrating through a wall of the processing chamber, and is connected to a rotation mechanism that rotates the mounting table about an axis. The high frequency power supply supplies a high frequency power for plasma processing. The high frequency shield covers the protruding part of the supporting shaft unit to suppress leakage of the high frequency power to the outside. The module unit is entirely detachable to divide each of the supporting shaft unit and the high frequency shield into parts in a longitudinal direction.

The invention relates to a particle beam apparatus comprising: a particle beam source configured to generate a particle beam; a magnetic coil configured to emit a magnetic field to manipulate the particle beam; an object table configured to hold a substrate; a positioning device comprising ferromagnetic material, the positioning device further comprising at least one motor configured to position the object table with respect to the particle beam; and a controller configured to provide a control signal to the at least one motor to at least partly compensate for a magnetic force induced by the magnetic field acting on the positioning device.

Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.

Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.

Introduced here is a plasma polymerization apparatus and process. Example embodiments include a vacuum chamber in a substantially symmetrical shape to a central axis. A rotation rack may be operable to rotate about the central axis of the vacuum chamber. Additionally, reactive species discharge mechanisms positioned around a perimeter of the vacuum chamber in a substantially symmetrical manner from the outer perimeter of the vacuum chamber may be configured to disperse reactive species into the vacuum chamber. The reactive species may form a polymeric multi-layer coating on surfaces of the one or more devices. Each layer may have a different composition of atoms to enhance the water resistance, corrosion resistance, and fiction resistance of the polymeric multi-layer coating.