A method of forming semiconductor structure includes attaching backsides of top dies to a front side of a bottom wafer, the bottom wafer comprising a plurality of bottom dies; forming first conductive pillars on the front side of the bottom wafer adjacent to the top dies; forming a first dielectric material on the front side of the bottom wafer around the top dies and around the first conductive pillars; and dicing the bottom wafer to form a plurality of structures, each of the plurality of structures comprising at least one of the top dies and at least one of the bottom dies.

A method of forming semiconductor structure includes attaching backsides of top dies to a front side of a bottom wafer, the bottom wafer comprising a plurality of bottom dies; forming first conductive pillars on the front side of the bottom wafer adjacent to the top dies; forming a first dielectric material on the front side of the bottom wafer around the top dies and around the first conductive pillars; and dicing the bottom wafer to form a plurality of structures, each of the plurality of structures comprising at least one of the top dies and at least one of the bottom dies.

A semiconductor chip set with double-sided off-chip bonding structure in the disclosure comprises at least one first off-chip bonding structure formed above a first surface of the semiconductor chip set, and at least one second off-chip bonding structure formed above a second surface of the semiconductor chip set, wherein the first surface is opposite to the second surface and each of the first off-chip bonding structure and the second off-chip bonding structure is used for connecting to an electrical connecting point external to the semiconductor chip set through bonding wire, through-silicon via (TSV) or micro bump.

A semiconductor chip set with double-sided off-chip bonding structure in the disclosure comprises at least one first off-chip bonding structure formed above a first surface of the semiconductor chip set, and at least one second off-chip bonding structure formed above a second surface of the semiconductor chip set, wherein the first surface is opposite to the second surface and each of the first off-chip bonding structure and the second off-chip bonding structure is used for connecting to an electrical connecting point external to the semiconductor chip set through bonding wire, through-silicon via (TSV) or micro bump.

A method includes disposing a patterned conductor layer directly on mold material in a fan-out space adjacent to an integrated circuit (IC) chip in a reconstituted wafer. The patterned conductor layer is limited or confined in spatial extent to the fan-out space. The method further includes configuring the patterned conductor layer disposed directly on mold material as a first redistribution layer (RDL) in a fan-out package of the IC chip to carry signals associated with at least one input-output (I/O) contact on the chip.

A discrete three-dimensional (3-D) processor comprises a plurality of storage-processing units (SPU's), each of the SPU's comprising a non-memory circuit, at least a memory array and at least an off-die peripheral-circuit component thereof. The 3-D processor further comprises first and second dice. The first die comprises the memory arrays, whereas the second die comprises the non-memory circuit and the off-die peripheral-circuit component.

The invention relates to a modular element (2) comprising a stratification of first and second electroconductive plates (PH2, PB2) which are separated by an intermediate dielectric layer (CD2) and at least one electronic power switching chip (CP1, CP2) which is implanted between the first and second plates, the chip having a upper face comprising a first power electrode and a switching control electrode and a lower face comprising a second power electrode, and the first and second power electrodes being in electrical continuity respectively with the first and second plates. According to the invention, the modular element comprises a plurality of openings (OG2, OA2, OB2, OC2, OD2) extending into the stratification from outer surfaces of the first and second plates and perpendicularly to said outer surfaces, the plurality of openings comprising at least one first opening (OG2) communicating with the switching control electrode and at least one second opening (OA2, OB2) passing through the entire stratification, the first and second openings each comprising a dielectric layer (DE2) and an electroconductive layer (CI2), and the electroconductive layer of the first opening being electrically connected to the switching control electrode.

The invention relates to a modular element (2) comprising a stratification of first and second electroconductive plates (PH2, PB2) which are separated by an intermediate dielectric layer (CD2) and at least one electronic power switching chip (CP1, CP2) which is implanted between the first and second plates, the chip having a upper face comprising a first power electrode and a switching control electrode and a lower face comprising a second power electrode, and the first and second power electrodes being in electrical continuity respectively with the first and second plates. According to the invention, the modular element comprises a plurality of openings (OG2, OA2, OB2, OC2, OD2) extending into the stratification from outer surfaces of the first and second plates and perpendicularly to said outer surfaces, the plurality of openings comprising at least one first opening (OG2) communicating with the switching control electrode and at least one second opening (OA2, OB2) passing through the entire stratification, the first and second openings each comprising a dielectric layer (DE2) and an electroconductive layer (CI2), and the electroconductive layer of the first opening being electrically connected to the switching control electrode.

Embodiments of bonded semiconductor structures and fabrication methods thereof are disclosed. In an example, a method for forming a semiconductor device is disclosed. A first device layer is formed on a first substrate. A first bonding layer including a first bonding contact and a first bonding alignment mark is formed above the first device layer. A second device layer is formed on a second substrate. A second bonding layer including a second bonding contact and a second bonding alignment mark is formed above the second device layer. The first bonding alignment mark is aligned with the second bonding alignment mark, such that the first bonding contact is aligned with the second bonding contact. The first substrate and the second substrate are bonded in a face-to-face manner, so that the first bonding contact is in contact with the second bonding contact at a bonding interface, and the first bonding alignment mark is in contact with the second bonding alignment mark at the bonding interface.

Embodiments of bonded semiconductor structures and fabrication methods thereof are disclosed. In an example, a method for forming a semiconductor device is disclosed. A first device layer is formed on a first substrate. A first bonding layer including a first bonding contact and a first bonding alignment mark is formed above the first device layer. A second device layer is formed on a second substrate. A second bonding layer including a second bonding contact and a second bonding alignment mark is formed above the second device layer. The first bonding alignment mark is aligned with the second bonding alignment mark, such that the first bonding contact is aligned with the second bonding contact. The first substrate and the second substrate are bonded in a face-to-face manner, so that the first bonding contact is in contact with the second bonding contact at a bonding interface, and the first bonding alignment mark is in contact with the second bonding alignment mark at the bonding interface.