Patent classifications
H01S3/09705
Gas optimization in a gas discharge light source
In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
PULSED POWER SYSTEMS WITH CONTROLLED REACTOR RESET
A pulsed power circuit including one or more magnetic switches respectively implemented as one or more inductors having saturable cores wherein, after a discharge pulse, each saturable core is repeatably reset to an initial bias point on its magnetization curve by a reset pulse having variable characteristics determined, for example, by chamber operating conditions so that the saturable core is able to function reliably and consistently.
EXCIMER LASER OSCILLATION DEVICE HAVING GAS RECYCLE FUNCTION
It is an object to provide a removal function of removing impurities from exhaust gas including rare gas (for example, argon, xenon, krypton and the like) that is used in an excimer laser oscillation device, in a system of the excimer laser oscillation device.
The excimer laser oscillation device including a gas recycle function includes an oscillation chamber in which laser gas having halogen gas, rare gas and buffer gas is filled inside, a first impurity removing device that removes impurities in exhaust gas that is discharged from the oscillation chamber, inside the system of the excimer laser oscillation device.
LASER CHAMBER
A laser chamber may include a first discharge electrode, a second discharge electrode, a fan making a laser gas flow through a discharge space between the first and second discharge electrodes, a first insulating member disposed on upstream side and downstream side of the first discharge electrode in the laser gas flow, a first metal damper member disposed on upstream side of the second discharge electrode and a second insulating member disposed on downstream side of the second discharge electrode in the laser gas flow, and a second metal damper member disposed on downstream side of the second insulating member in the laser gas flow. In a boundary portion between the second metal damper member and the second insulating member, a first discharge space side surface of the second metal damper member may be located further toward the opposite side to the discharge space than a second discharge space side surface of the second insulating member. A first corner formed by the first surface and a first side surface of the second metal damper member, the first side surface being on the side of the second insulating member, may be in contact with a second side surface of the second insulating member, the second side surface being on the side of the second metal damper member.
GAS OPTIMIZATION IN A GAS DISCHARGE LIGHT SOURCE
In a method, energy is supplied to a first gas discharge chamber of a first stage until a pulsed amplified light beam is output from the first stage and directed toward a second stage. While the energy is supplied to the first gas discharge chamber: a value of an operating parameter of the first gas discharge chamber is measured; it is determined whether to adjust an operating characteristic of the first gas discharge chamber based on the measured value; and, the operating characteristic of the first gas discharge chamber is adjusted if it is determined that the operating characteristic of the first gas discharge chamber should be adjusted. After it is determined that the operating characteristic of the first gas discharge chamber no longer should be adjusted, then an adjustment procedure is applied to an operating characteristic of a second gas discharge chamber of the second stage.
Floating current mirror for RLG discharge control
A ring laser gyroscope (RLG) assembly comprises an RLG block comprising: a first anode; a second anode; a cathode; and a cavity. The RLG assembly further comprises a current supply circuit coupled to the RLG block. The current supply circuit comprises a high voltage power supply to provide a high voltage signal; a first current path coupled between the high voltage power supply and the first anode to provide a first current to the first anode; and a second current path coupled between the high voltage power supply and the second anode to provide a second current to the second anode. The second current path is configured to mirror the first current such that the second current approximately matches the first current. Each component in the second current path is configured to operate based on power derived only from the high voltage signal.
Gas laser apparatus for determining composition ratio of laser gas
A gas laser apparatus includes an actual laser output acquiring unit that acquires a first actual laser output at a predetermined laser output command after passage of a predetermined time from issuing of a first laser gas pressure command and acquires a second actual laser output at the predetermined laser output command after passage of the predetermined time from issuing of a second laser gas pressure command smaller than the first laser gas pressure command and a determining unit that determines whether the composition ratio of a laser gas in a gas container is normal or not by comparing the first actual laser output with a first reference output and comparing the second actual laser output with a second reference output smaller than the first reference output.
Laser apparatus and method of controlling laser apparatus
A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.
Compensation for a disturbance in an optical source
A pulsed light beam emitted from an optical source is received, the pulsed light beam being associated with a temporal repetition rate; a frequency of a disturbance in the optical source is determined, the frequency being an aliased frequency that varies with the temporal repetition rate of the pulsed light beam; a correction waveform is generated based on the aliased frequency; and the disturbance in the optical source is compensated by modifying a characteristic of the pulsed light beam based on the generated correction waveform.
Gas optimization in a gas discharge light source
One or more operating characteristics of a light source are adjusted by estimating a plurality of extreme values of operating parameters of the light source while operating the light source under a set of extreme test conditions. For each extreme test condition, a group of pulses of energy is supplied to a first gas discharge chamber of the light source while operating the first gas discharge chamber under the extreme test condition to produce a first pulsed amplified light beam; a group of pulses of energy is supplied to a second gas discharge chamber of the light source while operating the second gas discharge chamber under the extreme test condition to produce a second pulsed amplified light beam. An extreme value of an operating parameter for the extreme test condition is measured to thereby estimate the extreme value of the operating parameter.