H01L2224/858

Integrated circuits having copper bonding structures with silicon carbon nitride passivation layers thereon and methods for fabricating same

Integrated circuits having copper bonding structures with silicon carbon nitride passivation layers and methods for making the same are provided. In an exemplary embodiment, an integrated circuit includes a substrate and a copper bonding structure having a contact surface. The copper bonding structure overlies the substrate. A passivation layer formed of silicon carbon nitride is disposed on the contact surface.

Method for fabricating multi-chip stack structure

A multi-chip stack structure and a method for fabricating the same are provided. The method for fabricating a multi-chip stack structure includes disposing a first chip group comprising a plurality of first chips on a chip carrier by using a step-like manner, disposing a second chip on the first chip on top of the first chip group, electrically connecting the first chip group and the second chip to the chip carrier through bonding wires, using film over wire (FOW) to stack a third chip on the first and the second chips with an insulative film provided therebetween, wherein the insulative film covers part of the ends of the bonding wires of the first chip on the top of the first group and at least part of the second chip, and electrically connecting the third chip to the chip carrier through bonding wires, thereby preventing directly disposing on a first chip a second chip having a planar size far smaller than that of the first chip as in the prior art that increases height of the entire structure and increases the wiring bonding difficultly.

INTEGRATED CIRCUITS HAVING COPPER BONDING STRUCTURES WITH SILICON CARBON NITRIDE PASSIVATION LAYERS THEREON AND METHODS FOR FABRICATING SAME
20170040272 · 2017-02-09 ·

Integrated circuits having copper bonding structures with silicon carbon nitride passivation layers and methods for making the same are provided. In an exemplary embodiment, an integrated circuit includes a substrate and a copper bonding structure having a contact surface. The copper bonding structure overlies the substrate. A passivation layer formed of silicon carbon nitride is disposed on the contact surface.

Semiconductor packaging method and semiconductor packaging structure

The invention provides a semiconductor packaging method, which comprises the following steps: providing a chip, providing a wire to be placed above a first connection pad of the chip, and performing a solder ball jetting step, wherein a first solder ball is jetted onto the chip and electrically connected with the first connection pad of the chip, wherein the first solder ball contacts the wire, but the wire does not directly contact a surface of the first connection pad of the chip.

Semiconductor component with damped bonding surfaces in a package with encapsulated pins

A housing part for accommodating a semiconductor element includes a pin partially molded in the housing part for electrical connection to a printed circuit board. The pin includes a bonding surface for producing an electrical connection between the pin and the semiconductor element. The housing part includes a bearing surface for the bonding surface and a recess formed in the bearing surface or adjoining the bearing surface. A vibration-damping material is at least partially filled in the recess and/or applied in a region adjoining the recess. The housing part is designed as a one-piece housing frame part.

Semiconductor package substrate with a smooth groove straddling topside and sidewall

A semiconductor package includes a metallic substrate, the metallic substrate including a roughened surface, a semiconductor die including bond pads, and an adhesive between the roughened surface of a topside of the metallic substrate and the semiconductor die, therein bonding the semiconductor die to the metallic substrate. The adhesive includes a resin. The metallic substrate further includes a groove about a perimeter of the semiconductor die on the roughened surface, the groove having a surface roughness less than a surface roughness of the roughened surface of the metallic substrate. The groove straddles the topside and a sidewall of the metallic substrate.