Patent classifications
H01L31/065
Photovoltaic device
Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. One embodiment of the present invention provides a photovoltaic (PV) device. The PV device comprises an absorber layer made of a compound semiconductor; and an emitter layer located closer than the absorber layer to a first side of the device. The PV device includes a p-n junction formed between the emitter layer and the absorber layer, the p-n junction causing a voltage to be generated in the device in response to the device being exposed to light at a second side of the device. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
Photovoltaic device
Methods and apparatus are provided for converting electromagnetic radiation, such as solar energy, into electric energy with increased efficiency when compared to conventional solar cells. One embodiment of the present invention provides a photovoltaic (PV) device. The PV device comprises an absorber layer made of a compound semiconductor; and an emitter layer located closer than the absorber layer to a first side of the device. The PV device includes a p-n junction formed between the emitter layer and the absorber layer, the p-n junction causing a voltage to be generated in the device in response to the device being exposed to light at a second side of the device. Such innovations may allow for greater efficiency and flexibility in PV devices when compared to conventional solar cells.
DOPING AND PASSIVATION FOR HIGH EFFICIENCY SOLAR CELLS
The present disclosure relates to thin-film solar cells with improved efficiency and methods for producing thin-film solar cells having increased efficiency. In certain embodiments, thin-film solar cells having an efficiency of over 21%, over 20%, over 19%, over 15%, over 10%, etc. has been obtained using the methods of the disclosure. In certain aspects, the methods of the disclosure use passivation, passivating oxides, and/or doping treatments in increase the efficiency of the thin-film solar cells; e.g., CdTe-based thin-film solar cells.
COST-EFFICIENT HIGH POWER PECVD DEPOSITION FOR SOLAR CELLS
A method for forming a photovoltaic device includes providing a substrate. A layer is deposited to form one or more layers of a photovoltaic stack on the substrate. The depositing of the amorphous layer includes performing a high power flash deposition for depositing a first portion of the layer. A low power deposition is performed for depositing a second portion of the layer.
COST-EFFICIENT HIGH POWER PECVD DEPOSITION FOR SOLAR CELLS
A method for forming a photovoltaic device includes providing a substrate. A layer is deposited to form one or more layers of a photovoltaic stack on the substrate. The depositing of the amorphous layer includes performing a high power flash deposition for depositing a first portion of the layer. A low power deposition is performed for depositing a second portion of the layer.
Photovoltaic Cells
A photovoltaic cell incorporating a semiconductor element (10) composed entirely of a single conductivity type. A biasing agent (26) having a work function different from that of the semiconductor element overlies a face of the element and produces a band bending and thus an electric field in a space charge region. Electrodes are in contact with the semiconductor element within the space charge region. Carriers generated by light absorbed in the semiconductor element are accelerated toward the electrodes by the field.
Photovoltaic Cells
A photovoltaic cell incorporating a semiconductor element (10) composed entirely of a single conductivity type. A biasing agent (26) having a work function different from that of the semiconductor element overlies a face of the element and produces a band bending and thus an electric field in a space charge region. Electrodes are in contact with the semiconductor element within the space charge region. Carriers generated by light absorbed in the semiconductor element are accelerated toward the electrodes by the field.
DISPLAY DEVICE AND ACTIVE ARRAY SWITCH SUBSTRATE THEREOF
This application provides a display device and an active array switch substrate thereof. The active array switch substrate includes: a substrate; active array switches, formed on the substrate, where the active array switch includes a source electrode; at least one solar structure, disposed on the source electrode, where the solar structure includes a solar cell; and a transparent electrode, covered on the solar cell. The solar cell includes an N-type layer, an I-type layer of a microcrystalline silicon structure, and a P-type layer sequentially stacked in a direction away from the source electrode.
DISPLAY DEVICE AND ACTIVE ARRAY SWITCH SUBSTRATE THEREOF
This application provides a display device and an active array switch substrate thereof. The active array switch substrate includes: a substrate; active array switches, formed on the substrate, where the active array switch includes a source electrode; at least one solar structure, disposed on the source electrode, where the solar structure includes a solar cell; and a transparent electrode, covered on the solar cell. The solar cell includes an N-type layer, an I-type layer of a microcrystalline silicon structure, and a P-type layer sequentially stacked in a direction away from the source electrode.
ALUMINUM GALLIUM ARSENIDE AND INDIUM GALLIUM PHOSPHIDE POWER CONVERTER ON SILICON
A semiconductor structure for optical power conversion and a method of forming the semiconductor structure are provided. In an aspect, the method may include removing a first portion of the semiconductor structure from a first region, wherein the semiconductor structure comprises a layered photovoltaic structure on a silicon-on-insulator structure. A second portion of the semiconductor structure may be removed from a second region, wherein the second region is located adjacent to the first region, and wherein an insulator layer of the silicon-on-insulator structure is exposed by the removed second portion. A passivation layer pattern may be formed over the semiconductor structure. Electrodes may be formed on portions of the surfaces of the semiconductor structure that are uncovered by the passivation layer.