Patent classifications
H01L31/208
METHOD FOR TREATING A HETEROJUNCTION PHOTOVOLTAIC CELL PRECURSOR
A method for treating a stack, the stack including a substrate of crystalline silicon, a first passivation layer of hydrogenated amorphous silicon, disposed on a first face of the substrate; and a first layer of n-doped amorphous silicon, disposed on the first passivation layer; the method including a step of exposing the stack to electromagnetic radiation emitted by an electromagnetic radiation source, the first face of the substrate pointing to the electromagnetic radiation source, the electromagnetic radiation having at least one first wavelength of between 300 nm and 550 nm and at least one second wavelength of between 550 nm and 1100 nm.
Method of processing inconsistencies in solar cell devices and devices formed thereby
The present disclosure is directed to a method of processing a solar cell device. The method comprises detecting at least one inconsistency at a surface of a semiconductor substrate having a solar cell active region formed therein. A deposition pattern is determined based on the location of the at least one inconsistency. A material is selectively deposited on the substrate according to the deposition pattern.
METHOD OF PRODUCTION OF SILICON HETEROJUNCTION SOLAR CELLS WITH STABILIZATION STEP AND PRODUCTION LINE SECTION FOR THE STABILIZING STEP
The present invention relates to a method of production of silicon heterojunction solar cells having at least one stabilization step, wherein the stabilization step is performed after amorphous silicon layers, and preferably also transparent layers or even metallic contact materials, have already been applied beforehand to crystalline silicon solar wafers. The problem addressed by the invention consists in finding an efficient stabilization step which permits high solar cell efficiencies. The problem is solved by a method of production of silicon heterojunction solar cells in which the stabilization step comprises heating the solar cell to temperatures above 200° C. and illumination from a light source, wherein the light source emits light in a wavelength range <2 500 nm and wherein one of the light doses emitted by the light source is in excess of 8 000 Ws/m.sup.2.
METHOD OF PROCESSING INCONSISTENCIES IN SOLAR CELL DEVICES AND DEVICES FORMED THEREBY
The present disclosure is directed to a method of processing a solar cell device. The method comprises detecting at least one inconsistency at a surface of a semiconductor substrate having a solar cell active region formed therein. A deposition pattern is determined based on the location of the at least one inconsistency. A material is selectively deposited on the substrate according to the deposition pattern.
SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME
Provided is a solar cell and a method for manufacturing the same, the method includes: forming a doped layer on a surface of a semiconductor substrate, the doped layer having a first doping concentration of a doping element in the doped layer; depositing, on a surface of the doped layer, a doped amorphous silicon layer including the doping element; selectively removing at least one region of the doped amorphous silicon layer; performing annealing treatment, for the semiconductor substrate to form a lightly doped region having the first doping concentration and a heavily doped region having a second doping concentration in the doped layer, the second doping concentration is greater than the first doping concentration; and forming a solar cell by post-processing the annealed semiconductor substrate. The solar cell and the method for manufacturing the same simplify the manufacturing process and improve conversion efficiency of the solar cell.
Solar cell and method for manufacturing the same
Provided is a solar cell and a method for manufacturing the same, the method includes: forming a doped layer on a surface of a semiconductor substrate, the doped layer having a first doping concentration of a doping element in the doped layer; depositing, on a surface of the doped layer, a doped amorphous silicon layer including the doping element; selectively removing at least one region of the doped amorphous silicon layer; performing annealing treatment, for the semiconductor substrate to form a lightly doped region having the first doping concentration and a heavily doped region having a second doping concentration in the doped layer, the second doping concentration is greater than the first doping concentration; and forming a solar cell by post-processing the annealed semiconductor substrate. The solar cell and the method for manufacturing the same simplify the manufacturing process and improve conversion efficiency of the solar cell.
METHOD AND SYSTEM FOR THE PRODUCTION OF A STARTING MATERIAL FOR A SILICON SOLAR CELL WITH PASSIVATED CONTACTS
The present invention is directed to a method as well as to a machine for producing a starting material for a silicon solar cell with passivated contacts.
Method of manufacturing solar cell with increased power generation area
Discloses is a method of manufacturing a solar cell with an increased power generation area to increase the area used for actual power generation without increasing the size of the solar cell.
Method of processing inconsistencies in solar cell devices and devices formed thereby
The present disclosure is directed to a method of processing a solar cell device. The method comprises detecting at least one inconsistency at a surface of a semiconductor substrate having a solar cell active region formed therein. A deposition pattern is determined based on the location of the at least one inconsistency. A material is selectively deposited on the substrate according to the deposition pattern.
Photovoltaic devices and method of manufacturing
A photovoltaic device includes a substrate structure and at least one Se-containing layer, such as a CdSeTe layer. A process for manufacturing the photovoltaic device includes forming the CdSeTe layer over a substrate by at least one of sputtering, evaporation deposition, CVD, chemical bath deposition process, and vapor transport deposition process. The process can also include controlling a thickness range of the Se-containing layer.