An edge emitting structure includes an active region configured to generate radiation in response to excitation by a pumping beam incident on the structure. A front facet of the edge emitting structure is configured to emit the radiation generated by the active region. A metallic reflective coating disposed on at least one of the front and rear facets of the edge emitting structure. The metallic reflective coating is configured to reflect the radiation generated by the active region.

A system for generating an energy beam based laser includes an apparatus for receiving an energy beam and for generating an energy beam based laser. The apparatus is configurable or controllable for tuning an output wavelength of the laser generated by the apparatus using the energy beam. The apparatus includes a first component for producing a first magnetic field oriented in a first direction and a second component for producing a second magnetic field oriented in a second direction substantially opposite to the first direction. A channel through the apparatus is defined by the first component and the second component through which the energy beam passes to generate the laser at an output of the apparatus. The apparatus is configurable or controllable for modifying at least one of the first magnetic field and the second magnetic field for tuning the output wavelength of the laser.

An edge emitting structure includes an active region configured to generate radiation in response to excitation by a pumping beam incident on the structure. A front facet of the edge emitting structure is configured to emit the radiation generated by the active region. A metallic reflective coating disposed on at least one of the front and rear facets of the edge emitting structure. The metallic reflective coating is configured to reflect the radiation generated by the active region.

A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.

A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.

Embodiments regard a scanning UV (ultra violet) light source utilizing semiconductor heterostructures. An embodiment of an apparatus includes a substrate with a film of light producing material on a first surface of the substrate, wherein the film includes one or more semiconductor heterostructures; and an electron beam apparatus, the electron beam apparatus to generate an electron beam and direct the electron beam to a location on the film of light producing material to generate a light beam.

Embodiments regard a scanning UV (ultra violet) light source utilizing semiconductor heterostructures. An embodiment of an apparatus includes a substrate with a film of light producing material on a first surface of the substrate, wherein the film includes one or more semiconductor heterostructures; and an electron beam apparatus, the electron beam apparatus to generate an electron beam and direct the electron beam to a location on the film of light producing material to generate a light beam.

A terahertz radiator is based on coherent Smith-Purcell radiation amplified by stimulation. The terahertz radiator includes an electron emission source configured to emit electron beams and a pumping source configured to emit pumping signals. The pumping signal interacts with a primary grating structure to obtain preliminarily bunched electrons. The preliminarily bunched electrons interact with the primary grating structure to generate coherent Smith-Purcell radiation. The coherent Smith-Purcell radiation and the pumping signals vertically resonate in a primary resonant cavity structure, so that the electron bunching density is increased, and in turn, the coherent Smith-Purcell radiation is enhanced. A positive feedback process is formed by free electrons and the coherent Smith-Purcell radiation, and the coherent Smith-Purcell radiation amplified by stimulation and periodic bunched electron bunches are obtained. The terahertz radiator can be used to realize a stimulated amplification phenomenon under the conditions of small current and large beam spots.

A terahertz radiator is based on coherent Smith-Purcell radiation amplified by stimulation. The terahertz radiator includes an electron emission source configured to emit electron beams and a pumping source configured to emit pumping signals. The pumping signal interacts with a primary grating structure to obtain preliminarily bunched electrons. The preliminarily bunched electrons interact with the primary grating structure to generate coherent Smith-Purcell radiation. The coherent Smith-Purcell radiation and the pumping signals vertically resonate in a primary resonant cavity structure, so that the electron bunching density is increased, and in turn, the coherent Smith-Purcell radiation is enhanced. A positive feedback process is formed by free electrons and the coherent Smith-Purcell radiation, and the coherent Smith-Purcell radiation amplified by stimulation and periodic bunched electron bunches are obtained. The terahertz radiator can be used to realize a stimulated amplification phenomenon under the conditions of small current and large beam spots.

Employing undulator devices as x-ray radiation sources requires expensive and bulky support systems for operation, which are not robust and lead to limited ranges of generated radiation energies. A force-compensated undulator device is described. The device includes an undulator having first and second magnet arrays disposed along a central axis. The first magnet array is translatable along the central axis. The device further includes a compensator unit disposed adjacent to the first magnet array with the compensator unit having a first row of magnets disposed along a compensator axis with the compensator axis being parallel to the central axis, and a second row of magnets disposed along the compensator axis. The first row of magnets is translatable along the compensator axis. The compensator provides magnetic forces that neutralize the system dynamic magnetic forces generated by the undulator.