A glass wiring board that can be kept from cracking by better preventing concentration of stresses in a glass plate on which a conductor layer including an electrolytic copper plating layer is provided, the wiring board includes: a glass plate; a first metal layer covering at least a part of the glass plate; and a second metal layer covering at least a part of the first metal layer, and the area of the first metal layer in contact with the second metal layer is smaller than the area of the second metal layer facing the first metal layer.

The present invention includes a method of creating high temperature mechanically and thermally stabilized PCB fabrication on a photo-definable glass substrate or photosensitive glass substrate.

The present invention includes a method of creating high temperature mechanically and thermally stabilized PCB fabrication on a photo-definable glass substrate or photosensitive glass substrate.

This copper/ceramic bonded body includes: a copper member made of copper or a copper alloy; and a ceramic member made of aluminum-containing ceramics, the copper member and the ceramic member are bonded to each other, in which, at a bonded interface between the copper member and the ceramic member, an active metal compound layer containing an active metal compound that is a compound of one or more active metals selected from Ti, Zr, Nb, and Hf is formed on a ceramic member side, and in the active metal compound layer Al and Cu are present at a grain boundary of the active metal compound.

This copper/ceramic bonded body includes: a copper member made of copper or a copper alloy; and a ceramic member made of aluminum-containing ceramics, the copper member and the ceramic member are bonded to each other, in which, at a bonded interface between the copper member and the ceramic member, an active metal compound layer containing an active metal compound that is a compound of one or more active metals selected from Ti, Zr, Nb, and Hf is formed on a ceramic member side, and in the active metal compound layer Al and Cu are present at a grain boundary of the active metal compound.

Microelectronic assemblies, related devices and methods, are disclosed herein. In some embodiments, a microelectronic assembly may include a glass substrate having a plurality of conductive through-glass vias (TGV); a magnetic core inductor including: a first conductive TGV at least partially surrounded by a magnetic material; and a second conductive TGV electrically coupled to the first TGV; a first die in a first dielectric layer, wherein the first dielectric layer is on the glass substrate; and a second die in a second dielectric layer, wherein the second dielectric layer is on the first dielectric layer, and wherein the second die is electrically coupled to the magnetic core inductor.

Embodiments of the present disclosure are based on recognition that using a glass support structure at the back side of an IC structure with TFT memory may advantageously reduce parasitic effects of front end of line (FEOL) devices (e.g., FEOL transistors) in the IC structure, compared to using a silicon-based (Si) support structure at the back. Arranging a support structure with a dielectric constant lower than that of Si at the back of an IC structure may advantageously decrease various parasitic effects associated with the FEOL devices of the IC structure, since such parasitic effects are typically proportional to the dielectric constant of the surrounding medium.

Embodiments of the present disclosure are based on recognition that using a glass support structure at the back side of an IC structure with TFT memory may advantageously reduce parasitic effects of front end of line (FEOL) devices (e.g., FEOL transistors) in the IC structure, compared to using a silicon-based (Si) support structure at the back. Arranging a support structure with a dielectric constant lower than that of Si at the back of an IC structure may advantageously decrease various parasitic effects associated with the FEOL devices of the IC structure, since such parasitic effects are typically proportional to the dielectric constant of the surrounding medium.

The disclosure provides a chip package and an electronic device. The chip package includes: a package substrate, a semiconductor substrate provided on the package substrate and a first chip and a second chip provided on the semiconductor substrate. The semiconductor substrate includes a first group of pins and a second group of pins arranged on the semiconductor substrate and a connecting layer located between the first group of pins and the second group of pins. The connecting layer has a plurality of connecting channels, and the first group of pins and the second group of pins are connected through the plurality of connecting channels. The first chip has a third group of pins, the second chip has a fourth group of pins, and the third group of pins are connected to the first group of pins, and the fourth group of pins are connected to the second group of pins.

The disclosure provides a chip package and an electronic device. The chip package includes: a package substrate, a semiconductor substrate provided on the package substrate and a first chip and a second chip provided on the semiconductor substrate. The semiconductor substrate includes a first group of pins and a second group of pins arranged on the semiconductor substrate and a connecting layer located between the first group of pins and the second group of pins. The connecting layer has a plurality of connecting channels, and the first group of pins and the second group of pins are connected through the plurality of connecting channels. The first chip has a third group of pins, the second chip has a fourth group of pins, and the third group of pins are connected to the first group of pins, and the fourth group of pins are connected to the second group of pins.