Patent classifications
H01S3/034
LASER DEVICE
A laser device may include: a master oscillator including a first laser chamber, a first pair of discharge electrodes provided in the first laser chamber, and an optical resonator, the master oscillator being configured to output a laser beam; a first amplifier including a second laser chamber provided in an optical path of the laser beam outputted from the master oscillator and a second pair of discharge electrodes provided in the second laser chamber at a first gap distance, the first amplifier being configured to amplify the laser beam; and a first beam-adjusting optical system provided in an optical path of the laser beam between the master oscillator and the first amplifier, the first beam-adjusting optical system being configured to adjust the laser beam outputted from the master oscillator such that a beam width of the laser beam entering the first amplifier measured in a direction of electric discharge between the second pair of discharge electrodes is substantially equal to the first gap distance between the second pair of discharge electrodes.
LASER DEVICE
A laser device may include: a master oscillator including a first laser chamber, a first pair of discharge electrodes provided in the first laser chamber, and an optical resonator, the master oscillator being configured to output a laser beam; a first amplifier including a second laser chamber provided in an optical path of the laser beam outputted from the master oscillator and a second pair of discharge electrodes provided in the second laser chamber at a first gap distance, the first amplifier being configured to amplify the laser beam; and a first beam-adjusting optical system provided in an optical path of the laser beam between the master oscillator and the first amplifier, the first beam-adjusting optical system being configured to adjust the laser beam outputted from the master oscillator such that a beam width of the laser beam entering the first amplifier measured in a direction of electric discharge between the second pair of discharge electrodes is substantially equal to the first gap distance between the second pair of discharge electrodes.
Laser apparatus and method for manufacturing optical element
A laser apparatus including an optical element made of a CaF.sub.2 crystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element, the electric field axis of the P-polarized component of the laser beam propagating through the optical element coinciding with one axis contained in <111> of the CaF.sub.2 crystal, with the P-polarized component defined with respect to the one surface. A method for manufacturing an optical element, the method including causing a seed CaF.sub.2 crystal to undergo crystal growth along one axis contained in <111> to form an ingot, setting a cutting axis to be an axis inclining by an angle within 14.18±5° with respect to the crystal growth direction toward the direction of another axis contained in <111>, which differs from the crystal growth direction, and cutting the ingot along a plane perpendicular to the cutting axis.
Laser apparatus and method for manufacturing optical element
A laser apparatus including an optical element made of a CaF.sub.2 crystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element, the electric field axis of the P-polarized component of the laser beam propagating through the optical element coinciding with one axis contained in <111> of the CaF.sub.2 crystal, with the P-polarized component defined with respect to the one surface. A method for manufacturing an optical element, the method including causing a seed CaF.sub.2 crystal to undergo crystal growth along one axis contained in <111> to form an ingot, setting a cutting axis to be an axis inclining by an angle within 14.18±5° with respect to the crystal growth direction toward the direction of another axis contained in <111>, which differs from the crystal growth direction, and cutting the ingot along a plane perpendicular to the cutting axis.
LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.
LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
A laser apparatus may include a master oscillator, a plurality of amplifiers, a photodetector device configured to detect a light beam traveling back along a laser beam path, and a controller. The photodetector device may include a first photodetector configured to detect energy of a light beam traveling back along the laser beam path and a second photodetector configured to detect power of the light beam traveling back along the laser beam path. The controller may be configured to determine that a return beam is generated when the intensity of the energy detection signal exceeds a first threshold. The controller may be configured to determine that a self-oscillation beam is generated when the intensity of the power detection signal exceeds a second threshold.
LASER SYSTEM AND ELECTRONIC DEVICE MANUFACTURING METHOD
A laser system includes a beam shaping unit, a random phase plate, and a collimating optical system in an optical path between a solid-state laser device and an excimer amplifier. When a traveling direction of a laser beam entering the excimer amplifier is a Z direction, a discharge direction of a pair of discharge electrodes is a V direction, a direction orthogonal to the V and Z directions is an H direction, a shaping direction of the beam shaping unit corresponding to the V direction is a first direction, a shaping direction of the beam shaping unit corresponding to the H direction is a second direction, an expansion rate in the first direction is E1, and an expansion rate in the second direction is E2, the beam shaping unit expands a beam section of the laser beam such that an expansion ratio defined by E2/E1 is higher than 1.
WINDOW FOR SURGICAL LASER
A laminated laser window having an inner layer transparent to light having wavelengths between 3.5 micrometers and 12 micrometers and having as an outer surface a nanometric-thick outer layer of SiO2. The window allows the passage of light within this wavelength range, for example from a CO2 laser. In The SiO2 outer layer maintains biocompatibility when used in laser devices for insertion into externally accessible bodily cavities.
Laser device and extreme ultraviolet light generation system
An example laser apparatus of the disclosure may include an oscillator capable of outputting a laser beam, a slab optical amplifier capable of amplifying the laser beam outputted by the oscillator by passing the laser beam through an optical amplification region shaped like a slab and outputting the amplified laser beam, and a mirror disposed on an optical path of the laser beam to enter the slab optical amplifier or the amplified laser beam outputted from the slab optical amplifier, the mirror being movable in a direction parallel to a plane where the laser beam travels in the slab optical amplifier.
Laser device and extreme ultraviolet light generation system
An example laser apparatus of the disclosure may include an oscillator capable of outputting a laser beam, a slab optical amplifier capable of amplifying the laser beam outputted by the oscillator by passing the laser beam through an optical amplification region shaped like a slab and outputting the amplified laser beam, and a mirror disposed on an optical path of the laser beam to enter the slab optical amplifier or the amplified laser beam outputted from the slab optical amplifier, the mirror being movable in a direction parallel to a plane where the laser beam travels in the slab optical amplifier.