The present invention discloses a high-peak-power single-frequency narrow-linewidth nanosecond fiber laser based on a triangular pulse, wherein the laser includes: pulsed laser generated by the laser seed injecting into a first power pre-amplifier through a first isolator, and then injecting into a second pre-amplifier and then injecting into a power amplifier; wherein triangle-shaped pulsed laser with fast rising edge is obtained by using electro-optic and acousto-optic modulator to modulate continuous wave single-frequency laser or a single-frequency semiconductor laser directly modulated by radio frequency signal; single-frequency triangle-shaped pulsed laser is employed as the laser source according to the characteristics of narrow intrinsic linewidth and suppression of linewidth broadening caused by SPM, and the power of pulsed laser is amplified through the MOPA system.

The present invention discloses a high-peak-power single-frequency narrow-linewidth nanosecond fiber laser based on a triangular pulse, wherein the laser includes: pulsed laser generated by the laser seed injecting into a first power pre-amplifier through a first isolator, and then injecting into a second pre-amplifier and then injecting into a power amplifier; wherein triangle-shaped pulsed laser with fast rising edge is obtained by using electro-optic and acousto-optic modulator to modulate continuous wave single-frequency laser or a single-frequency semiconductor laser directly modulated by radio frequency signal; single-frequency triangle-shaped pulsed laser is employed as the laser source according to the characteristics of narrow intrinsic linewidth and suppression of linewidth broadening caused by SPM, and the power of pulsed laser is amplified through the MOPA system.

Apparatuses and methods are disclosed for applying laser energy having desired pulse characteristics, including a sufficiently short duration and/or a sufficiently high energy for the photomechanical treatment of skin pigmentations and pigmented lesions, both naturally-occurring (e.g., birthmarks), as well as artificial (e.g., tattoos). The laser energy may be generated with an apparatus having a resonator with the capability of switching between a modelocked pulse operating mode and an amplification operating mode. The operating modes are carried out through the application of a time-dependent bias voltage, having waveforms as described herein, to an electro-optical device positioned along the optical axis of the resonator.

A dual-ring-modulated laser includes a gain medium having a reflective end coupled to an associated gain-medium reflector and an output end, which is coupled to a reflector circuit through an input waveguide to form a lasing cavity. The reflector circuit comprises: a first ring modulator; a second ring modulator; and a shared waveguide that optically couples the first and second ring modulators together. The first and second ring modulators have resonance peaks that are tuned to be offset in alignment from each other to provide an effective reflectance having a flat-top response, which is aligned with an associated lasing cavity mode. The first and second ring modulators are driven in tandem based on the same electrical input signal, whereby the resonance peaks of the first and second ring modulators shift wavelengths in the same direction during modulation, and an effective reflectance stays within the flat-top wavelength range.

A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.

A solid-state laser system may include first and second solid-state laser units, a wavelength conversion system, an optical shutter, and a controller. The first solid-state laser unit and the second solid-state laser unit may output first pulsed laser light with a first wavelength and second pulsed laser light with a second wavelength, respectively. The controller may perform first control and second control. The first control may cause the first and second pulsed laser light to enter the wavelength conversion system at a substantially coincidental timing, thereby causing the wavelength conversion system to output third pulsed laser light with a third wavelength converted from the first wavelength and the second wavelength, and the second control may prevent the first and second pulsed laser light from entering the wavelength conversion system at the coincidental timing, thereby preventing the wavelength conversion system from outputting the third pulsed laser light.

A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.

A method and apparatus for control of a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source that combines pulse control mode and pulse modulation. The EUV energy created by each pulse is measured and total EUV energy created by the fired pulses determined, a desired energy for the next pulse is determined based upon whether the total EUV energy is greater or less than a desired average EUV energy times the number of pulses. If the desired pulse energy for the next droplet is within the range of one or more pulse modulation actuators, the pulse is modulated; otherwise, the pulse is fired to miss the droplet. This provides greater control of the accumulated dose as well as uniformity of the EUV energy over time, greater ability to compensate for pulses that generate EUV energy that is higher or lower than nominal expected values, and ability to provide an average EUV energy per pulse that is less than the nominal minimum EUV energy per pulse of the system.

The present invention relates to a system for modulating laser pulses by means of an electro-optical modulator which is operated by means of a pulsed modulation voltage. A voltage converter mounted upstream of the modulator converts a pulsed modulated switching voltage at an output voltage level to the modulation voltage that is higher than the output voltage level. The invention further relates to a method for modulating laser pulses.

The present invention relates to a system for modulating laser pulses by means of an electro-optical modulator which is operated by means of a pulsed modulation voltage. A voltage converter mounted upstream of the modulator converts a pulsed modulated switching voltage at an output voltage level to the modulation voltage that is higher than the output voltage level. The invention further relates to a method for modulating laser pulses.