A Group III-Nitride (III-N) device structure is provided which comprises: a heterostructure having three or more layers comprising III-N material, an anode within a recess that extends through two or more of the layers, wherein the anode is in electrical contact with the first layer, a cathode comprising donor dopants, wherein the cathode is on the first layer of the heterostructure; and a conducting region in the first layer in direct contact to the cathode and conductively connected to the anode. Other embodiments are also disclosed and claimed.

An electrostatic discharge protection device includes a first well region, a second well region, a first doped region, and a first heavily doped region. The first well region and the second well region are disposed in a semiconductor substrate. The first doped region is disposed in the first well region and the second well region. The first heavily doped region is disposed in the first doped region in the first well region. The first well region and the first doped region have a first conductivity type, and the second well region and the first heavily doped region have a second conductivity type that is the opposite of the first conductivity type.

A chip for controlled electrostatic discharging to avoid loading on input/output pins, comprising: a die comprising: a first plurality of connector pins each conductively coupled to one or more signal paths, each of the first plurality of connector pins having a first height; and a second plurality of connector pins independent of any signal paths, each of the second plurality of connector pins having a second height greater than the first height.

A voltage tracking circuit is provided and includes first and second P-type transistors and a voltage reducing circuit. The drain of the first P-type transistor is coupled to a first voltage terminal. The voltage reducing circuit is coupled between the first voltage terminal and the gate of the first P-type transistor. The voltage reducing circuit reduces a first voltage at the first voltage terminal by a modulation voltage to generate a control voltage and provides the control voltage to the gate of the first P-type transistor. The gate of the second P-type transistor is coupled to the first voltage terminal, and the drain thereof is coupled to a second voltage terminal. The source of the first P-type transistor and the source of the second P-type transistor are coupled to the output terminal of the voltage tracking circuit. The output voltage is generated at the output terminal.

The present disclosure concerns a switching device comprising a first phosphorus-doped silicon layer on top of and in contact with a second arsenic-doped silicon layer. The present disclosure also concerns a method of making a switching device that includes forming a phosphorus-doped silicon layer in an arsenic-doped silicon layer.

Overvoltage protection circuits are provided. In some embodiments, an overvoltage protection circuit includes a first diode made of a first semiconductor material having a bandgap width greater than that of silicon. A second diode is included and is electrically cross-coupled with the first diode. The second diode is made of a second semiconductor material different from the first semiconductor material.

In some aspects, the techniques described herein relate to an electromagnetic interference (EMI) filter circuit including: an input terminal; an output terminal; an electrical ground terminal; a resistor electrically coupled between the input terminal and the output terminal; a first bipolar transistor including: a collector terminal electrically coupled with the input terminal; an emitter terminal electrically coupled with the electrical ground terminal; and a base terminal that is electrically floating; and a second bipolar transistor including: a collector terminal electrically coupled with the output terminal; an emitter terminal electrically coupled with the electrical ground terminal; and a base terminal that is electrically floating.

An electrostatic discharge (ESD) protection device may be provided, including a substrate having a conductivity region arranged therein, a first terminal region and a second terminal region arranged within the conductivity region, and a field distribution structure. The field distribution structure may include an intermediate region arranged within the conductivity region between the first terminal region and the second terminal region, an isolation element arranged over the intermediate region, and a first conductive plate and a second conductive plate arranged over the isolation element. The first conductive plate may be electrically connected to the first terminal region and the second conductive plate may be electrically connected to the second terminal region.

Provided is a tap cell including a substrate, a first well, a second well, a first doped region, and the second doped region. The substrate has a first region and a second region. The first well has a first dopant type and includes a first portion disposed in the first region and a second portion extending into the second region. The second well has a second dopant type and includes a third portion disposed in the second region and a fourth portion extending into the first region. The first doped region having the first dopant type is disposed in the second portion of the first well and the third portion of the second well along the second region. The second doped region having the second dopant type is disposed in the first portion of the first well and the fourth portion of the second well along the first region.

Embodiments herein describe techniques, systems, and method for a semiconductor device. Embodiments herein may present a semiconductor device having a channel area including a channel III-V material, and a source area including a first portion and a second portion of the source area. The first portion of the source area includes a first III-V material, and the second portion of the source area includes a second III-V material. The channel III-V material, the first III-V material and the second III-V material may have a same lattice constant. Moreover, the first III-V material has a first bandgap, and the second III-V material has a second bandgap, the channel III-V material has a channel III-V material bandgap, where the channel material bandgap, the second bandgap, and the first bandgap form a monotonic sequence of bandgaps. Other embodiments may be described and/or claimed.