A filter includes series units and shunt units. Each series unit includes at least one bulk acoustic wave resonator. Each shunt unit includes at least one bulk acoustic wave resonator and is disposed between one of the series units and a ground. One of the series units or one of the shunt units includes a first bulk acoustic wave resonator, a second bulk acoustic wave resonator, and a third bulk acoustic wave resonator connected in series. The second bulk acoustic wave resonator has a polarity different from a polarity of the first bulk acoustic wave resonator and a polarity of the third bulk acoustic wave resonator.

An acoustic wave element includes a piezoelectric substrate, an IDT electrode including comb electrode fingers, and a reflector including reflective electrode fingers. An average value of all pitches of the comb electrode fingers is smaller than an average value of all pitches of the reflective electrode fingers. When a total number of the comb electrode fingers is defined as N, at least one n-th end-side pitch satisfying 1?n?(0.233?N) is smaller than the average value of all the pitches of the comb electrode fingers.

An acoustic wave element includes a piezoelectric substrate, an IDT electrode including comb electrode fingers, and a reflector including reflective electrode fingers. An average value of all pitches of the comb electrode fingers is smaller than an average value of all pitches of the reflective electrode fingers. When a total number of the comb electrode fingers is defined as N, at least one n-th end-side pitch satisfying 1?n?(0.233?N) is smaller than the average value of all the pitches of the comb electrode fingers.

A filter (100) includes a piezoelectric layer (105); a first electrode (108), disposed at a first vertical face of the piezoelectric layer (105) and configured to receive an electric signal; and a second electrode (109), disposed at a second vertical face of the piezoelectric layer (105) and configured to output an electric signal, where the first vertical face and the second vertical face are two opposite sides of the piezoelectric layer (105).

An acoustic wave filter includes series resonators and parallel resonators that have a piezoelectric film on an identical substrate and have a lower electrode and an upper electrode, wherein: one of the series resonators and the parallel resonators have a temperature compensation film on a face of the lower electrode or the upper electrode that is opposite to the piezoelectric film in a resonance region, the compensation film having an elastic constant of a temperature coefficient of which sign is opposite to a sign of a temperature coefficient of an elastic constant of the piezoelectric film; and the other have an added film on the same side as the temperature compensation film on the lower electrode side or the upper electrode side compared to the piezoelectric film in the resonance region in the one of the series resonators and the parallel resonators.

An acoustic wave device includes a piezoelectric layer, an interdigital transducer, and a slow wave propagation overlay over a portion of the interdigital transducer. By providing electrode fingers of the interdigital transducer such that a portion of the width thereof is dependent on an electrode period, a desirable wave mode may be maintained in the acoustic wave device. Further, by varying a width of the slow wave propagation overlay based on the electrode period, the desirable wave mode may be further maintained.

A high pass filter includes: a first resonant circuit including an inductor and a capacitor in parallel between first and second terminals; a second resonant circuit including an inductor and a capacitor in series between a first end of the first resonant circuit and a ground; a third resonant circuit including an inductor and a capacitor in series between a second end of the first resonant circuit and the ground; a fourth resonant circuit disposed between the first end of the first resonant circuit and the first terminal, and including a first acoustic resonator; and a fifth resonant circuit disposed between the second end of the first resonant circuit and the second terminal, and including a second acoustic resonator. Attenuation regions respectively formed by the first, second, and third resonant circuits are arranged in lower frequency regions than attenuation regions respectively formed by the fourth and fifth resonant circuits.

A method of fabricating an RF filter comprising an array of resonators, the method comprising the steps of: (a) Obtaining a removable carrier with release layer; (b) Growing a piezoelectric film on a removable carrier; (c) Applying a first electrode to the piezoelectric film; (d) Obtaining a backing membrane on a cover, with or without prefabricated cavities between the backing film and cover; (e) Attaching the backing membrane to the first electrode; (f) Detaching the removable carrier; (g) Measuring and trimming the piezoelectric film as necessary; (h) Selectively etching away the piezoelectric layer to fabricate discrete resonator islands; (i) Etching down through coatings backing membrane, silicon dioxide and into silicon handle to form trenches; (j) Applying passivation layer into the trenches and around the piezoelectric islands; (k) Depositing a second electrode layer over the dielectric and piezoelectric film islands; (l) Applying connections for subsequent electrical coupling to an interposer; (m) Selectively remove second electrode material leaving coupled resonator arrays; (n) Create gasket around perimeter of the resonator array; (o) Thinning down cover of handle to desired thickness; (p) Optionally fabricating cavities between the silicon membrane and handle; (q) Dicing the wafer into flip chip single unit filter arrays; (r) Obtaining an interposer; (s) Optionally applying a dam to the interposer surface to halt overfill flow; (t) Coupling the flip chip single unit filter array to pads of the interposer by reflow of the solder cap; (u) Encapsulating with polymer overfill; and (v) Singulating into separate filter modules.

A method of fabricating an RF filter comprising an array of resonators comprising the steps of: Obtaining a removable carrier with release layer; Growing a piezoelectric film on a removable carrier; Applying a first electrode to the piezoelectric film; Obtaining a backing membrane on a cover, with or without prefabricated cavities between the backing film and cover; Attaching the backing membrane to the first electrode; Detaching the removable carrier; Measuring and trimming the piezoelectric film as necessary; Selectively etching away the piezoelectric layer to fabricate discrete resonator islands; Etching down through coatings and backing membrane to a silicon dioxide layer between the backing membrane and the cover to form trenches; Applying a passivation layer into the trenches and around the piezoelectric islands; Depositing a second electrode layer over the piezoelectric film islands and surrounding passivation layer; Applying connections for subsequent electrical coupling to an interposer; Selectively removing second electrode material leaving coupled resonator arrays; Creating a gasket around perimeter of the resonator array; Thinning down cover to desired thickness; Optionally fabricating upper cavities between the backing membrane and cover by drilling holes through the cover and then selectively etching away the silicon dioxide; Dicing the wafer into flip chip single unit filter arrays; Obtaining an interposer; Optionally applying a dam to the interposer surface to halt overfill flow; Coupling the flip chip single unit filter array to pads of the interposer by reflow of the solder cap; Encapsulating with polymer underfill/overfill; and Singulating into separate filter modules.

A coupled resonator filter includes a first resonator, a second resonator, one or more intervening layers, a first border ring, and a second border ring. The first resonator includes a first piezoelectric layer and a first electrode in contact with the first piezoelectric layer. The second resonator includes a second piezoelectric layer and a second electrode in contact with the second piezoelectric layer. The one or more intervening layers are between the first resonator and the second resonator and acoustically couple the first resonator and the second resonator. The first border ring is on the first electrode. The second border ring is on the second electrode. By providing both the first border ring and the second border ring, spurious modes in the coupled resonator filter may be suppressed, thereby improving the performance thereof.