A semiconductor structure includes an insulating encapsulant, a semiconductor element, a redistribution layer and an insulating layer. The semiconductor element is embedded in the insulating encapsulant. The redistribution layer is disposed over the insulating encapsulant and electrically connected to the semiconductor element. The insulating layer is disposed in between the insulating encapsulant and the redistribution layer, wherein an uneven interface exists between the insulating layer and the insulating encapsulant, and a planar interface exists between the insulating layer and the redistribution layer.

A semiconductor package and a method for manufacturing a semiconductor package are provided. The semiconductor package includes a first semiconductor device, a second semiconductor device, and an alignment material. The first semiconductor device has a first bonding layer, and the first bonding layer includes a first bond pad contacting an organic dielectric material. The second semiconductor device has a second bonding layer, and the second bonding layer includes a second bond pad contacting the organic dielectric material. The alignment material is between the first bonding layer and the second bonding layer.

A semiconductor device includes a first semiconductor die, a second semiconductor die, a dielectric layer, a first redistribution layer and a second redistribution layer. The first semiconductor die includes a first bonding pad and a second bonding pad. The second semiconductor die includes a third bonding pad and a fourth bonding pad. The dielectric layer covers the first semiconductor die and the second semiconductor die, and defines a first opening exposing the first bonding pad and the second bonding pad and a second opening exposing the third bonding pad and the fourth bonding pad. The first redistribution layer is disposed on the dielectric layer, and electrically connects the first bonding pad and the third bonding pad. The second redistribution layer is disposed on the dielectric layer, and electrically connects the second bonding pad and the fourth bonding pad.

A package structure includes a redistribution layer (RDL) structure, a die, and an encapsulant. The die is attached to the RDL structure through an adhesive layer. The encapsulant is disposed on the RDL structure and laterally encapsulates the die and the adhesive layer. The encapsulant includes a protruding part extending into the RDL structure and having a bottom surface in contact with the RDL structure.

Present disclosure provides a semiconductor package, including a first substrate having a first active surface and a first trench recessed from the first active surface, a second substrate having a second trench facing the first trench, and a pathway cavity defined by the first trench and the second trench. The first trench comprises a first metal protrusion and a first insulating protrusion. A method for manufacturing the semiconductor package described herein is also disclosed.

A wiring structure includes a semiconductor assembly, a conductive structure, an adhesion layer and at least one through via. The semiconductor assembly includes a reconstitution module and a redistribution structure. The reconstitution module includes a plurality of semiconductor elements and an encapsulant. The semiconductor elements are disposed side by side. The encapsulant bonds the semiconductor elements together. The redistribution structure is in direct contact with the reconstitution module. The conductive structure includes at least one dielectric layer and at least one circuit layer in contact with the dielectric layer. The adhesion layer bonds the semiconductor assembly and the conductive structure together. The through via electrically connects the conductive structure and the redistribution structure of the semiconductor assembly.

A semiconductor structure includes an insulating encapsulant, a semiconductor element, a redistribution layer and an insulating layer. The semiconductor element is embedded in the insulating encapsulant. The redistribution layer is disposed over the insulating encapsulant and electrically connected to the semiconductor element. The insulating layer is disposed in between the insulating encapsulant and the redistribution layer, wherein an uneven interface exists between the insulating layer and the insulating encapsulant, and a planar interface exists between the insulating layer and the redistribution layer.

Package structures and methods are provided for constructing multi-chip package structures using semiconductor wafer-level-fan-out techniques in conjunction with back-end-of-line fabrication methods to integrate different size chips (e.g., different thicknesses) into a planar package structure. The packaging techniques take into account intra-chip thickness variations and inter-chip thickness differences, and utilize standard back-end-of-line fabrication methods and materials to account for such thickness variations and differences. In addition, the back-end-of-line techniques allow for the formation of multiple layers of wiring and inter-layer vias which provide high density chip-to-chip interconnect wiring for high-bandwidth I/O communication between the package chips, as well as redistribution layers to route power/ground connections between active-side connections of the semiconductor chips to an area array of solder bump interconnects on a bottom side of the multi-chip package structure.

Package structures and methods are provided for constructing multi-chip package structures using semiconductor wafer-level-fan-out techniques in conjunction with back-end-of-line fabrication methods to integrate different size chips (e.g., different thicknesses) into a planar package structure. The packaging techniques take into account intra-chip thickness variations and inter-chip thickness differences, and utilize standard back-end-of-line fabrication methods and materials to account for such thickness variations and differences. In addition, the back-end-of-line techniques allow for the formation of multiple layers of wiring and inter-layer vias which provide high density chip-to-chip interconnect wiring for high-bandwidth I/O communication between the package chips, as well as redistribution layers to route power/ground connections between active-side connections of the semiconductor chips to an area array of solder bump interconnects on a bottom side of the multi-chip package structure.

A semiconductor device package includes a substrate and an electronic component disposed on the substrate. The electronic component has an active surface facing away from the substrate. The substrate has a first conductive pad and a second conductive pad disposed thereon. The electronic component has a first electrical contact and a second electrical contact disposed on the active surface. The semiconductor device package further includes a first metal layer connecting the first electrical contact with the first conductive pad, a second metal layer connecting the second electrical contact with the second conductive pad, a first seed layer disposed below the first metal layer; and a first isolation layer disposed between the first metal layer and the second metal layer. A method of manufacturing a semiconductor device package is also disclosed.