The invention relates to a method of determining an aberration of a charged particle microscope. The method comprises a step of providing a charged particle microscope that is at least partly operable by a user. Then, a set of image data is obtained with said charged particle microscope. The image data is processed to determine an aberration of said charged particle microscope. According to the invention, said set of image data is actively obtained by a user. In particular, the image data may be obtained during normal operation of the microscope by a user, which may include navigating and/or focusing of the microscope. Thus, the set of image data is acquired by said user, and not by the controller thereof. This allows background processing of an aberration, and aberration correction during use of the charged particle microscope. The invention further relates to a charged particle microscope incorporating the method.

The radiation analyzing apparatus irradiates an object including a plurality of elements with a first radiation, detects a plurality of rays of a second radiation emitted from the object irradiated with the first radiation, derives an energy spectrum based on a signal of each of the plurality of rays of the second radiation, detects detection energy, which is energy absorbed in a reference element that is an element used as a reference or is energy emitted from the reference element, based on the energy spectrum, and corrects the energy spectrum based on reference energy information, which is previously stored in a storage unit and indicates reference energy that is energy absorbed in the reference element or is energy emitted from the reference element, and the detection energy.

System and method for preventing blurring of an image in a scanning direction caused by a signal processing delay of a detector, of a charged particle beam device. The charged particle beam device is configured to calibrate first image data generated based on a detection signal output from a detector when the sample is two-dimensionally scanned with the charged particle beam, to generate second image data, in which the second image data is generated using n first signal profiles each of which corresponds to a signal strength distribution in a first direction and which are extracted from the first image data, and a power spectral density P(f) (f: spatial frequency) of a window function corresponding to the signal processing delay of the detector.

According the present invention there is provided a method for adjusting a component handling assembly, the component handling assembly comprising, a plurality of stations at least some of which have a nest which can receive a component, and a rotatable turret having a plurality of component handling heads, and wherein the turret can rotate to transport components between the plurality of stations, the method comprising the steps of, capturing a first image of a reference element located at a first station, using a camera which is located on the rotatable turret; identifying the position in the first image of the centre of the reference element; rotating the turret so that the camera on the turret is in a position where it can capture a second image of nest of a second station; capturing a second image of the nest of the second station, using said camera; identifying the position in the second image of the centre of the nest of the second station; superimposing a marker on the second image at the same position as the position of the centre of the reference element in the first image; adjusting the second station until the position in the second image of the centre of the nest of the second station is aligned with the marker. There is further provided a corresponding component handling assembly.

A system and method involve applying an electron beam to a sample and obtaining an image of the sample with the applied electron beam. An orientation of the sample relative to the sample's zone axis is automatically determined based on a distribution of reflections in the image. The orientation of the sample is automatically adjusted to align with the sample's zone axis based on the determined orientation.

A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.

An object of the invention relates to the fact that the alignment of the sample stage and the optical image can be adjusted with high accuracy, good operability, and high throughput by utilizing a low magnification optical image and a high magnification optical image. The invention relates to the fact that an alignment adjustment by a sample table alignment can be performed using a first processed optical image obtained by enlarging or reducing or changing a visual field of the optical image of the sample table holding the sample by digital processing, and that an alignment adjustment by an alignment point designation can be performed using a second processed optical image different from the first processed optical image. According to the invention, it is possible to adjust the alignment of the sample stage and the optical image with reference to the outer shape of the sample table and the feature points on the sample without taking out the sample table holding the sample from the sample chamber.

An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.

A charged particle beam device includes a plurality of detectors configured to detect one or more signal charged particle beams caused by irradiation on a sample with one or more primary charged particle beams, and a control system. The control system is configured to measure an intensity distribution of the one or more signal charged particle beams detected by the plurality of detectors, and correct the intensity distribution by using a correction function. The control system is configured to generate an image based on the corrected intensity distribution.

Systems, devices, methods, and techniques for energy-loss spectroscopy at relatively large energy losses are described. A charged particle microscope system can include a beam column section. The beam column section can include one or more charged particle optical elements calibrated for a first energy and one or more charged particle optical elements calibrated for a second energy. The charged particle microscope system can include a detector section. The detector section can be disposed at a position downstream of the beam column section. The detector section can include an electrostatic or magnetic prism and one or more charged particle optical elements calibrated for the second energy. The first energy and the second energy can be different.