A semiconductor power arrangement includes a chip carrier having a first surface and a second surface opposite the first surface. The semiconductor power arrangement further includes a plurality of power semiconductor chips attached to the chip carrier, wherein the power semiconductor chips are inclined to the first and/or second surface of the chip carrier.

The invention relates to a method for electrically contacting a component (10) (for example a power component and/or a (semiconductor) component having at least one transistor, preferably an IGBT (insulated-gate bipolar transistor)) having at least one contact (40, 50), at least one open-pored contact piece (60, 70) is galvanically (electrochemically or free of external current) connected to at least one contact (40, 50). In this way, a component module is achieved. The contact (40, 50) is preferably a flat part or has a contact surface, the largest planar extent thereof being greater than an extension of the contact (40, 50) perpendicular to said contact surface. The temperature of the galvanic connection is at most 100 C., preferably at most 60 C., advantageously at most 20 C. and ideally at most 5 C. and/or deviates from the operating temperature of the component by at most 50 C., preferably by at most 20 C., in particular by at most 10 C. and ideally by at most 5 C., preferably by at most 2 C. The component (10) can be contacted by means of the contact piece (60, 70) with a further component, a current conductor and/or a substrate (90). Preferably, a component (10) having two contacts (40, 50) on opposite sides of the component (10) is used, wherein at least one open-pored contact piece (60, 70) is galvanically connected to each contact (40, 50).

Microelectronic assemblies and methods for making the same are disclosed herein. In one embodiment, a method of forming a microelectronic assembly comprises assembling first and second components to have first major surfaces of the first and second components facing one another and spaced apart from one another by a predetermined spacing, the first component having first and second oppositely-facing major surfaces, a first thickness extending in a first direction between the first and second major surfaces, and a plurality of first metal connection elements at the first major surface, the second component having a plurality of second metal connection elements at the first major surface of the second component; and plating a plurality of metal connector regions each connecting and extending continuously between a respective first connection element and a corresponding second connection element opposite the respective first connection element in the first direction.

Microelectronic assemblies and methods for making the same are disclosed herein. In one embodiment, a method of forming a microelectronic assembly comprises assembling first and second components to have first major surfaces of the first and second components facing one another and spaced apart from one another by a predetermined spacing, the first component having first and second oppositely-facing major surfaces, a first thickness extending in a first direction between the first and second major surfaces, and a plurality of first metal connection elements at the first major surface, the second component having a plurality of second metal connection elements at the first major surface of the second component; and plating a plurality of metal connector regions each connecting and extending continuously between a respective first connection element and a corresponding second connection element opposite the respective first connection element in the first direction.

Technologies are generally described related to three-dimensional integration of integrated circuits (ICs) with spacing for heat dissipation. According to some examples, a self-aligned silicide may be formed in a temporary silicon layer and removed subsequent to bonding of the wafers to achieve improved contact between the combined ICs and enhanced heat dissipation through added spacing between the ICs.

A semiconductor device, including a lower semiconductor die, one or more upper semiconductor dies disposed over the lower semiconductor die, a non-conductive fillet material disposed between adjacent semiconductor dies of the lower semiconductor die and the one or more upper semiconductor dies, the non-conductive fillet material having edge regions that squeeze out from space between adjacent semiconductor dies, a dielectric layer disposed on a backside of the lower semiconductor die and under the one or more upper semiconductor dies, a buffer layer disposed above the dielectric layer and in contact to at least one edge region of the non-conductive fillet material, and an encapsulant material disposed on sidewalls and top surface of the semiconductor device, the encapsulant material encapsulating the lower semiconductor die and the one or more upper semiconductor dies.

An electrode connection structure includes: a first electrode of an electrical circuit; and a second electrode of the electrical circuit that is electrically connected to the first electrode. The first and second electrodes are oppositely disposed in direct or indirect contact with each other. A plated lamination is substantially uniformly formed by plating process from a surface of a contact region and opposed surfaces of the first and second electrodes. A void near the surface of the contact region is filled by formation of the plated lamination. Portions of the plated lamination formed from the opposed surfaces of the first and second electrodes in a region other than the contact region are not joined together.

Technologies are generally described related to three-dimensional integration of integrated circuits (ICs) with spacing for heat dissipation. According to some examples, a self-aligned silicide may be formed in a temporary silicon layer and removed subsequent to bonding of the wafers to achieve improved contact between the combined ICs and enhanced heat dissipation through added spacing between the ICs.

A semiconductor device is a semiconductor substrate including a through electrode passing through in a thickness direction, and includes the plurality of semiconductor substrates disposed in the thickness direction and a curing resin layer disposed between the semiconductor substrates adjacent to each other in the thickness direction. The curing resin layer includes a curing resin and a columnar solder portion embedded in the curing resin. The columnar solder portion passes through the curing resin so as to electrically connect the through electrodes of the semiconductor substrates adjacent to each other in the thickness direction.

A connecting structure includes a first substrate having a plurality of first electrodes arranged in a plane direction; a second substrate having a plurality of second electrodes arranged in the plane direction and disposed at a spaced interval with respect to the first substrate in a thickness direction perpendicular to the plane direction so that the first electrode faces the second electrode; and an adhesive layer interposed between the first substrate and the second substrate, electrically connecting the first electrode and the second electrode facing each other in the thickness direction, and adhering the first substrate to the second substrate. A thickness of the adhesive layer is below 15 m. A distance A between the first electrodes adjacent to each other In the plane direction is longer than a distance B between the first electrode and the second electrode facing each other in the thickness direction.