A nanorod light emitting element includes a first semiconductor layer having a rod shape, a first active layer covering a first portion of a side surface of the first semiconductor layer, the first portion extending from an upper surface of the first semiconductor layer, a second semiconductor layer covering the first active layer, a second active layer covering a second portion of the side surface, the second portion extending from a lower surface of the first semiconductor layer, and spaced apart from the first active layer, and a third semiconductor layer covering the second active layer and spaced apart from the second semiconductor layer.

A light-emitting element includes a core comprising a first semiconductor layer, a second semiconductor layer disposed on the first semiconductor layer, and an emissive layer disposed between the first semiconductor layer and the second semiconductor layer, an interlayer dielectric film surrounding a side surface of the core, a first element insulating film surrounding an outer surface of the interlayer dielectric film, and a second element insulating film surrounding an outer surface of the first element insulating film. The interlayer dielectric film includes an oxide insulating material having a dielectric constant of about 10 or more, and the interlayer dielectric film has a thickness of less than or equal to about 5 nm.

A semiconductor device package includes a substrate, a partition structure and a polymer film. The partition structure is disposed on the substrate and defines a space for accommodating a semiconductor device. The polymer film is adjacent to a side of the partition structure distal to the substrate. A first side surface of the polymer film substantially aligns with a first side surface of the partition structure.

A light emitting apparatus includes an electrode and a laminated structure. The laminated structure includes an n-type first semiconductor layer, a light emitting layer, a p-type second semiconductor layer, a tunnel junction layer, and an n-type third semiconductor layer. The electrode is electrically connected to the first semiconductor layer. The first semiconductor layer, the light emitting layer, the second semiconductor layer, the tunnel junction layer, and the third semiconductor layer are arranged in a presented order. The light emitting layer and the first semiconductor layer form a columnar section.

A dislocation-free GaN/InGaN-based nanowires-LED epitaxially grown on a transparent, electrically conductive template substrate. The simultaneous transparency and conductivity are provided by a thin, translucent metal contact integrated with a quartz substrate. The light transmission properties of the translucent metal contact are tunable during epitaxial growth of the nanowires LED. Transparent light emitting diodes (LED) devices, optical circuits, solar cells, touch screen displays, and integrated photonic circuits can be implemented using the current platform.

A method of making a crystallographically-oriented metallic film with a two-dimensional crystal layer, comprising the steps of providing a metal film on a substrate, transferring a two-dimensional crystal layer onto the metal film and forming a two-dimensional crystal layer on metal film complex, heating the two-dimensional crystal layer on metal film complex, and forming a crystallographically-oriented metallic film with a two-dimensional crystal layer. A crystallographically-oriented metallic film with a two-dimensional crystal layer, comprising a substrate, a metal film on the substrate, a two-dimensional crystal layer on the metal film on the substrate, and a tunable microstructure within the porous metal/two-dimensional crystal layer on the substrate, wherein the metal film has crystallographic registry to the two-dimensional crystal layer.

A method of making a crystallographically-oriented metallic film with a two-dimensional crystal layer, comprising the steps of providing a metal film on a substrate, transferring a two-dimensional crystal layer onto the metal film and forming a two-dimensional crystal layer on metal film complex, heating the two-dimensional crystal layer on metal film complex, and forming a crystallographically-oriented metallic film with a two-dimensional crystal layer. A crystallographically-oriented metallic film with a two-dimensional crystal layer, comprising a substrate, a metal film on the substrate, a two-dimensional crystal layer on the metal film on the substrate, and a tunable microstructure within the porous metal/two-dimensional crystal layer on the substrate, wherein the metal film has crystallographic registry to the two-dimensional crystal layer.

Disclosed is a method for manufacturing a set of light emitters each including a light emitting structure and an electrical contact, the method including the steps of:—providing a wafer carrying a set of light emitting structures, each emitting structure being configured to emit a first radiation when an electric current flows through the emitting structure, and—manufacturing, for each emitting structure, an electric contact, the contact being electrically insulated from each other. The manufacturing includes:—forming a first set of at least two first contacts and at least one conductor, the contact of the first set being electrically connected to each other first contact of the one or the conductor,—injecting, for each contact belonging to the first set, a electric current through the contact and the corresponding emitting structure, and—observing a radiation emitted in response to the injection.

A nanorod light emitting device includes a semiconductor light emitting nanorod, and a passivation film surrounding a sidewall of the semiconductor light emitting nanorod and having insulating properties, wherein the passivation film includes an insulating crystalline material having a same crystal structure as a crystal structure of the semiconductor light emitting nanorod.

Provided are an ultraviolet emitting optical device and an operating method thereof. The ultraviolet emitting optical device includes a substrate, a first encapsulation layer, an active layer and a second encapsulation layer sequentially stacked on the substrate, a first electrode layer between the first encapsulation layer and the active layer, a second electrode layer between the active layer and the second encapsulation layer, and color centers provided in the active layer, wherein the active layer includes hexagonal boron nitride (hBN), wherein the color centers are configured to emit light in an ultraviolet wavelength range.