There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.

A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser is disclosed. The laser is fired at low power, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased to a burst pattern that approximates the expected operation of the laser, and the amplifier chamber gas bled again if necessary until the voltage and an output energy meet or exceed minimum values, or until the pressure is less than a minimum value. The gas in the master oscillator chamber is then bled if necessary until the output energy of the master oscillator meets or falls below a maximum value, again without dropping the pressure in the chamber below the minimum value. While the pressure is adjusted, bandwidth is also measured and adjusted to stay within a desired range. Once the target values are provided, the process runs quickly without manual interaction.

A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser is disclosed. The laser is fired at low power, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased to a burst pattern that approximates the expected operation of the laser, and the amplifier chamber gas bled again if necessary until the voltage and an output energy meet or exceed minimum values, or until the pressure is less than a minimum value. The gas in the master oscillator chamber is then bled if necessary until the output energy of the master oscillator meets or falls below a maximum value, again without dropping the pressure in the chamber below the minimum value. While the pressure is adjusted, bandwidth is also measured and adjusted to stay within a desired range. Once the target values are provided, the process runs quickly without manual interaction.

A laser chamber including a first space and a second space in communication with the first space may include: a first discharge electrode disposed in the first space; a second discharge electrode disposed in the first space to face the first discharge electrode; a fan disposed in the first space and configured to flow laser gas between the first discharge electrode and the second discharge electrode; a peaking condenser disposed in the second space; and an electrical insulating member configured to partition the first space and the second space from one another, and disposed to allow the laser gas to pass through between the first space and the second space.

A laser chamber including a first space and a second space in communication with the first space may include: a first discharge electrode disposed in the first space; a second discharge electrode disposed in the first space to face the first discharge electrode; a fan disposed in the first space and configured to flow laser gas between the first discharge electrode and the second discharge electrode; a peaking condenser disposed in the second space; and an electrical insulating member configured to partition the first space and the second space from one another, and disposed to allow the laser gas to pass through between the first space and the second space.

Disclosed are methods and apparatus for generating a sub-200 nm continuous wave (cw) laser. A laser apparatus includes a chamber for receiving at least a rare gas or rare gas mixtures and a pump laser source for generating at least one cw pump laser focused in the chamber for generating at least one laser-sustained plasma in the chamber. The laser apparatus further includes a system for forming an optical cavity in which the at least one laser-sustained plasma serves as an excitation source for producing at least one cw laser having a wavelength that is below about 200 nm. In one aspect, the at least one laser-sustained plasma has a shape that substantially matches a shape of the optical cavity.

A laser oscillation device can prevent a laser medium-circulating pipe from expanding. The laser oscillation device includes a resonator part, which has an introduction port, through which a laser medium is introduced, and a discharge port, from which the laser medium is discharged, and which generates a laser beam, a laser medium-circulating pipe having one end connected to the introduction port, and the other end connected to the discharge port, a blower arranged in the laser medium-circulating pipe, to circulate the laser medium so that the laser medium is introduced from the introduction port to the resonator part, and the laser medium introduced to the resonator part is discharged from the discharge port, and a heat-insulating mechanism which is provided in the laser medium-circulating pipe, to block heat conduction between the laser medium flowing through the laser medium-circulating pipe and the laser medium-circulating pipe.

A laser oscillation device can prevent a laser medium-circulating pipe from expanding. The laser oscillation device includes a resonator part, which has an introduction port, through which a laser medium is introduced, and a discharge port, from which the laser medium is discharged, and which generates a laser beam, a laser medium-circulating pipe having one end connected to the introduction port, and the other end connected to the discharge port, a blower arranged in the laser medium-circulating pipe, to circulate the laser medium so that the laser medium is introduced from the introduction port to the resonator part, and the laser medium introduced to the resonator part is discharged from the discharge port, and a heat-insulating mechanism which is provided in the laser medium-circulating pipe, to block heat conduction between the laser medium flowing through the laser medium-circulating pipe and the laser medium-circulating pipe.

A gas laser, including: a semiconductor laser, an optical beam-shaping system, a pair of electrodes, a discharge tube, a rear mirror, and an output mirror. The pair of electrodes includes two electrodes. The electrodes are symmetrically disposed at an outer layer of the discharge tube in parallel. The electrodes are connected to a radio-frequency power supply via a matching network, and the electrodes operate to modify working gas in the discharge tube through radio-frequency discharge. The rear mirror and the output mirror are disposed at two end surfaces of the discharge tube, respectively. The rear mirror, taken together with the output mirror and the discharge tube, form a resonant cavity. The output mirror is configured to output a laser beam.