A 3D semiconductor device, the device including: a first layer including a first single crystal transistor; a second layer including second transistors; a third layer including third transistors; a fourth layer including fourth transistors, where the first layer is overlaid by the second layer, where the second layer is overlaid by the third layer, and where the third layer is overlaid by the fourth layer; where a plurality of the fourth transistors are aligned to the plurality of the first single crystal transistor with less than 40 nm alignment error, where the third transistors are junction-less transistors (JLT), where each of the fourth transistors include a transistor channel, a drain and a source, and where the transistor channel is significantly narrower than the drain or the source.

A wafer-to-wafer semiconductor device includes a first wafer substrate having a first bonding layer formed on a first bulk substrate layer. A second wafer substrate includes a second bonding layer formed on a second bulk substrate layer. The second bonding layer is bonded to the first bonding layer to define a bonding interface. At least one of the first wafer substrate and the second wafer substrate includes a crack-arresting film layer configured to increase a bonding energy of the bonding interface.

A wafer-to-wafer semiconductor device includes a first wafer substrate having a first bonding layer formed on a first bulk substrate layer. A second wafer substrate includes a second bonding layer formed on a second bulk substrate layer. The second bonding layer is bonded to the first bonding layer to define a bonding interface. At least one of the first wafer substrate and the second wafer substrate includes a crack-arresting film layer configured to increase a bonding energy of the bonding interface.

A stacked-chip assembly including an IC chip or die that is electrically interconnected to another chip and/or a substrate by one or more traces that are coupled through sidewalls of the chip. Electrical traces extending over a sidewall of the chip may contact metal traces of one or more die interconnect levels that intersect the chip edge. Following chip fabrication, singulation may expose a metal trace that intersects the chip sidewall. Following singulation, a conductive sidewall interconnect trace formed over the chip sidewall is to couple the exposed trace to a top or bottom side of a chip or substrate. The sidewall interconnect trace may be further coupled to a ground, signal, or power rail. The sidewall interconnect trace may terminate with a bond pad to which another chip, substrate, or wire lead is bonded. The sidewall interconnect trace may terminate at another sidewall location on the same chip or another chip.

A semiconductor device of the present invention includes a circuit layer formed of a conductive material, a semiconductor element mounted on a first surface of the circuit layer, and a ceramic substrate disposed on a second surface of the circuit layer, in which a Ag underlayer having a glass layer and a Ag layer laminated on the glass layer is formed on the first surface of the circuit layer, and the Ag layer of the Ag underlayer and the semiconductor element are directly joined together.

A semiconductor device of the present invention includes a circuit layer formed of a conductive material, a semiconductor element mounted on a first surface of the circuit layer, and a ceramic substrate disposed on a second surface of the circuit layer, in which a Ag underlayer having a glass layer and a Ag layer laminated on the glass layer is formed on the first surface of the circuit layer, and the Ag layer of the Ag underlayer and the semiconductor element are directly joined together.

A chip-stack structure including a first chip and a second chip located on the first chip is provided. The first chip includes a first substrate, a first interconnect structure, a first pad, and a first contact conductor. The first interconnect structure is located on a first surface of the first substrate. The first pad is located on the first interconnect structure. The first contact conductor is located in the first substrate and exposed on a second surface of the first substrate opposite to the first surface. The second chip includes a second substrate, a second interconnect structure, a second pad, and a second contact conductor. The second interconnect structure is located on the second substrate. The second pad is located on the second interconnect structure. The second contact conductor is located in the second substrate, wherein the first contact conductor is directly physically in contact with the second pad.

A 3D semiconductor device, the device including: a first crystalline silicon layer including a plurality of first transistors; a first metal layer interconnecting the first transistors, a portion of the first transistors forming a plurality of first logic gates; a first array of memory cells including second transistors; a second metal layer overlying the first and second transistors; a second crystalline silicon layer overlaying the second metal layer and the second crystalline silicon layer including a plurality of third transistors; a third metal layer interconnecting the third transistors, a portion of the third transistors forming a plurality of second logic gates; a second array of memory cells including fourth transistors and overlaying the second crystalline silicon layer; a fourth metal layer overlying the third and fourth transistors, where at least one of the fourth transistors is overlaying at least another one of the fourth transistors such that they are self-aligned, having been processed following the same lithography step, where the second array of memory cells include NAND flash type memory cells.

A 3D semiconductor device, the device including: a first crystalline silicon layer including a plurality of first transistors; a first metal layer interconnecting the first transistors, a portion of the first transistors forming a plurality of first logic gates; a first array of memory cells including second transistors; a second metal layer overlying the first and second transistors; a second crystalline silicon layer overlaying the second metal layer and the second crystalline silicon layer including a plurality of third transistors; a third metal layer interconnecting the third transistors, a portion of the third transistors forming a plurality of second logic gates; a second array of memory cells including fourth transistors and overlaying the second crystalline silicon layer; a fourth metal layer overlying the third and fourth transistors, where at least one of the fourth transistors is overlaying at least another one of the fourth transistors such that they are self-aligned, having been processed following the same lithography step, where the second array of memory cells include NAND flash type memory cells.

A 3D semiconductor device, the device including: a first single crystal layer including a plurality of first transistors; at least one first metal layer interconnecting the plurality of first transistors, where the interconnecting includes forming memory peripheral circuits; a plurality of second transistors underlying the first single crystal layer; a second metal layer overlaying the plurality of second transistors; a first memory cell underlying the memory peripheral circuits; a second memory cell underlying the first memory cell, and a non-volatile NAND memory, where the first memory cell includes at least one of the second transistors, where at least one of the second transistors includes a source, channel and drain, where the source, the channel and the drain have the same dopant type, here the non-volatile NAND memory includes the first memory cell, and where at least one of the second transistors includes a polysilicon channel.