A radio frequency multiplexer comprises send and receive circuits each including a RF filter circuit. The send and receive circuits are coupled to an antenna port and corresponding send and receive ports. A portion of the send circuit and a portion of the receive circuit are disposed on a single die. The layer stacks of the resonators of the send and receive circuits disposed on the single die can be optimized for the required functionality.

An acoustic wave device comprises a substrate including a piezoelectric material, interdigital transducer (IDT) electrodes disposed on an upper surface of the substrate. The IDT electrodes having gap regions, edge regions, and center regions. A duty factor of the IDT electrodes in the edge regions is greater than the duty factor of the IDT electrodes in the center regions. A first dielectric film is disposed above the IDT electrodes and an upper surface of the substrate. The first dielectric film has a greater thickness in portions of the center regions than in portions proximate the gap regions.

An improved SAW (SAWR) resonator having an improved power durability and heat resistance and a protection to prevent device failure is provided. The SAW resonator has a carrier substrate (S) and an electrode structure (ES, EF) on a piezoelectric material (PM, PL). Further, the resonator has a shunt path (PCPP) parallel to the electrode structure and provided to enable an RF signal to bypass the electrode structure. The shunt path has a temperature dependent conductance with negative temperature coefficient of resistance.

An acoustic wave device includes N band pass filters with first ends connected to define a common connection and having different pass bands. At least one of the band pass filters includes acoustic wave resonators including a lithium tantalate film having Euler angles (.sub.LT=05, .sub.LT, .sub.LT=015), a silicon support substrate, a silicon oxide film between the lithium tantalate film and the silicon support substrate, an IDT electrode, and a protective film. In at least one acoustic wave resonator, a frequency f.sub.h1_t.sup.(n) satisfies Formula (3) or Formula (4) for all m where m>n:
f.sub.h1_t.sup.(n)>f.sub.u.sup.(m)Formula (3); and
f.sub.h1_t.sup.(n)<f.sub.l.sup.(m)Formula (4).
In Formulas (3) and (4), f.sub.u.sup.(m) and f.sub.l.sup.(m) represent the frequencies of the high-frequency end and the low-frequency end of the pass band in the m band pass filters.

An acoustic wave device includes a substrate, a multilayer film on the substrate, an LT layer configured by a single crystal of LiTaO.sub.3 on the multilayer film, and an IDT electrode on the LT layer. The thickness of the LT layer is 0.3 or less where is two times a pitch p of electrode fingers in the IDT electrode. Euler angles of the LT layer are (020, 5 to 65, 010), (12020, 5 to 65, 010), or (12020, 5 to 65, 010). The multilayer film is configured by alternately stacking at least one first layer and at least one second layer. The first layer is comprised of SiO.sub.2. The second layer is comprised of any one of Ta.sub.2O.sub.5, HfO.sub.2, ZrO.sub.2, TiO.sub.2, and MgO.

A surface acoustic wave device includes a piezoelectric substrate and functional elements on a first surface of the piezoelectric substrate. At least a portion of the functional elements includes an interdigital transducer (IDT) electrode, and a surface acoustic wave resonator is defined by the piezoelectric substrate and the IDT electrode. A portion of a wiring pattern connecting a first functional element and a second functional element is on a second surface different from the first surface of the piezoelectric substrate.

An acoustic wave filter includes a first resonance circuit including a first series arm resonator and a first capacitive element. The first series arm resonator is provided on a path connecting a first terminal and a second terminal. The first capacitive element is coupled in parallel with the first series arm resonator. The first series arm resonator includes a first divided resonator and a second divided resonator coupled in series with each other. The first resonance circuit includes a second resonance circuit including the first divided resonator and a second capacitive element coupled in parallel with the first divided resonator.

The present invention provides materials, structures, and methods for III-nitride-based devices, including epitaxial and non-epitaxial structures useful for III-nitride devices including light emitting devices, laser diodes, transistors, detectors, sensors, and the like. In some embodiments, the present invention provides metallo-semiconductor and/or metallo-dielectric devices, structures, materials and methods of forming metallo-semiconductor and/or metallo-dielectric material structures for use in semiconductor devices, and more particularly for use in III-nitride based semiconductor devices. In some embodiments, the present invention includes materials, structures, and methods for improving the crystal quality of epitaxial materials grown on non-native substrates. In some embodiments, the present invention provides materials, structures, devices, and methods for acoustic wave devices and technology, including epitaxial and non-epitaxial piezoelectric materials and structures useful for acoustic wave devices. In some embodiments, the present invention provides metal-base transistor devices, structures, materials and methods of forming metal-base transistor material structures for use in semiconductor devices.

An acoustic wave device includes a support substrate including a main surface including first and second regions adjacent to each other in a plan view; a multilayer body including an intermediate layer in the first region of the support substrate and a piezoelectric layer on the intermediate layer, and including a side surface; an IDT electrode on the piezoelectric layer of the multilayer body; and an insulating film in the second region of the support substrate to cover the side surface of the multilayer body. An angle defined between the main surface of the support substrate and the side surface of the multilayer body is a tilt angle, and the side surface of the multilayer body includes portions having different tilt angles at a portion covered with the insulating film.

Techniques are disclosed for forming high frequency film bulk acoustic resonator (FBAR) devices having multiple resonator thicknesses on a common substrate. A piezoelectric stack is formed in an STI trench and overgrown onto the STI material. In some cases, the piezoelectric stack can include epitaxially grown AlN. In some cases, the piezoelectric stack can include single crystal (epitaxial) AlN in combination with polycrystalline (e.g., sputtered) AlN. The piezoelectric stack thus forms a central portion having a first resonator thickness and end wings extending from the central portion having a different resonator thickness. Each wing may also have different thicknesses. Thus, multiple resonator thicknesses can be achieved on a common substrate, and hence, multiple resonant frequencies on that same substrate. The end wings can have metal electrodes formed thereon, and the central portion can have a plurality of IDT electrodes patterned thereon.