An infrared photodetector including a substrate, a barrier layer, and an absorber layer disposed between the substrate and the barrier layer, the absorber layer having a molar concentration grading that results in an uncoated quantum efficiency of greater than about 40 percent.

A photosensor includes a base substrate; an insulating layer on the base substrate; and a photodiode including a semiconductor junction on a side of the insulating layer away from the base substrate. The semiconductor junction includes a first polarity semiconductor layer, an intrinsic semiconductor layer, and a second polarity semiconductor layer, stacked on the insulating layer. The second polarity semiconductor layer encapsulates a lateral surface of the intrinsic semiconductor layer.

Photoelectric conversion device includes first region of first conductivity type arranged in semiconductor layer having first second surfaces, second region of second conductivity type arranged between the second surface and the first region and forming avalanche photodiode, separation region of the second conductivity type arranged between the first and second surfaces to surround the second region, contact region of the second conductivity type contacted to the separation region, first contact plug connected to the first region, and second contact plug connected to the contact region. The second region has shape of rectangle, and the second contact plug is arranged in diagonal direction of the rectangle. Distance between center of the first contact plug and center of the second contact plug is larger than distance between center of the second region and the center of the second contact plug.

Intermediate temperature metallization pastes containing vanadium are disclosed. The metallization pastes can be used to fabricate electrodes interconnected to a transparent conductor.

Provided are a photodetector, a manufacturing method thereof, and a lidar system. A photosensitive region of the photodetector is circular and has a diameter range of 100-300 μm. Compared with a conventional photodetector having a photosensitive region with a diameter of 50 μm, the photodetector of the present invention can have a detection range greater than 200 m, responsivity greater than 20 A/W and a dark current less than 10 nA.

Screen-printable metallization pastes for forming thin oxide tunnel junctions on the back-side surface of solar cells are disclosed. Interdigitated metal contacts can be deposited on the oxide tunnel junctions to provide all-back metal contact to a solar cell.

Provided is a pixel. The pixel includes a substrate, a first electrode disposed on the substrate, a partition wall insulation layer disposed on the substrate to cover a first portion of the first electrode, a second electrode disposed on the partition wall insulation layer and including a second portion overlapping the first portion, and a light emitting element disposed on a first side surface of the partition wall insulation layer between the first portion and the second portion and connected to the first electrode and the second electrode.

An optical sensor includes a substrate, a first/second/third well disposed in a sensing region, a deep trench isolation structure, and a passivation layer. The substrate has a first conductivity type and includes the sensing region. The first well has a second conductivity type and a first depth. The second well has the second conductivity type and a second depth. The third well has the first conductivity type and a third depth. The deep trench isolation structure is disposed in the substrate and surrounding the sensing region, wherein the depth of the deep trench isolation structure is greater than the first depth, the first depth is greater than the second depth, and the second depth is greater than the third depth. The passivation layer is disposed over the substrate, wherein the passivation layer includes a plurality of protruding portions disposed directly above the sensing region.

A solar cell includes polysilicon P-type and N-type doped regions on a backside of a substrate, such as a silicon wafer. A trench structure separates the P-type doped region from the N-type doped region. Each of the P-type and N-type doped regions may be formed over a thin dielectric layer. The trench structure may include a textured surface for increased solar radiation collection. Among other advantages, the resulting structure increases efficiency by providing isolation between adjacent P-type and N-type doped regions, thereby preventing recombination in a space charge region where the doped regions would have touched.

A photovoltaic cell may include a substrate configured as a single light absorption region. The cell may include at least one first semiconductor region and at least one second semiconductor region arranged on or in the substrate. The cell may include a plurality of first conductive contacts arranged on the substrate and physically separated from one another and a plurality of second conductive contacts arranged on the substrate and physically separated from one another. Each first conductive contact may be configured to facilitate electrical connection with the at least one first semiconductor region. Each second semiconductor conductive contact may be configured to facilitate electrical connection with the at least one second semiconductor region. Each of the first conductive contacts may form at least one separate cell partition with at least one of the second conductive contacts, thereby forming a plurality of cell partitions on or in the substrate.