A spin polarimeter includes: a particle beam source or a photon beam source that is a probe for a sample; a sample chamber in which the sample is accommodated; a spin detector that includes a target to be irradiated with an electron generated from the sample by a particle beam or a photon beam from the probe, and a target chamber in which the target is accommodated, and is configured to detect a spin of the sample by detecting an electron scattered on the target; a first exhaust system that is configured to exhaust the sample chamber; a second exhaust system that is configured to exhaust the target chamber; and an orifice that is disposed between the target chamber and the sample chamber.

A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.

A scanning electron microscope includes a spin detector configured to measure spin polarization of a secondary electron emitted from a sample, and an analysis device configured to analyze measurement data of the spin detector. The analysis device determines a width of a region where the secondary electron spin polarization locally changes in the measurement data. The analysis device further evaluates a strain in the sample based on the width of the region. With a configuration of the scanning electron microscope, it is possible to perform analysis of a strain in a magnetic material with high accuracy.

An inspection method for a substrate, the inspection method including: providing an electron beam having a first polarization state to a sample of the semiconductor substrate; detecting a first response signal of the sample caused by interaction of the electron beam having the first polarization state with the sample; providing an electron beam having a second polarization state to the sample of the semiconductor substrate; detecting a second response signal of the sample caused by interaction of the electron beam having the second polarization state with the sample; and determining a geometric or material property of the sample, based on the first response signal and the second response signal.

A non-contact angle measuring apparatus includes a matter-wave and energy (MWE) particle source and a detector. The MWE particle source is used for generating boson or fermion particles. The detector is used for detecting a plurality peaks or valleys of an interference pattern generated by 1) the boson or fermion particles corresponding to a slit, a bump, or a hole of a first plane and 2) matter waves' wavefront-split associated with the boson or fermion particles reflected by a second plane, wherein angular locations of the plurality peaks or valleys of the interference pattern, a first distance between a joint region of the first plane and the second plane, and a second distance between the detector and the slit are used for deciding an angle between the first plane and the second plane.

Provided is an electrostatic deflection convergence-type energy analyzer having a wide acceptance angle and high two-dimensional convergence performance, is capable of imaging two-dimensional real-space images and emission angle distributions, and enables two-dimensional convergence and imaging at 90 deflection with respect to an incident direction. Outer electrodes and inner electrodes are disposed along the shapes of two rotation bodies formed on the inside and the outside for a common rotation axis. The inner-surface shape of the outer electrode has a tapered shape becoming smaller in diameter toward both ends. The outer-surface shape of the inner electrodes has a tapered shape becoming smaller in diameter toward both ends. An electron incident hole and exit hole are formed in each of the outer electrodes at both ends on the rotation axis. The outer and the inner electrodes have applied thereto voltages for accelerating and decelerating electrons in proportion to the energy of incident electrons.

A fine atomic clock includes a particle source, an MW filter, an atomic gun, a Magneto-MW Trap (MMT) unit, an energy injection unit, and a probing unit. The particle source emits particles. The MW filter receives the particles and generates a plurality of coherent MW of particle beams. The particle beams forms a virtual space-time lattice in an enclosed space. The atomic gun emits a sample. The MMT unit utilizes a magnetic field to trap the sample in the virtual space-time lattice, and utilizes the particle beams to cool down the sample. The sample corresponds to fermions or molecules. The energy injection unit injects energy into the sample to activate the sample into an excitation state. The probing unit activates emission of the sample. An emission frequency of the sample corresponds to a characteristic emission frequency of the sample, and the emission frequency generates a standard time signal.

Provided is a spin-polarized scanning electron microscope capable of improving an SNR of a detected signal. The spin-polarized scanning electron microscope includes: a spin-polarized electron source configured to irradiate a sample with a spin-polarized electron beam that is an electron beam whose spin is deflected in a specific direction; a scanning unit configured to scan the sample by deflecting the spin-polarized electron beam; a spin detector configured to detect a spin direction of an emitted electron that is an electron emitted from the sample scanned with the spin-polarized electron beam; and a control unit configured to control the spin direction to be detected by the spin detector based on the spin direction of the spin-polarized electron beam.

A path of a spin-polarized electron beam is split into two by a splitter. A spin direction of the spin-polarized electron beam is rotated by a spin direction rotator disposed on a first path, and delayed by a first delay device. On a second path, the electron beam passes through a sample stage. The spin-polarized electron beams split into the first path and the second path are superposed by a biprism, and its intensity distribution is measured. Coherence is measured from a relation between a spin direction rotation angle, a delay time, and a visibility of an interference fringe.

The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.