A system and method for tuning and infrared source laser in the Mid-IR wavelength range. The system and method comprising, at least, a plurality of individually tunable emitters, each emitter emitting a beam having a unique wavelength, a grating, a mirror positioned after the grating to receive at least one refracted order of light of at least one beam and to redirect the beam back towards the grating, and a micro-electro-mechanical systems device containing a plurality of adjustable micro-mirrors.

Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.

A discrete wavelength tunable laser having an optical cavity which comprises: a reflective semiconductor optical amplifier (SOA); a demultiplexer (Demux) having a single input and a plurality of outputs, the Demux configured to receive the output of the SOA and to produce a plurality of fixed spectral passbands within the gain bandwidth of the SOA; one or more tunable distributed Bragg reflector(s) (DBR(s)) arranged to receive the outputs of the Demux, each tunable DBR configured to select a reflective spectral band within the gain bandwidth of the SOA upon application of a bias current; wherein the SOA forms the back end mirror of the optical cavity; the one or more tunable DBRs form the front end mirror of the optical cavity; and wherein the lasing channel of the discrete wavelength tunable laser is chosen by the overlap of the selected reflective spectral band of one of the one or more tunable DBRs with a fixed spectral passband of the Demux.

An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.

Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.

A laser device may include a chamber accommodating a pair of discharge electrodes, a grating provided outside the chamber, first beam-expanding optics provided between the chamber and the grating and configured to expand a beam width of light outputted from the chamber at least in a first direction perpendicular to a direction of discharge between the pair of discharge electrodes, and second beam-expanding optics having a plurality of prisms provided between the chamber and the grating, the second beam-expanding optics being configured to expand a beam width of light outputted from the chamber at least in a second direction parallel to the direction of discharge between the pair of discharge electrodes.

A laser device may include a chamber accommodating a pair of discharge electrodes, a grating provided outside the chamber, first beam-expanding optics provided between the chamber and the grating and configured to expand a beam width of light outputted from the chamber at least in a first direction perpendicular to a direction of discharge between the pair of discharge electrodes, and second beam-expanding optics having a plurality of prisms provided between the chamber and the grating, the second beam-expanding optics being configured to expand a beam width of light outputted from the chamber at least in a second direction parallel to the direction of discharge between the pair of discharge electrodes.

A laser processing system includes a wavelength tunable laser apparatus capable of changing the wavelength of pulsed laser light to be outputted, an optical system irradiating a workpiece with the pulsed laser light, a reference wavelength acquisition section acquiring a reference wavelength corresponding to photon absorption according to the material of the workpiece, a laser processing controller controlling the wavelength tunable laser apparatus to perform preprocessing before final processing performed on the workpiece, changes the wavelength of the pulsed laser light over a predetermined range containing the reference wavelength, and performs wavelength search preprocessing at a plurality of wavelengths, a processed state measurer measuring a processed state on a wavelength basis achieved by the wavelength search preprocessing performed at the plurality of wavelengths, and an optimum wavelength determination section assessing the processed state on a wavelength basis to determine an optimum wavelength used in the final processing.

An external optical feedback element (108) for tuning an output beam of a gas laser (102) having multiple wavelengths includes a partially reflective optical element (108) positioned on a beam path of the output beam (106) outside of an internal optical cavity of the gas laser (102), and a stage (114) to support the optical element and adjust rotation, horizontal tilt angle, and vertical tilt angle of the optical element with respect to the beam path. The output beam (106) is partially reflected at the optical element (108) and fed back into the internal optical cavity of the gas laser (102), with the intensity varying for multiple wavelengths and adjusted by changing rotation, horizontal tilt angle and vertical tilt angle of the optical element. Thereby, a variable feedback of the output beam into the internal optical cavity of the gas laser is provided, which leads to a selective output wavelength of the gas laser, either at a single line or at multiple lines simultaneously. This setup may allow to control the wavelength of a commercial CO2 gas laser without a modification of the laser itself by adding a coupled cavity with a wavelength selective element like a grating to the given gas laser resonator.

A system and method for tuning and infrared source laser in the Mid-IR wavelength range. The system and method comprising, at least, a plurality of individually tunable emitters, each emitter emitting a beam having a unique wavelength, a grating, a mirror positioned after the grating to receive at least one refracted order of light of at least one beam and to redirect the beam back towards the grating, and a micro-electro-mechanical systems device containing a plurality of adjustable micro-mirrors.